Polycrystalline ZnS films were prepared by pulsed laser deposition （PLD） on quartz glass substrates under different growth conditions at different substrate temperatures of 20, 200, 400, and 600 ℃, which is a suita...Polycrystalline ZnS films were prepared by pulsed laser deposition （PLD） on quartz glass substrates under different growth conditions at different substrate temperatures of 20, 200, 400, and 600 ℃, which is a suitable alternative to chemical bath deposited （CBD） CdS as a buffer layer in Cu（In,Ga）Se2 （CIGS） solar cells. X-ray diffraction studies indicate the films are polycrystalline with zinc-blende structure and they exhibit preferential orientation along the cubic phase β-ZnS （111） direction, which conflicts with the conclusion of wurtzite structure by Murali that the ZnS films deposited by pulse plating technique was polycrystalline with wurtzite structure. The Raman spectra of grown films show Al mode at approximately 350 cm^-1, generally observed in the cubic phase β-ZnS compounds. The planar and the cross-sectional morphology were observed by scanning electron microscopic. The dense, smooth, uniform grains are formed on the quartz glass substrates through PLD technique. The grain size of ZnS deposited by PLD is much smaller than that of CdS by conventional CBD method, which is analyzed as the main reason of detrimental cell performance. The composition of the ZnS films was also measured by X-ray fluorescence. The typical ZnS films obtained in this work are near stoichiometric and only a small amount of S-rich. The energy band gaps at different temperatures were obtained by absorption spectroscopy measurement, which increases from 3.2 eV to 3.7 eV with the increasing of the deposition temperature. ZnS has a wider energy band gap than CdS （2.4 eV）, which can enhance the blue response of the photovoltaic cells. These results show the high-quality of these substitute buffer layer materials are prepared through an all-dry technology, which can be used in the manufacture of CIGS thin film solar cells.展开更多
Multilayer gallium and aluminum doped ZnO （GZO/AZO） films were fabricated by alternative deposition of Ga-doped zinc oxide（GZO） and Al-doped zinc oxide（AZO） thin film by using pulsed laser deposition（PLD） proc...Multilayer gallium and aluminum doped ZnO （GZO/AZO） films were fabricated by alternative deposition of Ga-doped zinc oxide（GZO） and Al-doped zinc oxide（AZO） thin film by using pulsed laser deposition（PLD） process. The electrical and optical properties of these GZO/AZO thin films were investigated and compared with those of GZO and AZO thin films. The GZO/AZO （1：1） thin film deposited at 400 ~C shows the electrical resistivity of 4.18 x 10 4 ~.cm, an electron concentration of 7.5 x 1020/cm3, and carrier mobility of 25.4 cm2/（V.s）. The optical transmittances of GZO/AZO thin films are over 85%. The optical band gap energy of GZO/AZO thin films linearly decreases with increasing the AI ratio.展开更多
Pulsed laser deposition(PLD) is emerging as the most rapid and efficient technique for fabricating the many compound films. ZnO thin films can be prepared under various deposition conditions by PLD. The effects of var...Pulsed laser deposition(PLD) is emerging as the most rapid and efficient technique for fabricating the many compound films. ZnO thin films can be prepared under various deposition conditions by PLD. The effects of various substrate temperature, oxygen partial pressure, annealing temperature, substrate, buffer layers thickness and film thickness on micro-structural, optical and electrical properties of ZnO films grown by PLD technology are reviewed. ZnO films with special function can grow under proper conditions by PLD.展开更多
ZnO thin films are deposited on n-Si（111） substrates by pulsed laser deposition（PLD） system. Then the samples are annealed at different temperatures in air ambient and their properties are investigated particularl...ZnO thin films are deposited on n-Si（111） substrates by pulsed laser deposition（PLD） system. Then the samples are annealed at different temperatures in air ambient and their properties are investigated particularly as a function of annealing temperature. The microstructure, morphology and optical properties of the as-grown ZnO films are studied by X-ray diffraetion（XRD）. atomic force mieroseope（AFM）, Fourier transform infrared spectroscopy（FTIR） and photoluminescence（PL） spectra. The results show that the as- grown ZnO films have a hexagonal wurtzite structure with a preferred c-axis orientation. Moreover, the diameters of the ZnO crystallites become larger and the crystal quality of the ZnO fihns is improved with the increase of annealing temperature.展开更多
