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等离子体基脉冲偏压沉积DLC膜的氢分布和氢含量 被引量:2
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作者 夏立芳 孙明仁 《无机材料学报》 SCIE EI CAS CSCD 北大核心 2002年第4期777-781,共5页
用核反应分析方法,对等离子体基脉冲偏压沉积DLC膜的氢分布和氢含量进行了较系统的研究.结果表明,用等离子体基脉冲偏压沉积技术可获得较低氢含量的DLC膜;其氢含量范围约为6at%~17at%,且氢沿膜厚是均匀分布的,随等离子体密度及离化... 用核反应分析方法,对等离子体基脉冲偏压沉积DLC膜的氢分布和氢含量进行了较系统的研究.结果表明,用等离子体基脉冲偏压沉积技术可获得较低氢含量的DLC膜;其氢含量范围约为6at%~17at%,且氢沿膜厚是均匀分布的,随等离子体密度及离化率降低,DLC膜的氢含量增加,荷能离子对生长表面的轰击具有较强的析氢作用,工作气体中引入氢气促进DLC膜中氢的析出. 展开更多
关键词 等离子体 脉冲偏压沉积 DLC膜 氢分布 氢含量 类金刚石膜 核反应分析
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脉冲偏压电弧离子低温沉积TiN硬质薄膜的力学性能 被引量:35
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作者 黄美东 孙超 +2 位作者 林国强 董闯 闻立时 《金属学报》 SCIE EI CAS CSCD 北大核心 2003年第5期516-520,共5页
利用直流和脉冲偏压电弧离子镀技术沉积TiN硬质薄膜,研究了不同偏压下基体的沉积温度、薄膜的表面形貌及力学性能。结果表明,与直流偏压相比,脉冲偏压可以明显降低基体的沉积温度,大大减少薄膜表面的大颗粒污染,改善表面形貌,而薄膜的... 利用直流和脉冲偏压电弧离子镀技术沉积TiN硬质薄膜,研究了不同偏压下基体的沉积温度、薄膜的表面形貌及力学性能。结果表明,与直流偏压相比,脉冲偏压可以明显降低基体的沉积温度,大大减少薄膜表面的大颗粒污染,改善表面形貌,而薄膜的综合力学性能仍保持良好,说明利用脉冲偏压技术是实现电弧离子镀低温沉积的有效途径。 展开更多
关键词 电弧离子镀 低温沉积 脉冲偏压 TIN薄膜
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Intrinsic exchange bias effect in strain-engineered single antiferromagnetic LaMnO3 films 被引量:1
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作者 Guowei Zhou Huihui Ji +2 位作者 Yuhao Bai Zhiyong Quan Xiaohong Xu 《Science China Materials》 SCIE EI CSCD 2019年第7期1046-1052,共7页
In this work, epitaxial growth of LaMnO3 thin films on different substrates using pulsed laser deposition under tensile and compressive strain was studied. The intrinsic exchange bias effect was observed in the single... In this work, epitaxial growth of LaMnO3 thin films on different substrates using pulsed laser deposition under tensile and compressive strain was studied. The intrinsic exchange bias effect was observed in the single A-type antiferromagnetic LaMnO3 films no matter whether the tensile or compressive strain was supplied by the substrates. Due to the lattice mismatch between the film and different substrates, the intense strain can induce MnO6 octahedral rotation in the bottom region of the film neighboring the substrate, which leads to the distortion of MnO6 octahedron and the net magnetic behavior. However, the upper part maintains the original A-type antiferromagnetic order due to strain relaxation. The exchange bias effect in single films is attributed to the coupling between the bottom canted magnetic part and the upper antiferromagnetic region. The observation of exchange bias in single films on different substrates enables the emergence of a new class of biasing components in spintronics, which are based on strain-engineering. 展开更多
关键词 magnetic insulating state exchange bias Mn06 octahedral rotation strain and interface effects magnetic properties
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