In HFCVD system the substrate temperature is a key factor which deeply affects the quality of diamond films. Th e magnitude and the variation of the substrate temperature must be limited in a suitable range to depo...In HFCVD system the substrate temperature is a key factor which deeply affects the quality of diamond films. Th e magnitude and the variation of the substrate temperature must be limited in a suitable range to deposit diamond films of uniform thickness over large areas. In this paper, the hot filament parameters are investigated on the basi s of GAs to realize a good substrate temperature profile. Computer simulations d emonstrate that on parameters optimized by GAs a uniform substrate temperatur e field can be formed over a relatively large circle area with R s=10 cm.展开更多
In the construction of water conservancy and hydropower project,young concrete lining structure is often affected by blasting load. Young concrete has a lot of micro-fractures with random distribution,which are easier...In the construction of water conservancy and hydropower project,young concrete lining structure is often affected by blasting load. Young concrete has a lot of micro-fractures with random distribution,which are easier to propagate and connect under blasting load. This paper focuses on the calculation on dynamic stress intensity factors of bond interface crack of concrete-rock according to concrete age. Result shows that different incidence angles of stress wave lead to different crack propagation mechanisms. Under the normal incidence of impact load,the bonding interface crack propagation of the concrete lining is mainly caused by reflection tensile stress,which forms from the free surface. With horizontal incidence of stress wave,the bond interface crack propagation of concrete lining is affected by concrete age. With the increase of concrete age,the elasticity modulus margin between concrete and rock decreases gradually,and the crack propagation form changes from shear failure to tensile damage.展开更多
Nano-hole patterned sapphire substrates (NHPSSs) were successfully prepared using a low-cost and high-efficiency approach, which is the laser interference lithography (LIL) combined with reactive ion etching (RIE...Nano-hole patterned sapphire substrates (NHPSSs) were successfully prepared using a low-cost and high-efficiency approach, which is the laser interference lithography (LIL) combined with reactive ion etching (RIE) and inductively coupled plasma (ICP) techniques. Gallium nitride (GaN)-based light emitting diode (LED) structure was grown on NHPSS by metal organic chemical vapor deposition (MOCVD). Photoluminescence (PL) measurement was conducted to compare the luminescence efficiency of the GaN-based LED structure grown on NHPSS ('NHPSS-LED) and that on unpatterned sapphire substrates (UPSS-LED). Electroluminescence (EL) measurement shows that the output power of NHPSS-LED is 2.3 times as high as that of UPSS-LED with an injection current of 150 mA. Both PL and EL results imply that NHPSS has an advantage in improving the crystalline quality of Gab/epilayer and light extraction efficiency of LEDs at the same time.展开更多
We differentiated the effects of Cu films deposited on single crystalline a-,r-,and c-plane sapphire substrates upon graphene films synthesized with atmospheric pressure chemical vapor deposition(CVD).The data illustr...We differentiated the effects of Cu films deposited on single crystalline a-,r-,and c-plane sapphire substrates upon graphene films synthesized with atmospheric pressure chemical vapor deposition(CVD).The data illustrate that the realization of high-crystalline Cu film is dependent not only on the crystallinity of underlying substrate,but also on the symmetric match of crystallographic geometry between metal film and substrate.We also systematically investigated the effects of PMMA removal on the Raman ID/IG and IG/I2D values of transferred graphene.The results reveal that different PMMA removal methods do not alter the ID/IG values;instead,the residue of PMMA increases the IG/I2D values and the thermal decomposition of PMMA leads to higher IG/I2D values than the removal of PMMA with acetone.The effects of PMMA removal on variations of the Raman spectra are also discussed.展开更多
In this study,the thick AlGaN epilayers have been grown on the c-plane sapphire substrate and the free-standing GaN substrate using low-temperature AlN nucleation layers by low-pressure metal-organic chemical vapor de...In this study,the thick AlGaN epilayers have been grown on the c-plane sapphire substrate and the free-standing GaN substrate using low-temperature AlN nucleation layers by low-pressure metal-organic chemical vapor deposition(LPMOCVD).High resolution X-ray diffraction(HRXRD),atom force microscopy(AFM),scanning electron microscopy(SEM),photoluminescence(PL) and Raman scattering measurements have been employed to study the crystal quality,threading dislocation density,surface morphology,optical properties and phonon properties of thick AlGaN epifilms.The results indicate that AlGaN epifilms crystal quality can be improved greatly when grown on the free-standing GaN substrate.We calculated the threading dislocation density and found that thick AlGaN epifilm grown on the free-standing GaN substrate is much lower in total threading dislocation density than that grown on the sapphire substrate,although the surface morphology is rougher than that of sapphire substrate.展开更多