In this study, Bismuth doped Titanium dioxide thin films were deposited on glass substrates by a pulse laser deposition using laser. The effect of annealing temperature on the structural and electrical properties was ...In this study, Bismuth doped Titanium dioxide thin films were deposited on glass substrates by a pulse laser deposition using laser. The effect of annealing temperature on the structural and electrical properties was investigated. X-ray diffraction pattern for pure and doped titanium dioxide films with different doping different ratio with Bi show that these films have amorphous structure oanvert to polycrystalline structure with annealing and doping and have a good identically with standard peaks for Anatase and Rutile phases. The orientation was at specific direction for Rutile. The crystalline of films increases by the increase of doping ratio. The crystalline increased with annealing temperature. Annealed films at different annealing temperatures have been studied. The results show that these films have two activation energies and by increasing the doping ratio, the activation energies and the conductivity increase. Both the annealing and composition effects on Hall constant, density of electron carders and Hall mobility are studied. Hall Effect measurements show that all films have n- type charge conductivity and the concentration increases while the mobility decreases with doping and annealing.展开更多
Sr2Bi4Ti5O18(SBTi) single layered and Sr2Bi4Ti5O18 /Pb(Zr0.53Ti0.47)O3(SBTi/PZT) bilayered thin films have been prepared on Pt/TiO2/SiO2/Si substrates by pulsed-laser deposition(PLD).The related structural characteriz...Sr2Bi4Ti5O18(SBTi) single layered and Sr2Bi4Ti5O18 /Pb(Zr0.53Ti0.47)O3(SBTi/PZT) bilayered thin films have been prepared on Pt/TiO2/SiO2/Si substrates by pulsed-laser deposition(PLD).The related structural characterizations and electrical properties have been comparatively investigated.X-ray diffraction reveals that both films have crystallized into perovskite phases and scanning electron microscopy shows the sharp interfaces.Both films show well-saturated ferroelectric hysteresis loops,however,compared with the single layered SBTi films,the SBTi/PZT bilayered films have significantly increased remnant polarization(Pr) and decreased coercive field(Ec),with the applied field of 260 kV/cm.The measured Pr and Ec of SBTi and SBTi/PZT films were 7.9 C/cm 2,88.1 kV/cm and 13.0 C/cm 2,51.2 kV/cm,respectively.In addition,both films showed good fatigue-free characteristics,the switchable polarization decreased by 9% and 11% of the initial values after 2.2 10 9 switching cycles for the SBTi single layered films and the SBTi/PZT bilayered films,respectively.Our results may provide some guidelines for further optimization of multilayered ferroelectric thin films.展开更多
ZnO/diamond-like carbon(DLC)thin films are deposited by pulsed laser deposition(PLD),and the room-temperature photoluminescence(PL)is investigated.Using a fluorescence spectrophotometer,we obtain the PL spectra of DLC...ZnO/diamond-like carbon(DLC)thin films are deposited by pulsed laser deposition(PLD),and the room-temperature photoluminescence(PL)is investigated.Using a fluorescence spectrophotometer,we obtain the PL spectra of DLC/Si and ZnO/Si thin films deposited at different substrate temperatures.The ZnO/DLC thin films show a broadband emission almost containing the entire visible spectrum.The Gaussian fitting curves of PL spectra reveal that the visible emission of ZnO/DLC thin films consists of three peaks centered at 381 nm,526 nm and 682 nm,which are attributed to the radiative recombination of ZnO and DLC,respectively.The Commission International de l,Eclairage(CIE)1931(x,y)chromaticity space of ZnO/DLC thin films indicates that the visible PL spectrum is very close to the standard white-light region.展开更多
