戽链(BBD)结构的CMOS红外模拟TDI探测器,由于其兼容普通CMOS工艺,并可以提高系统的信噪比,因而在空间遥感领域得到了广泛的应用。而基于焦平面面阵的数字TDI(Digital Time Delay and Integration)技术的研究与应用尚在起步阶段。利用中...戽链(BBD)结构的CMOS红外模拟TDI探测器,由于其兼容普通CMOS工艺,并可以提高系统的信噪比,因而在空间遥感领域得到了广泛的应用。而基于焦平面面阵的数字TDI(Digital Time Delay and Integration)技术的研究与应用尚在起步阶段。利用中国生产的320×256中波面阵红外探测器进行DTDI研究,对比分析了模拟TDI探测器的电子转移效率、BBD噪声、动态范围等方面的性能,突出了DTDI在结构和性能上的优势,并通过理论推导了DTDI对面阵探测器本身信噪比的提高,非均匀性的改善,同时分析了DTDI过程中盲元对性能的影响。最后,通过实验得到了16级DTDI的信噪比增加为2.5倍,非均匀性减少到1.68%,验证了DTDI技术对系统性能的改善,为DTDI技术的应用提供了理论参考。展开更多
A medium wave(MW)640×512(25μm)Mercury Cadmium Telluride(HgCdTe)polarimetric focal plane array(FPA)was demonstrated.The micro-polarizer array(MPA)has been carefully designed in terms of line grating structure opt...A medium wave(MW)640×512(25μm)Mercury Cadmium Telluride(HgCdTe)polarimetric focal plane array(FPA)was demonstrated.The micro-polarizer array(MPA)has been carefully designed in terms of line grating structure optimization and crosstalk suppression.A monolithic fabrication process with low damage was explored,which was verified to be compatible well with HgCdTe devices.After monolithic integration of MPA,NETD<9.5 mK was still maintained.Furthermore,to figure out the underlying mechanism that dominat⁃ed the extinction ratio(ER),specialized MPA layouts were designed,and the crosstalk was experimentally vali⁃dated as the major source that impacted ER.By expanding opaque regions at pixel edges to 4μm,crosstalk rates from adjacent pixels could be effectively reduced to approximately 2%,and promising ERs ranging from 17.32 to 27.41 were implemented.展开更多
A major motivation for this work is to investigate a method of computer simulation for compensating fixed pattern noise of the infrared focal plane arrays. A mathematical model of the output signal of focal plane arra...A major motivation for this work is to investigate a method of computer simulation for compensating fixed pattern noise of the infrared focal plane arrays. A mathematical model of the output signal of focal plane array was established; a compensating algorithm utilizing reference source was derived and simulating programs were designed. The images of compensating process verify the influence of nonuniformity of responsibility and offset on fixed pattern noise. The result show that simulating method of investigating compensation technology for focal plane arrays is feasible, the generated images and methods can be used to the study of image recognition.展开更多
A new algorithm of nonuniformity correction for infrared focal plane array(IRFPA) is reported,which is a combined algorithm based on both the two-point correction and artificial neural networks correction. The combine...A new algorithm of nonuniformity correction for infrared focal plane array(IRFPA) is reported,which is a combined algorithm based on both the two-point correction and artificial neural networks correction. The combined algorithm is calibrated by two-point correction,and the calibrated correction coefficients are automatically modified by BP algorithm. So it is not only calibrated,but also real-time processed. In adaptive nonuniformity correction algorithm,the phenomena ghost artifact and target fade-out are avoided by edge extraction. In order to get intensified image,the modified median filters are adopted. The simulated data indicates the proposed scheme is an effective algorithm.展开更多
Silicon(Si)diffraction microlens arrays are usually used to integrating with infrared focal plane arrays(IRFPAs)to improve their performance.The errors of lithography are unavoidable in the process of the Si diffrac-t...Silicon(Si)diffraction microlens arrays are usually used to integrating with infrared focal plane arrays(IRFPAs)to improve their performance.The errors of lithography are unavoidable in the process of the Si diffrac-tion microlens arrays preparation in the conventional engraving method.It has a serious impact on its performance and subsequent applications.In response to the problem of errors of Si diffraction microlens arrays in the conven-tional method,a novel self-alignment method for high precision Si diffraction microlens arrays preparation is pro-posed.The accuracy of the Si diffractive microlens arrays preparation is determined by the accuracy of the first li-thography mask in the novel self-alignment method.In the subsequent etching,the etched area will be protected by the mask layer and the sacrifice layer or the protective layer.The unprotection area is carved to effectively block the non-etching areas,accurately etch the etching area required,and solve the problem of errors.The high precision Si diffraction microlens arrays are obtained by the novel self-alignment method and the diffraction effi-ciency could reach 92.6%.After integrating with IRFPAs,the average blackbody responsity increased by 8.3%,and the average blackbody detectivity increased by 10.3%.It indicates that the Si diffraction microlens arrays can improve the filling factor and reduce crosstalk of IRFPAs through convergence,thereby improving the perfor-mance of the IRFPAs.The results are of great reference significance for improving their performance through opti-mizing the preparation level of micro nano devices.展开更多
The adaptive optics system for the second-generation Very Large Telescope-interferometer(VLTI)instrument GRAVITY consists of a novel cryogenic near-infrared wavefront sensor to be installed at each of the four unit te...The adaptive optics system for the second-generation Very Large Telescope-interferometer(VLTI)instrument GRAVITY consists of a novel cryogenic near-infrared wavefront sensor to be installed at each of the four unit telescopes of the Very Large Telescope(VLT).Feeding the GRAVITY wavefront sensor with light in the 1.4–2.4μm band,while suppressing laser light originating from the GRAVITY metrology system requires custom-built optical componets.In this paper,we present the development of a quantitative near-infraredpoint diffraction interferometric characterization technique,which allows measuring the transmitted wavefront error of the silicon entrance windows of the wavefront sensor cryostat.The technique can be readily applied to quantitative phase measurements in the near-infrared regime.Moreover,by employing a slightly off-axis optical setup,the proposed method can optimize the required spatial resolution and enable real time measurement capabilities.The feasibility of the proposed setup is demonstrated,followed by a theoretical analysis and experimental results.Our experimental results show that the phase error repeatability in the nanometer regime can be achieved.展开更多
