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半导体制程废气处理技术实践 被引量:4
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作者 陈玉峰 杨骥 《半导体技术》 CAS CSCD 北大核心 2008年第9期752-755,共4页
讨论了半导体制造废气处理技术与排放,包括热排气、酸性排气、碱性排气和有机排气这四种工艺废气处理设备的应用和处理原理,以及在实际的操作运行中不同系统控制参数对处理效率的影响,并通过实验确定合理的参数设定范围。特别阐述了有... 讨论了半导体制造废气处理技术与排放,包括热排气、酸性排气、碱性排气和有机排气这四种工艺废气处理设备的应用和处理原理,以及在实际的操作运行中不同系统控制参数对处理效率的影响,并通过实验确定合理的参数设定范围。特别阐述了有机废气处理技术和相关处理设备的应用和操作运行,以及实现系统高效节能运行的技术实践,对半导体厂实现环境保护以及降低气态分子级污染物对生产的影响提供了现实可行的操作依据。 展开更多
关键词 半导体制造 气态分子级污染物 酸性排气 碱性排气 有机排气 挥发性有机成分
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Magnesia base catalyst flue gas denitrate performance study
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作者 GAO Yu HU Xiao-min LI Peng-jie LI Yun ZHANG Yang LIU Ying 《Journal of Environmental Science and Engineering》 2008年第10期64-70,共7页
To control contamination of flue gas emission NOx, the author mixcd method of preparing new magnesia base catalyst and researched on denitrificating fine gas by directness catalytic decomposition. Usually removal rate... To control contamination of flue gas emission NOx, the author mixcd method of preparing new magnesia base catalyst and researched on denitrificating fine gas by directness catalytic decomposition. Usually removal rate of NO is regarded on the main evaluation criteria. The author analyzed calcination temperature of catalyzer manufacturing process, the temperature of flue gas desorption tower, bed height and efficiency denitrification of NO concentration. And discussed the result of both denitrate lore-and-aft of FT-IR and XRD. The experiment indicates that magnesia base catalyst is available to directness catalytic decomposition denitrificate flue gas. Through denitrification rate is from 85% to 95%. The ingredient of magnesia base catalyst is made from magnesia, firming agent, addition agent. Height denitration bed was 4 cm- 5 cm, deuitration reaction temperature is 130℃-170℃, through the analyses above, presumed that magnesia base catalyst exist activating of vice, and analyzed this vice preliminarily. 展开更多
关键词 DENITRIFICATION NO flue gas direct catalytic decomposition CATALYST
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