期刊文献+
共找到2篇文章
< 1 >
每页显示 20 50 100
纳米硅氧多层薄膜低温调控及其发光特性 被引量:3
1
作者 李云 张博惠 +3 位作者 高东泽 丛日东 于威 路万兵 《光学精密工程》 EI CAS CSCD 北大核心 2018年第8期1960-1966,共7页
为了研究硅量子点薄膜在太阳电池中的应用,本文采用甚高频等离子体增强化学气相沉积技术,低温制备了镶嵌有纳米晶硅(nc-Si)的纳米硅氧多层(nc-SiOx/a-SiOx)薄膜样品。TEM图显示,通过调整nc-SiOx层的厚度,实现了薄膜多层结构的低温调控... 为了研究硅量子点薄膜在太阳电池中的应用,本文采用甚高频等离子体增强化学气相沉积技术,低温制备了镶嵌有纳米晶硅(nc-Si)的纳米硅氧多层(nc-SiOx/a-SiOx)薄膜样品。TEM图显示,通过调整nc-SiOx层的厚度,实现了薄膜多层结构的低温调控。利用拉曼散射光谱(Raman)、紫外可见透射光谱以及稳/瞬态光致发光(PL)谱等检测手段对薄膜的微观结构、能带特征以及发光特性进行了分析。光吸收谱分析表明,nc-Si粒子尺寸及其a-SiOx边界层共同影响薄膜的光学带隙。稳/瞬态PL谱分析表明,多层结构发光表现为一个固定于1.19eV附近的发光峰和一个随nc-SiOx层厚度增加而发生红移的发光峰,其中固定发光峰归因于非晶SiOx网络中缺陷发光,发光衰减寿命约在4.6μs,峰位可调的发光峰为nc-Si量子限制效应-缺陷态复合发光,对应两个发光衰减过程,其中慢发光衰减寿命随nc-SiOx层厚度增加由9.9μs增加到16.5μs,快发光衰减过程基本保持不变。低温PL谱的温度依赖特性进一步表明,薄膜样品的发光主要表现为nc-Si的量子限制效应发光。 展开更多
关键词 纳米硅氧多层薄膜 微观结构 能带特征 光致发光 量子限制效应
下载PDF
Growth and low-energy electron microscopy characteri- zation of monolayer hexagonal boron nitride on epitaxial cobalt 被引量:7
2
作者 Carlo M. Orofeo Satoru Suzuki Hiroyuki Kageshima Hiroki Hibino 《Nano Research》 SCIE EI CAS CSCD 2013年第5期335-347,共13页
Low-energy electron microscopy (LEEM) has been used to study the structure, initial growth orientation, growth progression, and the number of layers of atomically thin hexagonal boron nitride (h-BN) films. The h-B... Low-energy electron microscopy (LEEM) has been used to study the structure, initial growth orientation, growth progression, and the number of layers of atomically thin hexagonal boron nitride (h-BN) films. The h-BN films are grown on heteroepitaxial Co using chemical vapor deposition (CVD) at low pressure. Our findings from LEEM studies include the growth of monolayer film having two, oppositely oriented, triangular BN domains commensurate with the Co lattice. The growth of h-BN appears to be self-limiting at a monolayer, with thicker domains only appearing in patches, presumably initiated between domain boundaries. Reflectivity measurements of the thicker h-BN films show oscillations resulting from the resonant electron transmission through quantized electronic states of the h-BN films, with the number of minima scaling up with the number of h-BN layers. First principles density functional theory (DFT) calculations show that the positions of oscillations are related to the electronic band structure of h-BN. 展开更多
关键词 chemical vapor deposition COBALT domain boundaries hexagonal boron nitride low-energy electronmicroscopy (LEEM)
原文传递
上一页 1 下一页 到第
使用帮助 返回顶部