0603020 SILD法沉积纳米级SnO2薄膜的结构和气体响应特性 =Structural and gas response characterization of nano-size SnO2 films deposited by SILD method [刊,英]/G. Korotcenkov, V. Macsanov//Electronics Letters. -2003, 96(3...0603020 SILD法沉积纳米级SnO2薄膜的结构和气体响应特性 =Structural and gas response characterization of nano-size SnO2 films deposited by SILD method [刊,英]/G. Korotcenkov, V. Macsanov//Electronics Letters. -2003, 96(3).-602-609(E)展开更多
文摘0603020 SILD法沉积纳米级SnO2薄膜的结构和气体响应特性 =Structural and gas response characterization of nano-size SnO2 films deposited by SILD method [刊,英]/G. Korotcenkov, V. Macsanov//Electronics Letters. -2003, 96(3).-602-609(E)