This paper reported some results about intrinsic nanocrystalline silicon thin films deposited by high frequency (HF) sputtering on p-type c-Si substrates at low temperature. Samples were examined by atomic force micro...This paper reported some results about intrinsic nanocrystalline silicon thin films deposited by high frequency (HF) sputtering on p-type c-Si substrates at low temperature. Samples were examined by atomic force microscopy (AFM), X-ray diffraction (XRD), infrared absorption, and ellipsometry. XRD measurements show that this film has a new microstructure, which is different from the films deposited by other methods. The ellipsometry result gives that the optical band gap of the film is about 2.63 eV. In addition, the n-type nc-Si∶H/p-type c-Si heterojunction solar cell, which has open circuit voltage (U oc ) of 558 mV and short circuit current intensity (I sc ) of 29 mA/cm2, was obtained based on the nanocrystalline silicon thin film. Irradiated under AM1.5, 100 mW/cm2 light intensity, the U oc , I sc , and FF can keep stable for 10 h.展开更多
High density vertically aligned and high aspect ratio silicon nanowire （SiNW） arrays have been fabricated on a Si substrate using a template and a catalytic etching process. The template was formed from polystyrene ...High density vertically aligned and high aspect ratio silicon nanowire （SiNW） arrays have been fabricated on a Si substrate using a template and a catalytic etching process. The template was formed from polystyrene （PS） nanospheres with diameter 30-50 nm and density 10^10/cm^2, produced by nanophase separation of PS-containing block-copolymers. The length of the SiNWs was controlled by varying the etching time with an etching rate of 12.5 nm/s. The SiNWs have a biomimetic structure with a high aspect ratio （-100）, high density, and exhibit ultra-low reflectance. An ultra-low reflectance of approximately 0.1% was achieved for SiNWs longer than 750 nm. Well-aligned SiNW/poly（3,4-ethylenedioxy-thiophene）：poly（styrenesulfonate） （PEDOT：PSS） heterojunction solar cells were fabricated. The n-type silicon nanowire surfaces adhered to PEDOT：PSS to form a core-sheath heterojunction structure through a simple and efficient solution process. The large surface area of the SiNWs ensured efficient collection of photogenerated carriers. Compared to planar cells without the nanowire structure, the SiNW/PEDOT：PSS heterojunction solar cell exhibited an increase in short-circuit current density from 2.35 mA/cm^2 to 21.1 mA/cm^2 and improvement in power conversion efficiency from 0.4% to 5.7%.展开更多
Surface recombination represents a handicap for high-efficiency solar cells. This is especially important for nanowire array solar cells, where the surface-to-volume ratio is greatly enhanced. Here, the effect of diff...Surface recombination represents a handicap for high-efficiency solar cells. This is especially important for nanowire array solar cells, where the surface-to-volume ratio is greatly enhanced. Here, the effect of different passivation materials on the effective recombination and on the device performance is experimentally analyzed. Our solar cells are large area top-down axial n-p junction silicon nanowires fabricated by means of Near-Field Phase-Shift Lithography （NF-PSL）. We report an efficiency of 9.9% for the best cell, passivated with a SiO2/SiNx stack. The impact of the presence of a surface fixed charge density at the silicon/oxide interface is studied.展开更多
Nanostructure-textured solar cell owns unique properties but has some shortages especially in its fabrication and passivation.In this paper,nanostructures for crystalline silicon solar cell have been synthesized by co...Nanostructure-textured solar cell owns unique properties but has some shortages especially in its fabrication and passivation.In this paper,nanostructures for crystalline silicon solar cell have been synthesized by controllable method based on silver catalyzed chemical etching.In this way,only the front surface of cell is etched and rear surface is protected.It was found that cells textured via the new method obtained equally excellent optical while superior electrical properties compared with those textured via traditional HF/AgNO3 etching.The V OC and I SC of the cell were improved by 6% and 11%,respectively.Then the cells were passivated via a bi-layer passivation(SiO2 & SiN x),in contrast to traditional SiN x passivation.It was also found that cells with new passivation exhibited improved V OC and I SC by 4% and 25%,respectively.The encouraging results can provide fundamental data for developing the nanostructure-textured crystalline silicon solar cell in following researches.展开更多
文摘This paper reported some results about intrinsic nanocrystalline silicon thin films deposited by high frequency (HF) sputtering on p-type c-Si substrates at low temperature. Samples were examined by atomic force microscopy (AFM), X-ray diffraction (XRD), infrared absorption, and ellipsometry. XRD measurements show that this film has a new microstructure, which is different from the films deposited by other methods. The ellipsometry result gives that the optical band gap of the film is about 2.63 eV. In addition, the n-type nc-Si∶H/p-type c-Si heterojunction solar cell, which has open circuit voltage (U oc ) of 558 mV and short circuit current intensity (I sc ) of 29 mA/cm2, was obtained based on the nanocrystalline silicon thin film. Irradiated under AM1.5, 100 mW/cm2 light intensity, the U oc , I sc , and FF can keep stable for 10 h.
