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Electrochemical Behaviour of Sputtering Deposited DLC Films 被引量:1
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作者 LIU Erjia,ZENG A,LIU L X( School of Mechanical and Production Engineering, Nanyang Technological University ,50 Nanyang Avenue, Singapore 639798) 《中山大学学报(自然科学版)》 CAS CSCD 北大核心 2003年第A19期11-14,共4页
Diamondlike carbon (DLC) films were deposited via magnetron sputtering process. The energetic ion hombardment on the surface of growing film is one of the major parameters that control the atom mobility on the flirt... Diamondlike carbon (DLC) films were deposited via magnetron sputtering process. The energetic ion hombardment on the surface of growing film is one of the major parameters that control the atom mobility on the flirt1 surface and further the physical and chemical characteristics of the films. In this study, the energy of carbon ions was monitored by changing sputtering powerdensity, and its effect on the electrochemical performance of the films was investigated. For the deposition at a higher sputtering power density, a higher sp^3 content in the DLC films was achieved with denser structure and increased film-substrate adhesion. The impedance at the interface of Si substrate/sulfufic acid solution was significantly enhanced, and at the same time higher film resistance, lower capacitance, higher breakdown potential and longer breakdown time were observed, which were related to the significant sp^3 content of the DLC films. 展开更多
关键词 DLC薄膜 钻石形碳膜 磁控管溅射沉积法 电化学特性 薄膜生长
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