One judiciously designed strategy of utilizing an ultrathin but conductive Ga_(2)O_(3):Si nanolayer to prepare(AlGa)_(2)O_(3)crystalline film is demonstrated.Benefiting from the existence of Ga_(2)O_(3):Si nanolayer,a...One judiciously designed strategy of utilizing an ultrathin but conductive Ga_(2)O_(3):Si nanolayer to prepare(AlGa)_(2)O_(3)crystalline film is demonstrated.Benefiting from the existence of Ga_(2)O_(3):Si nanolayer,a high-quality(Al_(0.68)Ga_(0.32))_(2)O_(3)sesquioxide film with 68 at.%aluminum was epitaxially grown on sapphire substrates,which was characterized by high-resolution transmission electron microscopy,X-ray photoelectron spectroscopy and X-ray diffraction.Its bandgap was broadened to 6.14 eV,and a vacuum ultraviolet(VUV)(AlGa)_(2)O_(3)/Ga_(2)O_(3):Si photodetector was subsequently fabricated.The detector exhibits a pretty high on-off ratio of about 10^(3),an open-circuit voltage of 1.0 V and a responsivity of 8.1 mA W^(-1) at 0 V bias voltage.The performances imply that the proposed strategy is valuable for improving the quality and also adjusting the bandgap of(AlGa)_(2)O_(3)sesquioxides,which is expected to facilitate their application in VUV photodetection.展开更多
Compared to traditional optical domes, domes of sapphire coated with films can effectively reduce emissivity and increase transmittance. The purpose of this work is to investigate the thermal radiation effect on sapph...Compared to traditional optical domes, domes of sapphire coated with films can effectively reduce emissivity and increase transmittance. The purpose of this work is to investigate the thermal radiation effect on sapphire optical dome coated with yttrium oxide by a radio frequency mag- netron sputtering method. The emissivity of sapphire coated with Y203 films is studied by both numerical and experi- mental methods. The results indicate that the emissivity of sapphire substrate is reduced effectively with increasing the thickness of the Y203 film. In addition, a finite element model is developed to simulate the radiation intensity of the optical dome. The thermal responses indicate that the max- imum temperature is reduced apparently compared with the uncoated sapphire as Y203 film thicknesses increase. The average irradiance distribution at different film thicknesses with time shows that the self-thermal radiation disturbance of sapphire optical dome delays 0.93 s when the thickness of Y203 film is 200μm, which can guarantee the dome works properly and effectively even in a harsh environment.展开更多
Gallium oxide (Ga203) films were deposited on singlecrystalline sapphire (0001) substrate by radio frequency (RF) magnetron sputtering technique in the temperature range of 300--500 ℃. The microstructure of the...Gallium oxide (Ga203) films were deposited on singlecrystalline sapphire (0001) substrate by radio frequency (RF) magnetron sputtering technique in the temperature range of 300--500 ℃. The microstructure of the fl-Ga203 films were investigated in detail using X-ray diffractometer (XRD) and scanning electron microscope (SEM). The results show that the film prepared at 500℃ exhibits the best crystallinity with a monoclinic structure (fl-Ga203). Structure analysis reveals a clear out-of-plane orientation offl-Ga203 (201) II A1203 (0001). The average transmittance of these films in the visible wavelength range exceeds 90%, and the optical band gap of the films varies from 4.68 eV to 4.94 eV which were measured by an ultraviolet-visible-near infrared (UV-vis-NIR) spectrophotometer. Therefore, it is hopeful that the fl-Ga203 film can be used in the UV optoelectronic devices.展开更多
Controlling the densities of aligned single-walled carbon nanotube arrays (SWNTs) on ST-cut quartz is a critical step in various applications of these materials. However the growth mechanism for tuning SWNT density ...Controlling the densities of aligned single-walled carbon nanotube arrays (SWNTs) on ST-cut quartz is a critical step in various applications of these materials. However the growth mechanism for tuning SWNT density using the chemical vapor deposition (CVD) method is still not well understood, preventing the development of efficient ways to obtain the desired results. Here we report a general "periodic" approach that achieves ultrahigh density modulation of SWNT arrays on ST-cut quartz substrates--with densities increased by up to -60 times compared with conventional methods using the same catalyst densities--by varying the CH4 gas "off" time. This approach is applicable to a wide range of initial catalyst densities, substrates, catalyst types and growth conditions. We propose a general mechanism for the catalyst size-dependent nucleation of SWNTs associated with different free carbon concentrations, which explains all the observations. Moreover, the validity of the model is supported by systematic experiments involving the variation of key parameters in the "periodic" CVD approach.展开更多
