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High temperature cyclic oxidation behavior of Y_2O_3-ZrO_2 thermal barrier coatings irradiated by high-intensity pulsed ion beam
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作者 王一奇 雷明凯 +1 位作者 AFSAR A M SONG J I 《Journal of Central South University》 SCIE EI CAS 2009年第1期13-17,共5页
The high-temperature oxidation resistance behavior of 7% (mass fraction) Y203-ZrO2 thermal barrier coatings (TBCs) irradiated by high-intensity pulsed ion beam (HIPIB) was investigated under the cyclic oxidation... The high-temperature oxidation resistance behavior of 7% (mass fraction) Y203-ZrO2 thermal barrier coatings (TBCs) irradiated by high-intensity pulsed ion beam (HIPIB) was investigated under the cyclic oxidation condition of 1 050 ℃ and 1 h. The columnar grains in the TBCs disappear after the HIPIB irradiation at ion current densities of 100-200 A/cm^2 and the irradiated surface becomes smooth and densified after remelting and ablation due to the HIPIB irradiation. The thermally grown oxide (TGO) layer thickness of the irradiated TBCs is smaller than that of the original TBCs. After 15 cycles, the mass gains of the original TBCs and those irradiated by ion current densities of 100 and 200 A/cm^2 due to the oxidation are found to be 0.8-0.9, 0.6-0.7, and 0.3-0.4 mg/cm^2, respectively. The inward diffusion of oxygen through the irradiated TBCs is significantly impeded by the densified top layer formed due to irradiation, which is the main reason for the improved overall oxidation resistance of the irradiated TBCs. 展开更多
关键词 Y2O3 ZRO2 thermal barrier coating high-intensity pulsed ion beam electron beam physical vapor deposition oxidation resistance cyclic oxidation
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O^(2+)离子穿过碳膜引起的前后表面电子发射
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作者 虞洋 赵永涛 +7 位作者 王瑜玉 王兴 程锐 周贤明 李永峰 刘世东 雷瑜 孙渊博 《原子核物理评论》 CAS CSCD 北大核心 2014年第1期92-95,共4页
测量了入射能为1.9~11.3 keV/u的O^(2+)离子穿过碳膜诱导的前向、后向(分别对应出射表面和入射表面)电子发射产额。实验中,通过改变入射离子的能量和流强,系统地研究了电子能损和离子束流强度对前向、后向电子发射产额的影响。结果表明... 测量了入射能为1.9~11.3 keV/u的O^(2+)离子穿过碳膜诱导的前向、后向(分别对应出射表面和入射表面)电子发射产额。实验中,通过改变入射离子的能量和流强,系统地研究了电子能损和离子束流强度对前向、后向电子发射产额的影响。结果表明,在本实验的能量范围内,前向、后向电子发射产额与对应表面的电子能损有近似的正比关系,而与束流强度无关。分析还发现引起后向电子发射的动能阈值约为0.2 keV/u,势能电子发射产额约为1 e^-/ion。 展开更多
关键词 电子发射 电子能损 离子束流强度
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Measurement Techniques of High-Current Ion Beam Emittance 被引量:3
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作者 郭之虞 徐蓉 +10 位作者 明建川 邹宇斌 高淑丽 赵捷 彭士香 吴文忠 钱锋 宋执中 于金祥 袁忠喜 于茂林 《Chinese Physics C》 SCIE CAS CSCD 北大核心 2008年第z1期148-150,共3页
One should pay attention to quite a lot of factors when the emittance of high-current ion beam is measured. The background subtraction and threshold setting,the measuring method of pulsed beam emittance,as well as the... One should pay attention to quite a lot of factors when the emittance of high-current ion beam is measured. The background subtraction and threshold setting,the measuring method of pulsed beam emittance,as well as the error sources in the emittance measurements and its elimination or correction are discussed based on the experience during the R&D of three emittance measurement units for high-current ion beams at Peking University. 展开更多
关键词 high-current ion beam EMITTANCE MEASUREMENTS
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