A novel radiation tolerant SOI isolation structure,consisting of thin SiO2/polysilicon/field SiO2 multilayers,is proposed. A device with this structure does not show obvious changes in subthreshold characteristics and...A novel radiation tolerant SOI isolation structure,consisting of thin SiO2/polysilicon/field SiO2 multilayers,is proposed. A device with this structure does not show obvious changes in subthreshold characteristics and leakage current,indicating a superior radiation tolerance to traditional LOCOS.展开更多
Aluminum-silicon （Al-Si） alloy is very difficult to machine and diamond tools are considered by far the best choice for the machining of these materials. Experimental results in the machining of the Al-Si alloy with...Aluminum-silicon （Al-Si） alloy is very difficult to machine and diamond tools are considered by far the best choice for the machining of these materials. Experimental results in the machining of the Al-Si alloy with diamond coated inserts are presented. Considering the fact that high adhesive strength and fine surface morphology play an importance role in the applications of chemical vapor deposition （CVD） diamond films, multilayer technique combining the hot filament CVD （HFCVD） method is proposed, by which multilayer diamond-coating on silicon nitride inserts is obtained, microcrystalline diamond （MCD）/ nanocrystalline diamond （NCD） film. Also, the conventional monolayer NCD and MCD coated inserts are produced for comparison. The as-deposited diamond films are characterized by field emission scanning electron microscopy （FE-SEM） and Raman spectrum. All the CVD diamond coated inserts and uncoated insert endure the aluminum-silicon alloy turning to estimate their cutting performances. Among all the tested inserts, the MCD/NCD coated insert exhibits the perfect behavior as tool wear due to its very low flank wear and no diamond peeling.展开更多
[SiO2/FePt]5/Ag thin films were deposited by RF magnetron sputtering on the glass substrates and post annealing at 550 ℃ for 30 min in vacuum. Vibrating sample magnetometer and X-ray diffraction analyser were applied...[SiO2/FePt]5/Ag thin films were deposited by RF magnetron sputtering on the glass substrates and post annealing at 550 ℃ for 30 min in vacuum. Vibrating sample magnetometer and X-ray diffraction analyser were applied to study the magnetic properties and microstructures of the films. The results show that without Ag underlayer [SiO2/FePt]5 films deposited onto the glass are FCC disordered; with the addition of Ag underlayer [SiO]FePt]5/Ag films are changed into L10 and （111） mixed texture. The variation of the SiO2 nonmagnetic layer thickness in [SiO2/FePt]5/Ag films indicates that SiO2-doping plays an important role in improving the order parameter and the perpendicular magnetic anisotropy, and reducing the grain size and intergrain interactions. By controlling SiO2 thickness the highly perpendicular magnetic anisotropy can be obtained in the [SiO2 （0.6 nm）/FePt （3 nm）]5/Ag （50 nm） films and highly （001）-oriented films can be obtained in the [SiO2 （2 nm）/FePt （3 nm）]5/Ag （50 nm） films.展开更多
An extended one-dimensional stress model for the deposition of multilayer films is built based on the existing stress model by considering the influence of deposition conditions. Both thermal stress and intrinsic stre...An extended one-dimensional stress model for the deposition of multilayer films is built based on the existing stress model by considering the influence of deposition conditions. Both thermal stress and intrinsic stress are considered to constitute the final residual stress in the model. The deposition process conditions such as deposition temperature, oxygen pressure, and film growth rate are correlated to the full stress model to analyze the final residual stress distribution, and thus the deformation of the deposited multilayer system under different process conditions. Also, the model is numerically realized with in-house built code. A deposition of Ag-Cu multilayer system is simulated with the as-built extended stress model, and the final residual stresses under different deposition conditions are discussed with part of the results compared with experiment from other literature.展开更多
文摘A novel radiation tolerant SOI isolation structure,consisting of thin SiO2/polysilicon/field SiO2 multilayers,is proposed. A device with this structure does not show obvious changes in subthreshold characteristics and leakage current,indicating a superior radiation tolerance to traditional LOCOS.
基金Project(50975177)supported by the National Natural Science Foundation of China
文摘Aluminum-silicon （Al-Si） alloy is very difficult to machine and diamond tools are considered by far the best choice for the machining of these materials. Experimental results in the machining of the Al-Si alloy with diamond coated inserts are presented. Considering the fact that high adhesive strength and fine surface morphology play an importance role in the applications of chemical vapor deposition （CVD） diamond films, multilayer technique combining the hot filament CVD （HFCVD） method is proposed, by which multilayer diamond-coating on silicon nitride inserts is obtained, microcrystalline diamond （MCD）/ nanocrystalline diamond （NCD） film. Also, the conventional monolayer NCD and MCD coated inserts are produced for comparison. The as-deposited diamond films are characterized by field emission scanning electron microscopy （FE-SEM） and Raman spectrum. All the CVD diamond coated inserts and uncoated insert endure the aluminum-silicon alloy turning to estimate their cutting performances. Among all the tested inserts, the MCD/NCD coated insert exhibits the perfect behavior as tool wear due to its very low flank wear and no diamond peeling.
基金Project(10574085) supported by the National Natural Science Foundation of ChinaProject(207020) supported by the Science Technology Key Project of the Ministry of Education, China
文摘[SiO2/FePt]5/Ag thin films were deposited by RF magnetron sputtering on the glass substrates and post annealing at 550 ℃ for 30 min in vacuum. Vibrating sample magnetometer and X-ray diffraction analyser were applied to study the magnetic properties and microstructures of the films. The results show that without Ag underlayer [SiO2/FePt]5 films deposited onto the glass are FCC disordered; with the addition of Ag underlayer [SiO]FePt]5/Ag films are changed into L10 and （111） mixed texture. The variation of the SiO2 nonmagnetic layer thickness in [SiO2/FePt]5/Ag films indicates that SiO2-doping plays an important role in improving the order parameter and the perpendicular magnetic anisotropy, and reducing the grain size and intergrain interactions. By controlling SiO2 thickness the highly perpendicular magnetic anisotropy can be obtained in the [SiO2 （0.6 nm）/FePt （3 nm）]5/Ag （50 nm） films and highly （001）-oriented films can be obtained in the [SiO2 （2 nm）/FePt （3 nm）]5/Ag （50 nm） films.
基金supported by the National Natural Science Foundation of China(Grant Nos.51076075,91224008 and 91024032)
文摘An extended one-dimensional stress model for the deposition of multilayer films is built based on the existing stress model by considering the influence of deposition conditions. Both thermal stress and intrinsic stress are considered to constitute the final residual stress in the model. The deposition process conditions such as deposition temperature, oxygen pressure, and film growth rate are correlated to the full stress model to analyze the final residual stress distribution, and thus the deformation of the deposited multilayer system under different process conditions. Also, the model is numerically realized with in-house built code. A deposition of Ag-Cu multilayer system is simulated with the as-built extended stress model, and the final residual stresses under different deposition conditions are discussed with part of the results compared with experiment from other literature.