文摘High density vertically aligned and high aspect ratio silicon nanowire （SiNW） arrays have been fabricated on a Si substrate using a template and a catalytic etching process. The template was formed from polystyrene （PS） nanospheres with diameter 30-50 nm and density 10^10/cm^2, produced by nanophase separation of PS-containing block-copolymers. The length of the SiNWs was controlled by varying the etching time with an etching rate of 12.5 nm/s. The SiNWs have a biomimetic structure with a high aspect ratio （-100）, high density, and exhibit ultra-low reflectance. An ultra-low reflectance of approximately 0.1% was achieved for SiNWs longer than 750 nm. Well-aligned SiNW/poly（3,4-ethylenedioxy-thiophene）：poly（styrenesulfonate） （PEDOT：PSS） heterojunction solar cells were fabricated. The n-type silicon nanowire surfaces adhered to PEDOT：PSS to form a core-sheath heterojunction structure through a simple and efficient solution process. The large surface area of the SiNWs ensured efficient collection of photogenerated carriers. Compared to planar cells without the nanowire structure, the SiNW/PEDOT：PSS heterojunction solar cell exhibited an increase in short-circuit current density from 2.35 mA/cm^2 to 21.1 mA/cm^2 and improvement in power conversion efficiency from 0.4% to 5.7%.
文摘Surface recombination represents a handicap for high-efficiency solar cells. This is especially important for nanowire array solar cells, where the surface-to-volume ratio is greatly enhanced. Here, the effect of different passivation materials on the effective recombination and on the device performance is experimentally analyzed. Our solar cells are large area top-down axial n-p junction silicon nanowires fabricated by means of Near-Field Phase-Shift Lithography （NF-PSL）. We report an efficiency of 9.9% for the best cell, passivated with a SiO2/SiNx stack. The impact of the presence of a surface fixed charge density at the silicon/oxide interface is studied.
基金supported by the National Basic Research Program of China ("973" Project)(Grant No. 2009CB939703)the National Natural Science Foundation of China (Grant Nos. 11104319,51172268)the Chinese Academy of Solar Energy Action Plan
文摘Nanostructure-textured solar cell owns unique properties but has some shortages especially in its fabrication and passivation.In this paper,nanostructures for crystalline silicon solar cell have been synthesized by controllable method based on silver catalyzed chemical etching.In this way,only the front surface of cell is etched and rear surface is protected.It was found that cells textured via the new method obtained equally excellent optical while superior electrical properties compared with those textured via traditional HF/AgNO3 etching.The V OC and I SC of the cell were improved by 6% and 11%,respectively.Then the cells were passivated via a bi-layer passivation(SiO2 & SiN x),in contrast to traditional SiN x passivation.It was also found that cells with new passivation exhibited improved V OC and I SC by 4% and 25%,respectively.The encouraging results can provide fundamental data for developing the nanostructure-textured crystalline silicon solar cell in following researches.