文摘戽链(BBD)结构的CMOS红外模拟TDI探测器,由于其兼容普通CMOS工艺,并可以提高系统的信噪比,因而在空间遥感领域得到了广泛的应用。而基于焦平面面阵的数字TDI(Digital Time Delay and Integration)技术的研究与应用尚在起步阶段。利用中国生产的320×256中波面阵红外探测器进行DTDI研究,对比分析了模拟TDI探测器的电子转移效率、BBD噪声、动态范围等方面的性能,突出了DTDI在结构和性能上的优势,并通过理论推导了DTDI对面阵探测器本身信噪比的提高,非均匀性的改善,同时分析了DTDI过程中盲元对性能的影响。最后,通过实验得到了16级DTDI的信噪比增加为2.5倍,非均匀性减少到1.68%,验证了DTDI技术对系统性能的改善,为DTDI技术的应用提供了理论参考。
基金Supported by the self-funded project of Kunming Institute of Physics。
文摘A medium wave(MW)640×512(25μm)Mercury Cadmium Telluride(HgCdTe)polarimetric focal plane array(FPA)was demonstrated.The micro-polarizer array(MPA)has been carefully designed in terms of line grating structure optimization and crosstalk suppression.A monolithic fabrication process with low damage was explored,which was verified to be compatible well with HgCdTe devices.After monolithic integration of MPA,NETD<9.5 mK was still maintained.Furthermore,to figure out the underlying mechanism that dominat⁃ed the extinction ratio(ER),specialized MPA layouts were designed,and the crosstalk was experimentally vali⁃dated as the major source that impacted ER.By expanding opaque regions at pixel edges to 4μm,crosstalk rates from adjacent pixels could be effectively reduced to approximately 2%,and promising ERs ranging from 17.32 to 27.41 were implemented.
文摘A major motivation for this work is to investigate a method of computer simulation for compensating fixed pattern noise of the infrared focal plane arrays. A mathematical model of the output signal of focal plane array was established; a compensating algorithm utilizing reference source was derived and simulating programs were designed. The images of compensating process verify the influence of nonuniformity of responsibility and offset on fixed pattern noise. The result show that simulating method of investigating compensation technology for focal plane arrays is feasible, the generated images and methods can be used to the study of image recognition.
文摘A new algorithm of nonuniformity correction for infrared focal plane array(IRFPA) is reported,which is a combined algorithm based on both the two-point correction and artificial neural networks correction. The combined algorithm is calibrated by two-point correction,and the calibrated correction coefficients are automatically modified by BP algorithm. So it is not only calibrated,but also real-time processed. In adaptive nonuniformity correction algorithm,the phenomena ghost artifact and target fade-out are avoided by edge extraction. In order to get intensified image,the modified median filters are adopted. The simulated data indicates the proposed scheme is an effective algorithm.
基金Supported by the National Natural Science Foundation of China(NSFC 62105100)the National Key research and development program in the 14th five year plan(2021YFA1200700)。
文摘Silicon(Si)diffraction microlens arrays are usually used to integrating with infrared focal plane arrays(IRFPAs)to improve their performance.The errors of lithography are unavoidable in the process of the Si diffrac-tion microlens arrays preparation in the conventional engraving method.It has a serious impact on its performance and subsequent applications.In response to the problem of errors of Si diffraction microlens arrays in the conven-tional method,a novel self-alignment method for high precision Si diffraction microlens arrays preparation is pro-posed.The accuracy of the Si diffractive microlens arrays preparation is determined by the accuracy of the first li-thography mask in the novel self-alignment method.In the subsequent etching,the etched area will be protected by the mask layer and the sacrifice layer or the protective layer.The unprotection area is carved to effectively block the non-etching areas,accurately etch the etching area required,and solve the problem of errors.The high precision Si diffraction microlens arrays are obtained by the novel self-alignment method and the diffraction effi-ciency could reach 92.6%.After integrating with IRFPAs,the average blackbody responsity increased by 8.3%,and the average blackbody detectivity increased by 10.3%.It indicates that the Si diffraction microlens arrays can improve the filling factor and reduce crosstalk of IRFPAs through convergence,thereby improving the perfor-mance of the IRFPAs.The results are of great reference significance for improving their performance through opti-mizing the preparation level of micro nano devices.
文摘The adaptive optics system for the second-generation Very Large Telescope-interferometer(VLTI)instrument GRAVITY consists of a novel cryogenic near-infrared wavefront sensor to be installed at each of the four unit telescopes of the Very Large Telescope(VLT).Feeding the GRAVITY wavefront sensor with light in the 1.4–2.4μm band,while suppressing laser light originating from the GRAVITY metrology system requires custom-built optical componets.In this paper,we present the development of a quantitative near-infraredpoint diffraction interferometric characterization technique,which allows measuring the transmitted wavefront error of the silicon entrance windows of the wavefront sensor cryostat.The technique can be readily applied to quantitative phase measurements in the near-infrared regime.Moreover,by employing a slightly off-axis optical setup,the proposed method can optimize the required spatial resolution and enable real time measurement capabilities.The feasibility of the proposed setup is demonstrated,followed by a theoretical analysis and experimental results.Our experimental results show that the phase error repeatability in the nanometer regime can be achieved.
