Muehlewbeckia complera was introduced to China in 2002 as indoor-hanging ornamental foliage plant. The experiment of the shade tolerance for this species was carried out in different light intensities (0.14–946.00 μ...Muehlewbeckia complera was introduced to China in 2002 as indoor-hanging ornamental foliage plant. The experiment of the shade tolerance for this species was carried out in different light intensities (0.14–946.00 μmol·m?2·s?1). After 40 days in experimental areas, leaf photosynthentic characteristics indexes ofM. complera in different photosynthesis active radiation (PAR) were measured with LI-COR6400 apparatus, such as the light compensation point, light saturation point, and maximum net photosynthesis rate, at the same time, the increments of total leaf area and leaf amount were measured. The results showed that the optimum light intensity range forM. complera was from 9.26 μmol·m?2·s?1 to 569.00 μmol·m?2·s?1 (463–28150 lx, relative humidity (RH) for 46–60%, temperature at 16–22°C). Under this condition, leaf photosynthetic efficiency was tiptop. AlthoughM. complera belonged to the moderate sun-adaptation plant species, the plant growth was inhibited when PAR increased to the level of 569.000 μmol·m?2·s?1 or above.M. complera could sprout new leaves in photosynthesis active radiation of 0.16–19.22 μmol·m?2·s?1 (8–961 lx), or 10 μmol·m?2·s?1 for above 6 h. Keywords Muehlewbeckia complera - Shade tolerance - Cultivation - Photosynthesis CLC number S602.1 Document code A Foundation item: This study was supported by the Research Foundation of Northeast Forestry University.Biography: YUE Hua (1962-), female, Associate professor in Northeast Forestry University, Harbin 150040, P. R. China.Responsible editor: Zhu Hong展开更多
Supertetrahedral zinc-gallium-tin sulfide cluster modified with reduced graphene oxide protective layer was first synthesized, which exhibited an excellent photoelectrochemical performance and enhanced stability in co...Supertetrahedral zinc-gallium-tin sulfide cluster modified with reduced graphene oxide protective layer was first synthesized, which exhibited an excellent photoelectrochemical performance and enhanced stability in comparison to supertetrahedral clusters.展开更多
基金Supported by the Research Foundation of Northeast Forestry University.
文摘Muehlewbeckia complera was introduced to China in 2002 as indoor-hanging ornamental foliage plant. The experiment of the shade tolerance for this species was carried out in different light intensities (0.14–946.00 μmol·m?2·s?1). After 40 days in experimental areas, leaf photosynthentic characteristics indexes ofM. complera in different photosynthesis active radiation (PAR) were measured with LI-COR6400 apparatus, such as the light compensation point, light saturation point, and maximum net photosynthesis rate, at the same time, the increments of total leaf area and leaf amount were measured. The results showed that the optimum light intensity range forM. complera was from 9.26 μmol·m?2·s?1 to 569.00 μmol·m?2·s?1 (463–28150 lx, relative humidity (RH) for 46–60%, temperature at 16–22°C). Under this condition, leaf photosynthetic efficiency was tiptop. AlthoughM. complera belonged to the moderate sun-adaptation plant species, the plant growth was inhibited when PAR increased to the level of 569.000 μmol·m?2·s?1 or above.M. complera could sprout new leaves in photosynthesis active radiation of 0.16–19.22 μmol·m?2·s?1 (8–961 lx), or 10 μmol·m?2·s?1 for above 6 h. Keywords Muehlewbeckia complera - Shade tolerance - Cultivation - Photosynthesis CLC number S602.1 Document code A Foundation item: This study was supported by the Research Foundation of Northeast Forestry University.Biography: YUE Hua (1962-), female, Associate professor in Northeast Forestry University, Harbin 150040, P. R. China.Responsible editor: Zhu Hong
文摘Supertetrahedral zinc-gallium-tin sulfide cluster modified with reduced graphene oxide protective layer was first synthesized, which exhibited an excellent photoelectrochemical performance and enhanced stability in comparison to supertetrahedral clusters.
