With the significant discharge of antibiotic wastewater into the aquatic and terrestrial ecosystems, antibiotic pollution has become a serious problem and presents a hazardous risk to the environment. To address such ...With the significant discharge of antibiotic wastewater into the aquatic and terrestrial ecosystems, antibiotic pollution has become a serious problem and presents a hazardous risk to the environment. To address such issues, various investigations on the removal of antibiotics have been undertaken. Photocatalysis has received tremendous attention owing to its great potential in removing antibiotics from aqueous solutions via a green, economic, and effective process. However, such a technology employing traditional photocatalysts suffers from major drawbacks such as light absorption being restricted to the UV spectrum only and fast charge recombination. To overcome these issues, considerable effort has been directed towards the development of advanced visible light-driven photocatalysts. This mini review summarises recent research progress in the state-of-the-art design and fabrication of photocatalysts with visible-light response for photocatalytic degradation of antibiotic wastewater. Such design strategies involve the doping of metal and non-metal into ultraviolet light-driven photocatalysts, development of new semiconductor photocatalysts, construction of heterojunction photocatalysts, and fabrication of surface plasmon resonance-enhanced photocatalytic systems. Additionally, some perspectives on the challenges and future developments in the area of photocatalytic degradation of antibiotics are provided.展开更多
A series of microcrystalline silicon thin films were fabricated by very high frequency plasma enhanced chemical vapor deposition （VHF-PECVD） at different silane concentrations in a P chamber. Through analysis of the...A series of microcrystalline silicon thin films were fabricated by very high frequency plasma enhanced chemical vapor deposition （VHF-PECVD） at different silane concentrations in a P chamber. Through analysis of the structural and electrical properties of these materials,we conclude that the photosensitivity slightly decreased then increased as the silane concentration increased,while the crystalline volume fraction indicates the opposite change. Results of XRD indicate that thin films have a （220） preferable orientation under certain conditions. Microcrystalline silicon solar cells with conversion efficiency 4. 7% and micromorph tandem solar cells 8.5% were fabricated by VHF-PECVD （p layer and i layer of microcrystalline silicon solar cells were deposited in P chamber）, respectively.展开更多
Using H 2 diluted silane,series of μc Si∶H films are fabricated at low temperature with VHF PECVD.The thickness measurements reveal that the deposition rates are obviously enhanced with higher plasma excitation ...Using H 2 diluted silane,series of μc Si∶H films are fabricated at low temperature with VHF PECVD.The thickness measurements reveal that the deposition rates are obviously enhanced with higher plasma excitation frequency or working pressure,but increase firstly and then decrease with the increase of plasma power density.Raman spectra show that the crystallinity and the average grain sizes of the films strongly depend on the temperature of substrate and the concentration of silane.However,the plasma excitation frequency only has effect on the crystallinity,and a maximum occurs during the further increase of plasma excitation frequency.From XRD and TEM experiments,three preferential crystalline orientations (111),(220) and (311) are observed,and the average grain sizes are different for every crystalline orientation.展开更多
Abstract： An effective approach was conducted for estimating fracture toughness using the crack opening displacement （COD） method for plasma enhanced chemical vapor deposition （PECVD） coating materials. For this ...Abstract： An effective approach was conducted for estimating fracture toughness using the crack opening displacement （COD） method for plasma enhanced chemical vapor deposition （PECVD） coating materials. For this evaluation, an elastoplastic analysis was used to estimate critical COD values for single edge notched bending （SENB） specimens. The relationship between fracture toughness （Kic） and critical COD for SENB specimens was obtained. Microstructure of the interface between AleO3-TiO2 composite ceramic coatings and AISI 1045 steel substrates was studied by using scanning electron microscope （SEM）. Chemical compositions were clarified by energy-dispersive X-ray spectroscopy （EDS）. The results show that the interface between of Al203-TiO2 and substrate has mechanical combining. The nanohardness of the coatings can reach 1 200 GPa examined by nanoindentation. The Klc was calculated according to this relationship from critical COD. The bending process produces a significant relationship of COD independent of the axial force applied. Fractographic analysis was conducted to determine the crack length. From the physical analysis of nanoindentation curves, the elastic modulus of 1045/AI2O3-TiO2 is 180 GPa for the 50 μm film. The highest value of fracture toughness for 1045/A1203-TiO2-250 μm is 348 MPa·mv2.展开更多
