The conception of the soft layer during chemical mechanical polishing(CMP) was proposed for the first time. The soft layer was a reaction layer formed on the silicon surface; it was softer than the silicon substrate a...The conception of the soft layer during chemical mechanical polishing(CMP) was proposed for the first time. The soft layer was a reaction layer formed on the silicon surface; it was softer than the silicon substrate and its thickness was about several nanometers. The existence of the soft layer could increase the material volume removed by one particle and increase the material removal rate during CMP. At the same time, the soft layer could decrease the cutting depth of the abrasive particle so as to realize ductile grinding, and it is useful to decrease the roughness of the polished surface and to improve the polishing quality.展开更多
A method for preparation of particle crystal film constructed from monodisperse silica colloidal particles in diameter of about 300 nm is reported. The films were prepared from an ethanol suspension by vertical deposi...A method for preparation of particle crystal film constructed from monodisperse silica colloidal particles in diameter of about 300 nm is reported. The films were prepared from an ethanol suspension by vertical deposition that relies on capillary forces to assemble colloidal crystal particles on a vertical substrate. The 3D ordered films were characterized by transmission spectra and scanning electric microscope (SEM). The effect of evaporation temperature, particle concentration and sintered temperature on the quality of colloidal particle crystal film was investigated.展开更多
We demonstrate radiation-pressure-driven mechanical oscillations from high optical quality factor silica microdisk resonators on chip. Mechanical quality factors of 3520 in air and 12540 in vacuum for the fundamental ...We demonstrate radiation-pressure-driven mechanical oscillations from high optical quality factor silica microdisk resonators on chip. Mechanical quality factors of 3520 in air and 12540 in vacuum for the fundamental radial breathing modes are obtained from 73 μm-diarneter silica microdisks with mechanical frequencies of -51 MHz. The measured mechanical oscillation threshold powers for the input light are determined to be 62.5 μW in air and down to 26.6 μW in vacuum.展开更多
A highly pixelated and luminescent silica-coated quantum dot color filter(QDCF)was achieved by surface conjugation with epoxy functional group.Epoxy-functionalized silica-coated quantum dots(QDs)can be thoroughly mixe...A highly pixelated and luminescent silica-coated quantum dot color filter(QDCF)was achieved by surface conjugation with epoxy functional group.Epoxy-functionalized silica-coated quantum dots(QDs)can be thoroughly mixed with SU-8 photoresist up to 25 wt.%without aggregation.The quantum yield(QY)of the silica-coated QDCF can be significantly improved from 19.3%to 36.5%after epoxy treatment.The pristine QDCF experienced a 40%QY decrease,while the epoxied silica-coated QDCF maintained its luminescence even after irradiation(300 mW cm 2@450 nm)for over 25 days.The well-controlled epoxy cap plays a critical role in attaining the ideal optical properties of the QDCF.展开更多
基金Natural Science Foundation of Jiangsu Province ( BK2002010) High-tech Project of Jiangsu Province(BG2004022)
文摘The conception of the soft layer during chemical mechanical polishing(CMP) was proposed for the first time. The soft layer was a reaction layer formed on the silicon surface; it was softer than the silicon substrate and its thickness was about several nanometers. The existence of the soft layer could increase the material volume removed by one particle and increase the material removal rate during CMP. At the same time, the soft layer could decrease the cutting depth of the abrasive particle so as to realize ductile grinding, and it is useful to decrease the roughness of the polished surface and to improve the polishing quality.
基金Supported by the Chinese National Key Basic Research Special Fund (No.2001CB6104) and the National Natural Science Foundation of China(No.20076027)
文摘A method for preparation of particle crystal film constructed from monodisperse silica colloidal particles in diameter of about 300 nm is reported. The films were prepared from an ethanol suspension by vertical deposition that relies on capillary forces to assemble colloidal crystal particles on a vertical substrate. The 3D ordered films were characterized by transmission spectra and scanning electric microscope (SEM). The effect of evaporation temperature, particle concentration and sintered temperature on the quality of colloidal particle crystal film was investigated.
基金supported by the National Basic Research Program of China(Grant Nos.2012CB921804 and 2011CBA00205)the National Natural Science Foundation of China(Grant Nos.61435007,11104137 and 11321063)
文摘We demonstrate radiation-pressure-driven mechanical oscillations from high optical quality factor silica microdisk resonators on chip. Mechanical quality factors of 3520 in air and 12540 in vacuum for the fundamental radial breathing modes are obtained from 73 μm-diarneter silica microdisks with mechanical frequencies of -51 MHz. The measured mechanical oscillation threshold powers for the input light are determined to be 62.5 μW in air and down to 26.6 μW in vacuum.
基金supported by the National Key Research and Development Program of China administrated by the Ministry of Science and Technology of China(2016YFB0401702)the National Natural Science Foundation of China(61674074,61704072 and61405089)+11 种基金Shenzhen Innovation Project(JCYJ20160301113537474)Shenzhen Basic Research Project(JCYJ20170817112012493)Development and Reform Commission of Shenzhen Project([2017]1395)Shenzhen Peacock Team Project(KQTD2016030111203005)Shenzhen Key Laboratory for Advanced Quantum Dot Displays and Lighting(ZDSYS201707281632549)Guangdong University Key Laboratory for Advanced Quantum Dot Displays and Lighting(2017KSYS007)Distinguished Young Scholar of National Natural Science Foundation of Guangdong(2017B030306010)Tianjin Zhonghuan Quantum Tech Co.,Ltd.(18YFZCGX00580)the start-up fund from Southern University of Science and Technologysupported by the Pico Center at SUSTech that received support from Presidential fundDevelopment and Reform Commission of Shenzhen MunicipalityChina Postdoctoral Science Foundation Grant(2018M631443)
文摘A highly pixelated and luminescent silica-coated quantum dot color filter(QDCF)was achieved by surface conjugation with epoxy functional group.Epoxy-functionalized silica-coated quantum dots(QDs)can be thoroughly mixed with SU-8 photoresist up to 25 wt.%without aggregation.The quantum yield(QY)of the silica-coated QDCF can be significantly improved from 19.3%to 36.5%after epoxy treatment.The pristine QDCF experienced a 40%QY decrease,while the epoxied silica-coated QDCF maintained its luminescence even after irradiation(300 mW cm 2@450 nm)for over 25 days.The well-controlled epoxy cap plays a critical role in attaining the ideal optical properties of the QDCF.
