The design of a small complex-type focussed magnetron with a long target-life used for excited multi-atoms beam film deposition in hard coatings is described.The magnetron tunnel of the magentron source was constructe...The design of a small complex-type focussed magnetron with a long target-life used for excited multi-atoms beam film deposition in hard coatings is described.The magnetron tunnel of the magentron source was constructed by a planar unbalanced magnetic annulus,which comes from the extended co-axial magnetron principle and inside cylindrical magnet tunnel.The use efficinecy of inside circular cone sputtering target area is high up to 62%.The inside-inversion cone sputtering target has a long life and results in a higher deposition rate 35nm/min for Ti at a 2.5Pa Ar pressure.A better focussing direction of ejecting atom beam has been achieved,and the are power input is 300W for Ti target.展开更多
A small unbalanced maglletron atom source with multipole cusp magnetic field anode is described. The co-axial magnetron principle is extended to the circularplanar magnetron atom source, which raises the efficiency of...A small unbalanced maglletron atom source with multipole cusp magnetic field anode is described. The co-axial magnetron principle is extended to the circularplanar magnetron atom source, which raises the efficiency of sputtering target areaup to 60%. The multipole magnetic field is put in the anode, which makes theunbalanced magnetron atomsource run in a higher discharge current at a lower arcvoltage condition. Meanwhile, the sputtering atoms through out the anode can beionized partially, because the electron reaching the anode have to suffer multiplecollisions in order to advallce across the multipole magnetic field lines in the anode,which enhances the chemical reactivity of the secting atoms in film growth andimprove the property of film depositing.展开更多
文摘The design of a small complex-type focussed magnetron with a long target-life used for excited multi-atoms beam film deposition in hard coatings is described.The magnetron tunnel of the magentron source was constructed by a planar unbalanced magnetic annulus,which comes from the extended co-axial magnetron principle and inside cylindrical magnet tunnel.The use efficinecy of inside circular cone sputtering target area is high up to 62%.The inside-inversion cone sputtering target has a long life and results in a higher deposition rate 35nm/min for Ti at a 2.5Pa Ar pressure.A better focussing direction of ejecting atom beam has been achieved,and the are power input is 300W for Ti target.
文摘A small unbalanced maglletron atom source with multipole cusp magnetic field anode is described. The co-axial magnetron principle is extended to the circularplanar magnetron atom source, which raises the efficiency of sputtering target areaup to 60%. The multipole magnetic field is put in the anode, which makes theunbalanced magnetron atomsource run in a higher discharge current at a lower arcvoltage condition. Meanwhile, the sputtering atoms through out the anode can beionized partially, because the electron reaching the anode have to suffer multiplecollisions in order to advallce across the multipole magnetic field lines in the anode,which enhances the chemical reactivity of the secting atoms in film growth andimprove the property of film depositing.
