铜箔在石墨烯表面沉积的多弧离子电镀工艺研究

一项新的铜箔在石墨烯薄膜上的沉积工艺已经被研究出来。和以往通过CVD法在铜箔上生长石墨烯的研究相比较,该研究应用了一种无接触式电子加工工艺的多弧离子电镀法。在实验中,石墨烯表面成功地形成了一层薄的铜膜,表明这种铜箔沉积工艺的实用性。此外,通过滚压可显著加快工艺过程,实现大量生产。

Effect of deposition parameters on mechanical properties of TiN films coated on 2A12 aluminum alloys by arc ion plating (AIP)

TiN films were deposited on 2A12 aluminum alloy by arc ion plating (AIP). The Vickers hardness of the films deposited at different bias voltages and different nitrogen gas pressures, and that of the substrate were measured. The surface roughness of the TiN films diposited at –30 V and –80 V respectively and at different nitrogen gas pressure was measured also. The mass loss of TiN films deposited at 0 V, –30 V and –80 V respectively were analyzed in dry sand rubber wheel abrasive wear tests and wet ones in comparison with uncoated Al alloy and austenitic stainless steel (AISI 316L). It is revealed that the highest hardness of the TiN film is obtained at a bias voltage of –30 V and a N2 gas pressure of 0.5 Pa. The surface roughness of the film is larger at –80 V than that at –30 V and reduces as the increase of the N2 gas pressure. The mass loss of TiN-film coated 2A12 aluminum alloy is remarkably less than that of uncoated Al alloy and also that of AISI 316L, which indicates that the abrasive wear rate is greatly reduced by the application of TiN coating. TiN coating deposited by arc ion plating (AIP) technique on aluminum alloy can be a potential coating for machine parts requiring preciseness and lightness.

Deposition of photocatalytic TiO_2 and N-doped TiO_2 films by arc ion plating

TiO2 and N-doped TiO2 films were deposited on the glass substrates by arc ion plating method. The results show that the deposition rate does not change with the increasing deposition time. The increase of mass flow rate of N2 gives rise to the increase of deposition rate. All as-deposited TiO2 and N-doped TiO2 films are amorphous. The anatase TiO2 phase with preferred orientation(101) is acquired by post-annealing at 400 ℃ for 2 h. The incorporation of N into the TiO2 films and the heat treatment extensively shift the band edge to the visible light region.

Study on Properties of Ti(C,N)/TiN Multi-Element-layer Films Plus Nanometer Lubrication Dry Films

Ti(C,N)/TiN multi-element-layer films was deposited on aluminium alloy substrates by using multi-arc ion plating. The microhardness of the films was 2000HV0.i which was nearly 21 times of that of the substrates. XRD analysis show that the main composition of the composite films system were Ti(C,N), TiN, Al3Ti, Al and a little Ti2N. The presence of MjTi new phase in the interface of the films/substrates indicated some metallurgical bonding between them, which implies higher adhesive strength of the films/substrates system. Pin-on-disc tests showed that the wear resistance of the substrates was improved substantially. However, the coefficient of friction of the films/substrate system was high (u=0.66), which resulted in the wear of the counterparts. To reduce the coefficient of friction, nanometer lubrication dry films was applied on top of the multi-element-layer films to form composite films system and subsequent wear tests showed that the resulting composite films led to reduction of the coefficient of friction from 0.66 to 0.16. Meanwhile, wear mass loss of the counterpart was reduced from 1.29 mg to 0.02 mg, so that increased wear resistance and reduced friction effects were achieved.

Composition Gradient Hard Coatings by Arc Ion Plating

Arc Ion Plating can be used to synthesize multi-component composition gradient hard coatings by adjusting arc currents of metal targets. The present work aims at a comprehensive description of such a technique. The examples of TiAl multi-layer alloy coatings and (Ti, M) N composition-gradient films were taken (M representing Zr, Nb etc.) for the purpose of explaining the working process and evaluating practical effects. The results show that this technique has the advantages of easy manipulation, rapid deposition, and wide composition range.

Deposition of chromium aluminum nitride coatings by arc ion plating

Cr-Al-N ternary coatings were deposited by arc ion plating method using isolated Cr target and Al target. The influence of AlN content on the phase change was studied by synthesizing Cr1-xAlxN coatings with different x values. The effects of substrate negative bias on the surface morphology,deposition rate and phase structure were investigated. As the aluminum content increases,the structure of(Cr1-xAlx)N changes from B1(NaCl) phase to B4(wurtzite) phase. The critical content of AlN solubilized in B1(NaCl) lattice is close to 0.7. With the increasing pulse negative bias,the deposition rate decreases constantly,the droplet contamination is more serious,the ion-etching effect on coating surface is more obvious,and the change of preferred orientation and the shift of XRD peak take place.

Oxidation resistance of (Ti,Al,Cr)N coatings at 800 ℃

The composite metastable(Ti0.5Al0.5)N,(Ti0.45Al0.45Cr0.1)N and(Ti0.35Al0.35Cr0.3)N coatings were respectively deposited on a wrought martensite steel 1Cr11Ni2W2MoV for aero-engine compressor blades by arc ion plating technique with pulse substrate bias. All the coatings have B1NaCl phase with a(200) preferred orientation and dense structures. The results show that the introduction of Cr into(Ti,Al)N gives rise to a minute shrinkage of crystal lattice. The incorporation of chromium into the coatings dramastically improves the oxidation-resistance of the coatings. For(Ti0.5Al0.5)N,a layered oxide scale forms after 100 h oxidation and the outer layer is the blend oxide of TiO2 and Al2O3,and the middle layer is rich in Al and the inner layer is rich in Ti. For(Ti0.45Al0.45Cr0.1)N,the oxide scale possesses a double-layered structure and the outer layer is rich in Ti. For(Ti0.35Al0.35Cr0.3)N,a Cr-rich compound oxide scale of Ti,Al and Cr forms,and a out-diffusion of Fe from steel to the nitride coating and oxide film during the oxidation takes place.