The effect of Ag nanoislands on the Raman of graphene was investigated in this work.Compared with that on the bare silicon wafer,Raman enhancement was observed in the graphene film that covered on Ag/Si surface with n...The effect of Ag nanoislands on the Raman of graphene was investigated in this work.Compared with that on the bare silicon wafer,Raman enhancement was observed in the graphene film that covered on Ag/Si surface with nanoscale Ag islands,which would be induced by the localized plasmon resonance in Ag nanostructures.The interaction between the graphene sheet and Ag/Si substrate was further studied.The peak shift and line shape of Raman spectroscopy indicated a nonuniform strain distribution in the Ag/Si supported graphene film.展开更多
In this paper, the cone-shaped patterned sapphire substrates (PSS) were etched by an inductively couple plasma with BCl 3 as the reacting gas. The influence of the operating pressure and the RF bias power on subtrench...In this paper, the cone-shaped patterned sapphire substrates (PSS) were etched by an inductively couple plasma with BCl 3 as the reacting gas. The influence of the operating pressure and the RF bias power on subtrenches of the cone-shaped PSS and the formation mechanism of subtrenches were investigated. The profiles of patterns were characterized by FESEM (field emission scanning electron microscope). It showed that the subtrench size varied with the operating pressure and the RF bias power. As the operating pressure increased from 0.2 Pa to 0.9 Pa, the subtrenches changed from narrow and deep to wide and shallow; then to narrower and shallower. When the RF bias power varied from 200 W to 600 W, the subtrenches gradually became noticeable. The FESEM results also indicated that the subtrenches were formed due to the ion scattering effect which was caused by tapered sidewalls and charges accumulation. It is discovered that the scattering effect is closely related with the operating pressure and RF bias power.展开更多
文摘In HFCVD system the substrate temperature is a key factor which deeply affects the quality of diamond films. Th e magnitude and the variation of the substrate temperature must be limited in a suitable range to deposit diamond films of uniform thickness over large areas. In this paper, the hot filament parameters are investigated on the basi s of GAs to realize a good substrate temperature profile. Computer simulations d emonstrate that on parameters optimized by GAs a uniform substrate temperatur e field can be formed over a relatively large circle area with R s=10 cm.
基金The National Natural Science Foundation of China(No.50774056)Scientific Research Fund of Wuhan University of Science and Technology(No.080068)
文摘In the construction of water conservancy and hydropower project,young concrete lining structure is often affected by blasting load. Young concrete has a lot of micro-fractures with random distribution,which are easier to propagate and connect under blasting load. This paper focuses on the calculation on dynamic stress intensity factors of bond interface crack of concrete-rock according to concrete age. Result shows that different incidence angles of stress wave lead to different crack propagation mechanisms. Under the normal incidence of impact load,the bonding interface crack propagation of the concrete lining is mainly caused by reflection tensile stress,which forms from the free surface. With horizontal incidence of stress wave,the bond interface crack propagation of concrete lining is affected by concrete age. With the increase of concrete age,the elasticity modulus margin between concrete and rock decreases gradually,and the crack propagation form changes from shear failure to tensile damage.
基金supported by the National Key Scientific Instrument and Equipment Development Projects of China(No.2012YQ17000406)the Foshan-CAS Cooperated Projects(No.2012A01)
文摘Nano-hole patterned sapphire substrates (NHPSSs) were successfully prepared using a low-cost and high-efficiency approach, which is the laser interference lithography (LIL) combined with reactive ion etching (RIE) and inductively coupled plasma (ICP) techniques. Gallium nitride (GaN)-based light emitting diode (LED) structure was grown on NHPSS by metal organic chemical vapor deposition (MOCVD). Photoluminescence (PL) measurement was conducted to compare the luminescence efficiency of the GaN-based LED structure grown on NHPSS ('NHPSS-LED) and that on unpatterned sapphire substrates (UPSS-LED). Electroluminescence (EL) measurement shows that the output power of NHPSS-LED is 2.3 times as high as that of UPSS-LED with an injection current of 150 mA. Both PL and EL results imply that NHPSS has an advantage in improving the crystalline quality of Gab/epilayer and light extraction efficiency of LEDs at the same time.
