期刊文献+
共找到1篇文章
< 1 >
每页显示 20 50 100
Mg在GaP材料中掺杂行为的SIMS分析
1
作者 李越生 方培源 宗祥福 《质谱学报》 EI CAS CSCD 2000年第3期133-134,共2页
Mg of Gap doping characteristics in MOCVD have been studied by using SIMS (Secondary Ion Mass Spectrometry) measurement. The experimental results show that the Mg incorporation is considered to be limited by Mg revapo... Mg of Gap doping characteristics in MOCVD have been studied by using SIMS (Secondary Ion Mass Spectrometry) measurement. The experimental results show that the Mg incorporation is considered to be limited by Mg revaporization from the growth surface under the higher temperature and the Mg electrical activity decreases with increasing cP2Mg flow-rate. The activation energy of Mg in GaP is also respectively obtained. 展开更多
关键词 磷化镓半导体材料 掺杂 SIMS分析
下载PDF
上一页 1 下一页 到第
使用帮助 返回顶部