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高硼硅玻璃全电炉产品结石缺陷分析及产生原因探究 被引量:3
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作者 杨德博 《玻璃搪瓷与眼镜》 CAS 2020年第1期38-42,共5页
在高硼硅玻璃全电熔炉技术的应用过程中产生了很多料质缺陷问题,这些问题的背后所关联的技术问题更需引起重视。本文针对某高硼硅全电熔产品出现的结石缺陷进行分析,并从实践角度对全电炉熔化原理、耐材选用、砌筑细节及日常技术管理等... 在高硼硅玻璃全电熔炉技术的应用过程中产生了很多料质缺陷问题,这些问题的背后所关联的技术问题更需引起重视。本文针对某高硼硅全电熔产品出现的结石缺陷进行分析,并从实践角度对全电炉熔化原理、耐材选用、砌筑细节及日常技术管理等需要注意的事项提出了具体的建议。 展开更多
关键词 高硼硅玻璃 全电熔炉 结石缺陷 分析和建议
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浮法玻璃几种结石缺陷的处理方法 被引量:2
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作者 王福强 张明朝 +1 位作者 董志斌 贾淑刚 《玻璃》 2022年第10期32-35,共4页
浮法玻璃板中出现的结石缺陷严重影响产品质量。利用偏光显微镜和荧光仪,对浮法玻璃生产中的几种玻璃结石缺陷进行检测,鉴别缺陷类型,分析其晶体结构及组成。结合几种缺陷的产生机理,找出结石缺陷产生的原因,并给出生产中预防缺陷出现... 浮法玻璃板中出现的结石缺陷严重影响产品质量。利用偏光显微镜和荧光仪,对浮法玻璃生产中的几种玻璃结石缺陷进行检测,鉴别缺陷类型,分析其晶体结构及组成。结合几种缺陷的产生机理,找出结石缺陷产生的原因,并给出生产中预防缺陷出现的防范措施。 展开更多
关键词 浮法玻璃 结石缺陷 刚玉结石 石英析晶
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浮法超薄电子玻璃常见熔化结石缺陷分析
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作者 郑旭 乔伟 +1 位作者 聂航 周雪 《信息记录材料》 2023年第11期33-35,共3页
浮法超薄电子玻璃作为一种性能优异的新型透明材料,已经广泛应用于柔性电子、光电显示等领域。然而,由于其独特的制备过程,常常存在熔化结石缺陷。本文首先介绍了浮法超薄电子玻璃的制备方法和熔化结石缺陷的形成原因。根据缺陷特点,分... 浮法超薄电子玻璃作为一种性能优异的新型透明材料,已经广泛应用于柔性电子、光电显示等领域。然而,由于其独特的制备过程,常常存在熔化结石缺陷。本文首先介绍了浮法超薄电子玻璃的制备方法和熔化结石缺陷的形成原因。根据缺陷特点,分析了缺陷的形成机制,包括熔融温度过高过低、熔融时间过长过短、出料量大小变化等。其次结合一些常见的检测方法以便更好地观察熔化结石缺陷。最后提出了加强生产过程控制、优化原料性能、改进熔化技术等措施,以提高浮法超薄电子玻璃的质量和稳定性。 展开更多
关键词 浮法超薄电子玻璃 熔化结石缺陷 形成机制 检测方法 解决方案
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Towards full repair of defects in reduced graphene oxide films by two-step graphitization 被引量:12
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作者 Ruben Rozada Juan I, Paredes Silvia Villar-Rodil Amelia Marlinez-Alonso Juan M. D. Tascon 《Nano Research》 SCIE EI CAS CSCD 2013年第3期216-233,共18页
The complete restoration of a perfect carbon lattice has been a central issue in the research on graphene derived from graphite oxide since this preparation route was first proposed several years ago, but such a goal ... The complete restoration of a perfect carbon lattice has been a central issue in the research on graphene derived from graphite oxide since this preparation route was first proposed several years ago, but such a goal has so far remained elusive. Here, we demonstrate that the highly defective structure of reduced graphene oxide sheets assembled into free-standing, paper-like films can be fully repaired by means of high temperature annealing (graphitization). Characterization of the films by X-ray photoelectron and Raman spectroscopy, X-ray diffraction and scanning tunneling microscopy indicated that the main stages in the transformation of the films were (i) complete removal of oxygen functional groups and generation of atomic vacancies (up to 1,500 ~C), and (ii) vacancy annihilation and coalescence of adjacent overlapping sheets to yield continuous polycrystalline layers (1,800-2,700 ~C) similar to those of highly oriented graphites. The prevailing type of defect in the polycrystalline layers were the grain boundaries separating neighboring domains, which were typically a few hundred nanometers in lateral size, exhibited long-range graphitic order and were virtually free of even atomic-sized defects. The electrical conductivity of the annealed films was as high as 577,000 S-m-1, which is by far the largest value reported to date for any material derived from graphene oxide, and strategies for further improvement without the need to resort to higher annealing temperatures are suggested. Overall, this work opens the prospect of truly achieving a complete restoration of the carbon lattice in graphene oxide materials. 展开更多
关键词 graphene graphene oxide FILMS ANNEALING defect
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