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砷化镓激光器具有众多应用
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作者 季叶克 从征 《国外激光》 CSCD 1994年第9期15-18,共4页
砷化镓激光器具有众多应用砷化镓是第一种用于二极管激光器的化合物半导体,是发展最好的二极管激光材料。用铝代替其中的某些镓,可制造出在750~870mm发射的长寿命激光器。采用不同的内部结构,可制成多种形式的镓砷铝(Ga... 砷化镓激光器具有众多应用砷化镓是第一种用于二极管激光器的化合物半导体,是发展最好的二极管激光材料。用铝代替其中的某些镓,可制造出在750~870mm发射的长寿命激光器。采用不同的内部结构,可制成多种形式的镓砷铝(Ga1-xAlxAs)激光器。简单的双... 展开更多
关键词 砷化镓激光器 激光列阵 垂直腔
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碳掺杂GaAs激光器侧向扩展电流的研究 被引量:1
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作者 邹德恕 廉鹏 +6 位作者 殷涛 李爽 刘莹 高国 罗辑 杜金玉 沈光地 《半导体技术》 CAS CSCD 北大核心 1999年第6期10-11,19,共3页
实验研究了碳掺杂GaAs激光器帽层的侧向扩展电流对阈值的影响。
关键词 砷化镓激光器 掺杂 侧向扩展电流 激光器
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砷化镓——第三代半导体材料
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作者 伍钢柱 《中学化学教学参考》 1998年第Z2期126-126,共1页
砷化镓,化学式GaAs,一种重要的化合物半导体材料,它是用镓和砷在高温和一定的砷蒸气压下人工合成的晶体。60年代中期,砷化镓就已开始崭露头角,可以满足高频率、大功率的要求,并且能在比较高的温度环境里工作,它是目前做半... 砷化镓,化学式GaAs,一种重要的化合物半导体材料,它是用镓和砷在高温和一定的砷蒸气压下人工合成的晶体。60年代中期,砷化镓就已开始崭露头角,可以满足高频率、大功率的要求,并且能在比较高的温度环境里工作,它是目前做半导体光源最合适、最有发展前途的材料... 展开更多
关键词 砷化镓激光器 太阳能电池 半导体光源 合物半导体材料 硅微波器件 发光二极管 硅半导体 半导体器件 集成电路 激光器
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现代战场的激光器
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作者 雅.,迈R 易文 《现代轻武器》 1995年第4期35-36,34,共3页
关键词 激光器 战场 砷化镓激光器 红宝石激光器
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Transit Properties of High Power Ultra\|Fast Photoconductive Semiconductor Switch 被引量:1
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作者 施卫 赵卫 +1 位作者 孙小卫 LamYeeLoy 《Journal of Semiconductors》 EI CAS CSCD 北大核心 2000年第5期421-425,共5页
Experiments of a GaAs ultra\|fast Photo\|Conductive Semiconductor Switch (PCSS) are reported. Both the linear and nonlinear modes were observed when triggered by the μJ nano\|second laser. The peak current could... Experiments of a GaAs ultra\|fast Photo\|Conductive Semiconductor Switch (PCSS) are reported. Both the linear and nonlinear modes were observed when triggered by the μJ nano\|second laser. The peak current could be as high as 560A. The rise time of the current pulse responses is less than 200ps when triggered with 76MHz femto\|second laser. 展开更多
关键词 ultra\|short electromagnetic pulse source photoconductive switch
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High Slope Efficiency and High Power 850nm Oxide-Confined Vertical Cavity Surface Emitting Lasers 被引量:4
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作者 岳爱文 张伟 +3 位作者 詹敦平 王任凡 沈坤 石兢 《Journal of Semiconductors》 EI CAS CSCD 北大核心 2003年第7期693-696,共4页
High slope efficiency and high power selected oxide-confined 850nm VCSELs grown by MOCVD are reported.The slope efficiency and the threshold current respectively are 0 82mW/mA and 2 59mA with a 9μm diameter oxidati... High slope efficiency and high power selected oxide-confined 850nm VCSELs grown by MOCVD are reported.The slope efficiency and the threshold current respectively are 0 82mW/mA and 2 59mA with a 9μm diameter oxidation aperture at 25℃.The maximum power of 16mW is obtained at 23mA current bias.The minimum threshold current can be as low as 570μA with a 5μm diameter oxidation aperture at 25℃.The maximum saturated power is 5 5mW. 展开更多
关键词 GAAS vertical cavity surface emitting lasers semiconductor lasers
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Modeling and simulation of InAs/GaAs quantum dot lasers 被引量:1
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作者 吕少锋 Ivo Montrosset +2 位作者 Mariangela Gioannini 宋书中 马建伟 《Optoelectronics Letters》 EI 2011年第2期122-125,共4页
Based on the analysis of carrier dynamics in quantum dots (QDs), the numerical model of InAs/GaAs QD laser is developed by means of complete rate equations. The model includes four energy levels and among them three... Based on the analysis of carrier dynamics in quantum dots (QDs), the numerical model of InAs/GaAs QD laser is developed by means of complete rate equations. The model includes four energy levels and among them three energy levels join in lasing. A simulation is conducted by MATLAB according to the rate equation model we obtain. The simulation results of PI characteristic, gain characteristic and intensity modulation response are reasonable. Also, the relations between the left facet reflectivity of laser cavity and threshold current as well as modulation bandwidth are studied. It is indicated that the left facet reflectivity increasing can result in reduced threshold current and improved mo6ulation bandwidth, which is in accordance with experimental results. The internal mechanism of QD lasers is fully described with the rate equation model, which is helpful for QD lasers research. 展开更多
关键词 Computer simulation Mathematical models MODULATION Optical waveguides REFLECTION Semiconductor quantum dots
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Study of metamorphic InGaAs/GaAs quantum well laser materials grown on GaAs substrate by molecular beam epitaxy
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作者 朱岩 倪海桥 +4 位作者 王海莉 贺继方 李密峰 尚向军 牛智川 《Optoelectronics Letters》 EI 2011年第5期325-329,共5页
The GaAs based InGaAs metamorphic structures and their growth by molecular beam epitaxy (MBE) are investigated. The controlling of the source temperature is improved to realize the linearly graded InGaAs metamorphic s... The GaAs based InGaAs metamorphic structures and their growth by molecular beam epitaxy (MBE) are investigated. The controlling of the source temperature is improved to realize the linearly graded InGaAs metamorphic structure precisely. The threading dislocations are reduced. We also optimize the growth and annealing parameters of the InGaAs quantum well (QW). The 1.3-μm GaAs based metamorphic InGaAs QW is completed. A 1.3-μm GaAs based metamorphic laser is reported. 展开更多
关键词 Epitaxial growth Gallium arsenide Growth (materials) Molecular beam epitaxy Semiconducting gallium Semiconducting indium Semiconductor quantum wells
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