基金supported by the National Basic Research Program of China(2012CB215500)the National Natural Science Foundation of China(51272296)+1 种基金the Natural Science Foundation of Chongqing(CSTC2012jjA50014)Fundamental Research Funds for the Central Universities(CDJZR12225501,CQDXWL-2013-016)
文摘We differentiated the effects of Cu films deposited on single crystalline a-,r-,and c-plane sapphire substrates upon graphene films synthesized with atmospheric pressure chemical vapor deposition(CVD).The data illustrate that the realization of high-crystalline Cu film is dependent not only on the crystallinity of underlying substrate,but also on the symmetric match of crystallographic geometry between metal film and substrate.We also systematically investigated the effects of PMMA removal on the Raman ID/IG and IG/I2D values of transferred graphene.The results reveal that different PMMA removal methods do not alter the ID/IG values;instead,the residue of PMMA increases the IG/I2D values and the thermal decomposition of PMMA leads to higher IG/I2D values than the removal of PMMA with acetone.The effects of PMMA removal on variations of the Raman spectra are also discussed.
基金supported by the National Key Science and Technology Special Project,China(Grant No.2008ZX01002-002)the Major Program and State Key Program of the National Natural Science Foundation of China(Grant Nos.60890191 and 60736033)the Fundamental Research Funds for the Central Universities,China(Grant No. JY10000904009)
文摘In this study,the thick AlGaN epilayers have been grown on the c-plane sapphire substrate and the free-standing GaN substrate using low-temperature AlN nucleation layers by low-pressure metal-organic chemical vapor deposition(LPMOCVD).High resolution X-ray diffraction(HRXRD),atom force microscopy(AFM),scanning electron microscopy(SEM),photoluminescence(PL) and Raman scattering measurements have been employed to study the crystal quality,threading dislocation density,surface morphology,optical properties and phonon properties of thick AlGaN epifilms.The results indicate that AlGaN epifilms crystal quality can be improved greatly when grown on the free-standing GaN substrate.We calculated the threading dislocation density and found that thick AlGaN epifilm grown on the free-standing GaN substrate is much lower in total threading dislocation density than that grown on the sapphire substrate,although the surface morphology is rougher than that of sapphire substrate.
基金supported by the National Natural Science Foundation of China(91833301 and 61427901)Guangdong Natural Science Funds for Distinguished Young Scholars(2021B1515020105)Guangdong Basic and Applied Basic Research Foundation(2019A1515110916)。
文摘One judiciously designed strategy of utilizing an ultrathin but conductive Ga_(2)O_(3):Si nanolayer to prepare(AlGa)_(2)O_(3)crystalline film is demonstrated.Benefiting from the existence of Ga_(2)O_(3):Si nanolayer,a high-quality(Al_(0.68)Ga_(0.32))_(2)O_(3)sesquioxide film with 68 at.%aluminum was epitaxially grown on sapphire substrates,which was characterized by high-resolution transmission electron microscopy,X-ray photoelectron spectroscopy and X-ray diffraction.Its bandgap was broadened to 6.14 eV,and a vacuum ultraviolet(VUV)(AlGa)_(2)O_(3)/Ga_(2)O_(3):Si photodetector was subsequently fabricated.The detector exhibits a pretty high on-off ratio of about 10^(3),an open-circuit voltage of 1.0 V and a responsivity of 8.1 mA W^(-1) at 0 V bias voltage.The performances imply that the proposed strategy is valuable for improving the quality and also adjusting the bandgap of(AlGa)_(2)O_(3)sesquioxides,which is expected to facilitate their application in VUV photodetection.