SiN, films are deposited on silicon wafers through plasma enhanced chemical vapor deposition （PECVD）. The relationship between the film stress and deposition factors is investigated. It is found that low stress film...SiN, films are deposited on silicon wafers through plasma enhanced chemical vapor deposition （PECVD）. The relationship between the film stress and deposition factors is investigated. It is found that low stress films would be obtained by adjusting the ratio of low frequency（LF） power to high frequency（HF） power pulse time or the chamber pressure. The best of the two methods to control stress in the film is changing the percentage of LF power pulse time. The low stress condition is achieved when the percentage of low frequency power pulse time in total time（LF and HF pulse time） is close to 40%, The low stress cantilever of tunable vertical cavity surface emitting laser is obtained by using this deposition condition,展开更多
The etching effect of ammonia （NH3） on the growth of vertically aligned nanotubes/nanofibers （CNTs） was investigated by direct-current plasma enhanced chemical vapor deposition （DC-PECVD）. NH3 gas etches Ni cata...The etching effect of ammonia （NH3） on the growth of vertically aligned nanotubes/nanofibers （CNTs） was investigated by direct-current plasma enhanced chemical vapor deposition （DC-PECVD）. NH3 gas etches Ni catalyst layer to form nanoscale islands while NH3 plasma etches the deposited amorphous carbon. Based on the etching effect of NH3 gas on Ni catalyst, the differences of growing bundles of CNTs and single strand CNTs were discussed; specifically, the amount of optimal NH3 gas etching is different between bundles of CNTs and single strand CNTs. In contrast to the CNT carpet growth, the single strand CNT growth requires shorter etching time （5 min） than large catalytic patterns （10 rain） since nano dots already form catalyst islands for CNT growth. Through removing the plasma pretreatment process, the damage from being exposed at high temperature substrate occurring during the plasma generation time is minimized. High resolution transmission electron microscopy （HTEM） shows fishbone structure of CNTs grown by PECVD.展开更多
The amorphous silicon nanoparticles （Si NPs） embedded in silicon nitride （SiNx） films prepared by helicon wave plasma-enhanced chemical vapor deposition （HWP-CVD） technique are studied. From Raman scattering inv...The amorphous silicon nanoparticles （Si NPs） embedded in silicon nitride （SiNx） films prepared by helicon wave plasma-enhanced chemical vapor deposition （HWP-CVD） technique are studied. From Raman scattering investigation, we determine that the deposited film has the structure of silicon nanocrystals embedded in silicon nitride （nc-Si/SiNx） thin film at a certain hydrogen dilution amount. The analysis of optical absorption spectra implies that the Si NPs is affected by quantum size effects and has the nature of an indirect-band-gap semiconductor. Further, considering the effects of the mean Si NP size and their dispersion on oscillator strength, and quantum-confinement, we obtain an analytical expression for the spectral absorbance of ensemble samples. Gaussian as well as lognormal size-distributions of the Si NPs are considered for optical absorption coefficient calculations. The influence of the particle size-distribution on the optical absorption spectra was systematically studied. We present the fitting of the optical absorption experimental data with our model and discuss the results.展开更多
Amorphous silicon nitride films were deposited by low-frequency plasma-enhanced chemical vapor deposition（LF-PECVD） using silane and nitrogen as precursors. Characteristics such as deposition rate, surface morpholog...Amorphous silicon nitride films were deposited by low-frequency plasma-enhanced chemical vapor deposition（LF-PECVD） using silane and nitrogen as precursors. Characteristics such as deposition rate, surface morphology, and chemical composition were measured by spectroscopic ellipsometry（SE）, atomic force mieroscope（AFM） and x-ray photoelectron spectroscopy（XPS）. It was shown that amorphous silicon nitride film could be prepared by LF-PECVD with good uniformity and even surface. The XPS result indicated that a small quantity of oxygen was involved in the sample, which was discussed in this paper.展开更多
