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基于纳米反射面光窗口的激光起爆器
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作者 王悦勇 麻永平 +2 位作者 鱼卫星 程伟民 宋天莉 《火工品》 CAS CSCD 北大核心 2011年第2期1-3,共3页
针对激光起爆器光窗口镀制多层反射膜存在的问题,提出了光窗口采用纳米结构反射面技术,有效地解决以往多个起爆器检测时制定定量检测判据困难,以及光窗口反射面镀膜层脱落问题,从而提高了系统检测稳定性,以适应火工品预置在武器系统内... 针对激光起爆器光窗口镀制多层反射膜存在的问题,提出了光窗口采用纳米结构反射面技术,有效地解决以往多个起爆器检测时制定定量检测判据困难,以及光窗口反射面镀膜层脱落问题,从而提高了系统检测稳定性,以适应火工品预置在武器系统内长期贮存的需要。 展开更多
关键词 激光起爆器 纳米反射面 光窗口 检测
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The analysis of electrical performances of nanowires silicon solar cells 被引量:4
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作者 LI HaoFeng JIA Rui +3 位作者 DING WuChang CHEN Chen MENG YanLong LIU XinYu 《Science China(Technological Sciences)》 SCIE EI CAS 2011年第12期3341-3346,共6页
A theoretical model of silicon solar cells with ultra-small textured surface has been established based on depletion approximation and drift diffusion theory. The ultra-small textured surface achieves the low reflecta... A theoretical model of silicon solar cells with ultra-small textured surface has been established based on depletion approximation and drift diffusion theory. The ultra-small textured surface achieves the low reflectance by multiple reflections among the silicon nanowires (NWs). The electrical performances of the solar cells, including open circuit voltage (Voc), short circuit current (lsc) and conversion efficiency (η), are analyzed by the theoretical model. The results show that the low reflectance is not the only pursuit in manufacturing the Si NWs solar cells. Other factors including optimizing the surface passivation, improving the silicon wafers quality and designing the proper nanowire length should be considered together with NWs structure. 展开更多
关键词 ultra-small textured surface solar cell electrical properties
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Formation mechanism of multi-functional black silicon based on optimized deep reactive ion etching technique with SF_6/C_4F_8 被引量:2
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作者 ZHU Fu Yun ZHANG Xiao Sheng ZHANG Hai Xia 《Science China(Technological Sciences)》 SCIE EI CAS CSCD 2015年第2期381-389,共9页
This paper reports a controllable multi-functional black silicon surface with nanocone-forest structures fabricated by an optimized deep reactive ion etching(DRIE)technique using SF6/C4F8 in cyclic etching-passivation... This paper reports a controllable multi-functional black silicon surface with nanocone-forest structures fabricated by an optimized deep reactive ion etching(DRIE)technique using SF6/C4F8 in cyclic etching-passivation process,which is maskless,effective and controllable.The process conditions are investigated by systematically comparative experiments and core parameters have been figured out,including etching process parameters,pre-treatment,patterned silicon etching and inclined surface etching.Based on the experimental data,the formation mechanism of nanocone shape is developed,which provides a novel view for in-depth understanding of abnormal phenomena observed in the experiments under different process situations.After the optimization of the process parameters,the black silicon surfaces exhibit superhydrophobicity with tunable reflectance.Additionally,the quantitative relationship between nanocones aspect ratio and surface reflectance and static contact angle is obtained,which demonstrates that black silicon surfaces with unique functional properties(i.e.,cross-combination of reflectance and wettability)can be achieved by controlling the morphology of nanostructures. 展开更多
关键词 formation mechanism black silicon nanocone-forest deep reactive ion etching (DRIE) properties characterization
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