The front gate interface and oxide traps induced by hot carrier stress in SOI NMOSFETs are studied.Based on a new forward gated diode technique,the R G current originating from the front interface traps is me...The front gate interface and oxide traps induced by hot carrier stress in SOI NMOSFETs are studied.Based on a new forward gated diode technique,the R G current originating from the front interface traps is measured,and then the densities of the interface and oxide traps are separated independently.The experimental results show that the hot carrier stress of front channel not only results in the strong generation of the front interface traps,but also in the significant oxide traps.These two kinds of traps have similar characteristic in increasing with the hot carrier stress time.This analysis allows one to obtain a clear physical picture of the effects of the hot carrier stress on the generating of interface and oxide traps,which help to understand the degradation and reliability of the SOI MOSFETs.展开更多
The radiation influences on electrical parameters of4H-SiC vertical double-implanted metal-oxide-semiconductor field effect transistor( VDMOS) are studied. By simulations on SRIM software and SILVACO software, the ele...The radiation influences on electrical parameters of4H-SiC vertical double-implanted metal-oxide-semiconductor field effect transistor( VDMOS) are studied. By simulations on SRIM software and SILVACO software, the electrical parameters shifts of the device with defects in different regions are observed. The results indicate that the defects in different regions induced by radiations lead to different degradations of the electrical parameters. Non-ionization bulk defects in the JFET region make the drain-source on-state resistance Rdson increase,and those near the impact ionization center make the breakdown voltage Vbreakdownincrease. Moreover,the radiationinduced SiC/SiO2 interface defects,known as negative interface charges or positive interface charges,influence the electrical parameters significantly as well. The positive interface charges along the SiC/SiO2 interface above the channel region lead to a decrease in threshold voltage Vth,Rdsonand Vbreakdown,while positive interface charges along the Si C/Metal interface above the main junction of the terminal only leads to the decrease in Vbreakdown. The negative interface charges along the SiC/SiO2 interface above the channel region can make Vth,Rdsonand Vbreakdownincrease.展开更多
基金Supported by National Natural Science Foundation of China (11805270,12005293)West Light Foundation of Chinese Academy of Sciences(2019-XBQNXZ-B-013,2018-XBQNXZ-B-003)。
文摘The front gate interface and oxide traps induced by hot carrier stress in SOI NMOSFETs are studied.Based on a new forward gated diode technique,the R G current originating from the front interface traps is measured,and then the densities of the interface and oxide traps are separated independently.The experimental results show that the hot carrier stress of front channel not only results in the strong generation of the front interface traps,but also in the significant oxide traps.These two kinds of traps have similar characteristic in increasing with the hot carrier stress time.This analysis allows one to obtain a clear physical picture of the effects of the hot carrier stress on the generating of interface and oxide traps,which help to understand the degradation and reliability of the SOI MOSFETs.
基金The Foundation of State Key Laboratory of Widebandgap Semiconductor Power Electronics Devices(No.2017KF003)the Fundamental Research Funds for the Central Universities
文摘The radiation influences on electrical parameters of4H-SiC vertical double-implanted metal-oxide-semiconductor field effect transistor( VDMOS) are studied. By simulations on SRIM software and SILVACO software, the electrical parameters shifts of the device with defects in different regions are observed. The results indicate that the defects in different regions induced by radiations lead to different degradations of the electrical parameters. Non-ionization bulk defects in the JFET region make the drain-source on-state resistance Rdson increase,and those near the impact ionization center make the breakdown voltage Vbreakdownincrease. Moreover,the radiationinduced SiC/SiO2 interface defects,known as negative interface charges or positive interface charges,influence the electrical parameters significantly as well. The positive interface charges along the SiC/SiO2 interface above the channel region lead to a decrease in threshold voltage Vth,Rdsonand Vbreakdown,while positive interface charges along the Si C/Metal interface above the main junction of the terminal only leads to the decrease in Vbreakdown. The negative interface charges along the SiC/SiO2 interface above the channel region can make Vth,Rdsonand Vbreakdownincrease.
