To tackle the demoulding and conglutinating problem with the resist and hard mold in the nanoimprint lithography process, a soft mould can be used to demould and reduce the macro or mi- cro mismatch between mould bott...To tackle the demoulding and conglutinating problem with the resist and hard mold in the nanoimprint lithography process, a soft mould can be used to demould and reduce the macro or mi- cro mismatch between mould bottom surface and wafer top surface. In nanoimprint lithography process, a mathematical equation is formulated to demonstrate the relation between the residual re- sist thickness and the pressing force during pressing the mould toward the resist-coated wafer. Based on these analytical studies, a new imprint process, which includes a pre-cure release of the pressing force, was proposed for the high-conformity transfer of nano-patterns from the mould to the wafer. The results of a series of imprint experiments showed that the proposed loading process could meet the requirements for the imprint of different patterns and feature sizes while maintaining a uniform residual resist and non-distorted transfer of nano-patterns from the mould to the resist- coated wafer.展开更多
Metallic nanowire arrays （NWAs） possess wide application prospects due to their unique property, and the tailoring of NWAs＇ structure and morphology is of importance since it would significantly influence the per- ...Metallic nanowire arrays （NWAs） possess wide application prospects due to their unique property, and the tailoring of NWAs＇ structure and morphology is of importance since it would significantly influence the per- formance of NWAs. In the present work, the morphology and structure evolution of the NWAs prepared by the newly developed die nanoimprinting technique has been investigated in detail. It was found that increasing pro- cessing temperature, time and pressure could increase the length of the nanowires and change the NWAs＇ morphol- ogy from monodispersed form to aggregated form. Increasing processing time and temperature within the supercooled liquid region would promote crystallization, while increasing processing pressure could suppress the crystallization. This work provided important insights into the structure and morphology evolution, and therefore, the tailoring of metallic NWAs prepared by die nanoimprinting through adjusting the process parameters.展开更多
基金Supported by National Natural Science Foundation of China (No. E05020203) , "863" National Hi-Tech Program(No.2002AA420050) and "973" National Key Basic Research Program ( No. 2003CB716202).
文摘To tackle the demoulding and conglutinating problem with the resist and hard mold in the nanoimprint lithography process, a soft mould can be used to demould and reduce the macro or mi- cro mismatch between mould bottom surface and wafer top surface. In nanoimprint lithography process, a mathematical equation is formulated to demonstrate the relation between the residual re- sist thickness and the pressing force during pressing the mould toward the resist-coated wafer. Based on these analytical studies, a new imprint process, which includes a pre-cure release of the pressing force, was proposed for the high-conformity transfer of nano-patterns from the mould to the wafer. The results of a series of imprint experiments showed that the proposed loading process could meet the requirements for the imprint of different patterns and feature sizes while maintaining a uniform residual resist and non-distorted transfer of nano-patterns from the mould to the resist- coated wafer.
基金This work was supported by the National Natural Science Foundation of China （51271095 and 51101090）, and PhD Program Foundation of Ministry of Education of China （20120002110038）.
文摘Metallic nanowire arrays （NWAs） possess wide application prospects due to their unique property, and the tailoring of NWAs＇ structure and morphology is of importance since it would significantly influence the per- formance of NWAs. In the present work, the morphology and structure evolution of the NWAs prepared by the newly developed die nanoimprinting technique has been investigated in detail. It was found that increasing pro- cessing temperature, time and pressure could increase the length of the nanowires and change the NWAs＇ morphol- ogy from monodispersed form to aggregated form. Increasing processing time and temperature within the supercooled liquid region would promote crystallization, while increasing processing pressure could suppress the crystallization. This work provided important insights into the structure and morphology evolution, and therefore, the tailoring of metallic NWAs prepared by die nanoimprinting through adjusting the process parameters.