The hydrophobic films of TixOy-CmHn. deposited from mixture gases of titanium isopropoxide （TTIP） and oxygen by plasma enhanced chemical vapor deposition （PECVD） were investigated. The films were investigated by s...The hydrophobic films of TixOy-CmHn. deposited from mixture gases of titanium isopropoxide （TTIP） and oxygen by plasma enhanced chemical vapor deposition （PECVD） were investigated. The films were investigated by scanning electron microscope （ SEM ）, transmission electron microscope （ TEM ）, Fourier transform infrared spectrometer （ FTIR）, X-Ray diffraction （ XRD ）, element analysis （ EA ）, ultraviolet visible spectrometer （ UV-Vis）, and water contact angle （WCA）. The results reveal that the surface of the films is formed by mierosized papillaes aggregated by inorganic and organic phases of complex nanoparticles with size from 50 nm to 200 nm when the discharge power is increased from 40 W to 150 W. All fdms demonstrate the strong broad of Ti-O-Ti stretching vibration at 400 -800cm-1, -CH bending vibration at 1 388 cm -1, and broadening -OH stretching vibration at 3 000-3500 cm-1 With the increase of the discharge power, the asdeposited film changes from amorphous to crystallization. The WCA of the film can be as high as 160°, indicating the hydrophobicity. The films show a similar ultraviolet absorption property as the bulk TiO2 film. The composition of the composition of film deposited at 150 W can be formulated as Tio.302-C1.5H3. Therefore, the composition formula of this hydrophobic film could be expressed as TiO2-C5H10O4.7. It is believed that the complex micro/nano structures of TiO2 and C5H10O4.7 residues are responsible for the observed hydrophobicity and the ultraviolet absorption property of the film.展开更多
The authors report the observation of Extremely Low Frequency （ELF） plasma turbulence registered by DEMETER satellite in the ionosphere over the seismic and thunderstorm areas. The detail analysis of the electric fi...The authors report the observation of Extremely Low Frequency （ELF） plasma turbulence registered by DEMETER satellite in the ionosphere over the seismic and thunderstorm areas. The detail analysis of the electric field fluctuations for the selected strong earthquakes and thunderstorm is presented. Special attention is given to study of the characteristics of the spectra of these variations and searches of the nonlinear effects. This analysis is possible in the time interval when the waveform has been transmitted. Some attempt of this discussion is given in the paper.展开更多
基金supported by the National Natural Science Foundation of China(21421001,21276116,21477050,21301076,21303074)Natural Science Foundation of Jiangsu Province(BK20140530,BK20150482)+5 种基金China Postdoctoral Science Foundation(2015M570409)Chinese-German Cooperation Research Project(GZ1091)Program for High-Level Innovative and Entrepreneurial Talents in Jiangsu ProvinceProgram for New Century Excellent Talents in University(NCET-13-0835)Henry Fok Education Foundation(141068)Six Talents Peak Project in Jiangsu Province(XCL-025)~~
文摘With the significant discharge of antibiotic wastewater into the aquatic and terrestrial ecosystems, antibiotic pollution has become a serious problem and presents a hazardous risk to the environment. To address such issues, various investigations on the removal of antibiotics have been undertaken. Photocatalysis has received tremendous attention owing to its great potential in removing antibiotics from aqueous solutions via a green, economic, and effective process. However, such a technology employing traditional photocatalysts suffers from major drawbacks such as light absorption being restricted to the UV spectrum only and fast charge recombination. To overcome these issues, considerable effort has been directed towards the development of advanced visible light-driven photocatalysts. This mini review summarises recent research progress in the state-of-the-art design and fabrication of photocatalysts with visible-light response for photocatalytic degradation of antibiotic wastewater. Such design strategies involve the doping of metal and non-metal into ultraviolet light-driven photocatalysts, development of new semiconductor photocatalysts, construction of heterojunction photocatalysts, and fabrication of surface plasmon resonance-enhanced photocatalytic systems. Additionally, some perspectives on the challenges and future developments in the area of photocatalytic degradation of antibiotics are provided.