文摘Compared to traditional optical domes, domes of sapphire coated with films can effectively reduce emissivity and increase transmittance. The purpose of this work is to investigate the thermal radiation effect on sapphire optical dome coated with yttrium oxide by a radio frequency mag- netron sputtering method. The emissivity of sapphire coated with Y203 films is studied by both numerical and experi- mental methods. The results indicate that the emissivity of sapphire substrate is reduced effectively with increasing the thickness of the Y203 film. In addition, a finite element model is developed to simulate the radiation intensity of the optical dome. The thermal responses indicate that the max- imum temperature is reduced apparently compared with the uncoated sapphire as Y203 film thicknesses increase. The average irradiance distribution at different film thicknesses with time shows that the self-thermal radiation disturbance of sapphire optical dome delays 0.93 s when the thickness of Y203 film is 200μm, which can guarantee the dome works properly and effectively even in a harsh environment.
基金supported by the National Natural Science Foundation of China(Nos.61274113,61404091,61505144,51502203 and 51502204)the Opening Fund of Key Laboratory of Silicon Device Technology in Chinese Academy of Sciencesthe Tianjin Natural Science Foundation(Nos.14JCZDJC31500 and 14JCQNJC00800)
文摘Gallium oxide (Ga203) films were deposited on singlecrystalline sapphire (0001) substrate by radio frequency (RF) magnetron sputtering technique in the temperature range of 300--500 ℃. The microstructure of the fl-Ga203 films were investigated in detail using X-ray diffractometer (XRD) and scanning electron microscope (SEM). The results show that the film prepared at 500℃ exhibits the best crystallinity with a monoclinic structure (fl-Ga203). Structure analysis reveals a clear out-of-plane orientation offl-Ga203 (201) II A1203 (0001). The average transmittance of these films in the visible wavelength range exceeds 90%, and the optical band gap of the films varies from 4.68 eV to 4.94 eV which were measured by an ultraviolet-visible-near infrared (UV-vis-NIR) spectrophotometer. Therefore, it is hopeful that the fl-Ga203 film can be used in the UV optoelectronic devices.
基金This work was supported by the National Science Foundation of China (No. 20951002).
文摘Controlling the densities of aligned single-walled carbon nanotube arrays (SWNTs) on ST-cut quartz is a critical step in various applications of these materials. However the growth mechanism for tuning SWNT density using the chemical vapor deposition (CVD) method is still not well understood, preventing the development of efficient ways to obtain the desired results. Here we report a general "periodic" approach that achieves ultrahigh density modulation of SWNT arrays on ST-cut quartz substrates--with densities increased by up to -60 times compared with conventional methods using the same catalyst densities--by varying the CH4 gas "off" time. This approach is applicable to a wide range of initial catalyst densities, substrates, catalyst types and growth conditions. We propose a general mechanism for the catalyst size-dependent nucleation of SWNTs associated with different free carbon concentrations, which explains all the observations. Moreover, the validity of the model is supported by systematic experiments involving the variation of key parameters in the "periodic" CVD approach.
基金supported by the National Natural Science Foundation of China(Grant Nos.91123009,11104229 and 61227009)Xiamen University Start-up Funds
文摘The effect of Ag nanoislands on the Raman of graphene was investigated in this work.Compared with that on the bare silicon wafer,Raman enhancement was observed in the graphene film that covered on Ag/Si surface with nanoscale Ag islands,which would be induced by the localized plasmon resonance in Ag nanostructures.The interaction between the graphene sheet and Ag/Si substrate was further studied.The peak shift and line shape of Raman spectroscopy indicated a nonuniform strain distribution in the Ag/Si supported graphene film.
基金supported by the National Key Project of China (No. 2009ZX02037-005)
文摘In this paper, the cone-shaped patterned sapphire substrates (PSS) were etched by an inductively couple plasma with BCl 3 as the reacting gas. The influence of the operating pressure and the RF bias power on subtrenches of the cone-shaped PSS and the formation mechanism of subtrenches were investigated. The profiles of patterns were characterized by FESEM (field emission scanning electron microscope). It showed that the subtrench size varied with the operating pressure and the RF bias power. As the operating pressure increased from 0.2 Pa to 0.9 Pa, the subtrenches changed from narrow and deep to wide and shallow; then to narrower and shallower. When the RF bias power varied from 200 W to 600 W, the subtrenches gradually became noticeable. The FESEM results also indicated that the subtrenches were formed due to the ion scattering effect which was caused by tapered sidewalls and charges accumulation. It is discovered that the scattering effect is closely related with the operating pressure and RF bias power.