文摘A series of microcrystalline silicon thin films were fabricated by very high frequency plasma enhanced chemical vapor deposition （VHF-PECVD） at different silane concentrations in a P chamber. Through analysis of the structural and electrical properties of these materials,we conclude that the photosensitivity slightly decreased then increased as the silane concentration increased,while the crystalline volume fraction indicates the opposite change. Results of XRD indicate that thin films have a （220） preferable orientation under certain conditions. Microcrystalline silicon solar cells with conversion efficiency 4. 7% and micromorph tandem solar cells 8.5% were fabricated by VHF-PECVD （p layer and i layer of microcrystalline silicon solar cells were deposited in P chamber）, respectively.
文摘Using H 2 diluted silane,series of μc Si∶H films are fabricated at low temperature with VHF PECVD.The thickness measurements reveal that the deposition rates are obviously enhanced with higher plasma excitation frequency or working pressure,but increase firstly and then decrease with the increase of plasma power density.Raman spectra show that the crystallinity and the average grain sizes of the films strongly depend on the temperature of substrate and the concentration of silane.However,the plasma excitation frequency only has effect on the crystallinity,and a maximum occurs during the further increase of plasma excitation frequency.From XRD and TEM experiments,three preferential crystalline orientations (111),(220) and (311) are observed,and the average grain sizes are different for every crystalline orientation.
基金Project supported by the National Research Foundation of Korea(2011-0030804)the Korea Research Foundation(KRF2009-0076450)funded by the Korea Government(MEST)
文摘Abstract： An effective approach was conducted for estimating fracture toughness using the crack opening displacement （COD） method for plasma enhanced chemical vapor deposition （PECVD） coating materials. For this evaluation, an elastoplastic analysis was used to estimate critical COD values for single edge notched bending （SENB） specimens. The relationship between fracture toughness （Kic） and critical COD for SENB specimens was obtained. Microstructure of the interface between AleO3-TiO2 composite ceramic coatings and AISI 1045 steel substrates was studied by using scanning electron microscope （SEM）. Chemical compositions were clarified by energy-dispersive X-ray spectroscopy （EDS）. The results show that the interface between of Al203-TiO2 and substrate has mechanical combining. The nanohardness of the coatings can reach 1 200 GPa examined by nanoindentation. The Klc was calculated according to this relationship from critical COD. The bending process produces a significant relationship of COD independent of the axial force applied. Fractographic analysis was conducted to determine the crack length. From the physical analysis of nanoindentation curves, the elastic modulus of 1045/AI2O3-TiO2 is 180 GPa for the 50 μm film. The highest value of fracture toughness for 1045/A1203-TiO2-250 μm is 348 MPa·mv2.
基金National Basic Research Program of China(2006CB604902) Academic Human Resources Development inInstitutions of Higher Learning Under the Jurisdiction of Beijing Municipality(05002015200504)
文摘SiN, films are deposited on silicon wafers through plasma enhanced chemical vapor deposition （PECVD）. The relationship between the film stress and deposition factors is investigated. It is found that low stress films would be obtained by adjusting the ratio of low frequency（LF） power to high frequency（HF） power pulse time or the chamber pressure. The best of the two methods to control stress in the film is changing the percentage of LF power pulse time. The low stress condition is achieved when the percentage of low frequency power pulse time in total time（LF and HF pulse time） is close to 40%, The low stress cantilever of tunable vertical cavity surface emitting laser is obtained by using this deposition condition,
基金Project supported by Intelligent Microsystem Center(IMC)Project(2010-0008-276) supported by the National Core Research Center through the National Research Foundation of Korea funded by the Ministry of Education, Science and TechnologyProject(2010) supported by Pusan National University
文摘The etching effect of ammonia （NH3） on the growth of vertically aligned nanotubes/nanofibers （CNTs） was investigated by direct-current plasma enhanced chemical vapor deposition （DC-PECVD）. NH3 gas etches Ni catalyst layer to form nanoscale islands while NH3 plasma etches the deposited amorphous carbon. Based on the etching effect of NH3 gas on Ni catalyst, the differences of growing bundles of CNTs and single strand CNTs were discussed; specifically, the amount of optimal NH3 gas etching is different between bundles of CNTs and single strand CNTs. In contrast to the CNT carpet growth, the single strand CNT growth requires shorter etching time （5 min） than large catalytic patterns （10 rain） since nano dots already form catalyst islands for CNT growth. Through removing the plasma pretreatment process, the damage from being exposed at high temperature substrate occurring during the plasma generation time is minimized. High resolution transmission electron microscopy （HTEM） shows fishbone structure of CNTs grown by PECVD.
基金Supported by the National Natural Science Foundation of China under Grant No.60940020the Natural Foundation of Hebei Province under Grant No.E2008000619
文摘The amorphous silicon nanoparticles （Si NPs） embedded in silicon nitride （SiNx） films prepared by helicon wave plasma-enhanced chemical vapor deposition （HWP-CVD） technique are studied. From Raman scattering investigation, we determine that the deposited film has the structure of silicon nanocrystals embedded in silicon nitride （nc-Si/SiNx） thin film at a certain hydrogen dilution amount. The analysis of optical absorption spectra implies that the Si NPs is affected by quantum size effects and has the nature of an indirect-band-gap semiconductor. Further, considering the effects of the mean Si NP size and their dispersion on oscillator strength, and quantum-confinement, we obtain an analytical expression for the spectral absorbance of ensemble samples. Gaussian as well as lognormal size-distributions of the Si NPs are considered for optical absorption coefficient calculations. The influence of the particle size-distribution on the optical absorption spectra was systematically studied. We present the fitting of the optical absorption experimental data with our model and discuss the results.
文摘Amorphous silicon nitride films were deposited by low-frequency plasma-enhanced chemical vapor deposition（LF-PECVD） using silane and nitrogen as precursors. Characteristics such as deposition rate, surface morphology, and chemical composition were measured by spectroscopic ellipsometry（SE）, atomic force mieroscope（AFM） and x-ray photoelectron spectroscopy（XPS）. It was shown that amorphous silicon nitride film could be prepared by LF-PECVD with good uniformity and even surface. The XPS result indicated that a small quantity of oxygen was involved in the sample, which was discussed in this paper.
基金Foundation items: National Natural Science Foundations of China (No.10835004,No.10775031)Science and Technology Commission of Shanghai Municipality,China (No. 10XD1400100)
文摘The hydrophobic films of TixOy-CmHn. deposited from mixture gases of titanium isopropoxide （TTIP） and oxygen by plasma enhanced chemical vapor deposition （PECVD） were investigated. The films were investigated by scanning electron microscope （ SEM ）, transmission electron microscope （ TEM ）, Fourier transform infrared spectrometer （ FTIR）, X-Ray diffraction （ XRD ）, element analysis （ EA ）, ultraviolet visible spectrometer （ UV-Vis）, and water contact angle （WCA）. The results reveal that the surface of the films is formed by mierosized papillaes aggregated by inorganic and organic phases of complex nanoparticles with size from 50 nm to 200 nm when the discharge power is increased from 40 W to 150 W. All fdms demonstrate the strong broad of Ti-O-Ti stretching vibration at 400 -800cm-1, -CH bending vibration at 1 388 cm -1, and broadening -OH stretching vibration at 3 000-3500 cm-1 With the increase of the discharge power, the asdeposited film changes from amorphous to crystallization. The WCA of the film can be as high as 160°, indicating the hydrophobicity. The films show a similar ultraviolet absorption property as the bulk TiO2 film. The composition of the composition of film deposited at 150 W can be formulated as Tio.302-C1.5H3. Therefore, the composition formula of this hydrophobic film could be expressed as TiO2-C5H10O4.7. It is believed that the complex micro/nano structures of TiO2 and C5H10O4.7 residues are responsible for the observed hydrophobicity and the ultraviolet absorption property of the film.
文摘The authors report the observation of Extremely Low Frequency （ELF） plasma turbulence registered by DEMETER satellite in the ionosphere over the seismic and thunderstorm areas. The detail analysis of the electric field fluctuations for the selected strong earthquakes and thunderstorm is presented. Special attention is given to study of the characteristics of the spectra of these variations and searches of the nonlinear effects. This analysis is possible in the time interval when the waveform has been transmitted. Some attempt of this discussion is given in the paper.