Orthorhombic HoMnO 3 films with a-axis orientations were prepared epitaxially on Nb-1.0wt%-doped SrTiO 3 single crystal substrates by using the pulsed laser deposition technique to fabricate all-oxide heterojunctions....Orthorhombic HoMnO 3 films with a-axis orientations were prepared epitaxially on Nb-1.0wt%-doped SrTiO 3 single crystal substrates by using the pulsed laser deposition technique to fabricate all-oxide heterojunctions.X-ray diffraction and atomic force microscopy were then used to characterize the films.The temperature dependent current-voltage measurement displayed diode-like rectifying behavior,and the forward current was perfectly fitted using the thermionic emission model.The ideality factor and built-in potential were suggested.展开更多
Amorphous chalcogenide thin films were fabricated by the pulsed laser deposition technique. Thereafter, the stacks of multilayered thin films for reflectors and microcavity were designed for telecommunication waveleng...Amorphous chalcogenide thin films were fabricated by the pulsed laser deposition technique. Thereafter, the stacks of multilayered thin films for reflectors and microcavity were designed for telecommunication wavelength. The prepared multilayered thin films for reflectors show good compatibility. The microcavity structure consists of Ge_(25)Ga)5Sb_(10)S_(65)(doped with Er^(3+)) spacer layer surrounded by two 5-layer As_(40)Se_(60)/Ge_(25)Sb_(5)S_(70) reflectors. Scanning/transmission electron microscopy results show good periodicity, great adherence and smooth interfaces between the alternating dielectric layers, which confirms a suitable compatibility between different materials. The results demonstrate that the chalcogenides can be used for preparing vertical Bragg reflectors and microcavity with high quality.展开更多
Orthorhombic HoMnO3(HMO) thin films were grown epitaxially on LaAlO3(001) substrates by using pulsed laser deposition technique. The films showed perfect orthorhombic crystallization and were well-aligned with the sub...Orthorhombic HoMnO3(HMO) thin films were grown epitaxially on LaAlO3(001) substrates by using pulsed laser deposition technique. The films showed perfect orthorhombic crystallization and were well-aligned with the substrates. The in-plane dielectric constant and loss of HMO films were measured as functions of temperature(80–300 K) and frequency(120 Hz–100 kHz) by using coplanar interdigital electrodes. Two thermally activated dielectric relaxations were found, and the respective peaks shifted to higher temperatures as the measuring frequency increased. The in-plane dielectric properties of epitaxial orthorhombic HMO films were considered as universal dielectric response behavior, and the dipolar effects and the hopping conductivity induced by the charge carriers were used to explain the results.展开更多
基金ACKNOWLEDGMENTS This work was supported by the National Basic Research Program of China （No.2006CB92200） and the National Natural Science Foundation of China （No.10774136）.
文摘Polycrystalline ZnS films were prepared by pulsed laser deposition （PLD） on quartz glass substrates under different growth conditions at different substrate temperatures of 20, 200, 400, and 600 ℃, which is a suitable alternative to chemical bath deposited （CBD） CdS as a buffer layer in Cu（In,Ga）Se2 （CIGS） solar cells. X-ray diffraction studies indicate the films are polycrystalline with zinc-blende structure and they exhibit preferential orientation along the cubic phase β-ZnS （111） direction, which conflicts with the conclusion of wurtzite structure by Murali that the ZnS films deposited by pulse plating technique was polycrystalline with wurtzite structure. The Raman spectra of grown films show Al mode at approximately 350 cm^-1, generally observed in the cubic phase β-ZnS compounds. The planar and the cross-sectional morphology were observed by scanning electron microscopic. The dense, smooth, uniform grains are formed on the quartz glass substrates through PLD technique. The grain size of ZnS deposited by PLD is much smaller than that of CdS by conventional CBD method, which is analyzed as the main reason of detrimental cell performance. The composition of the ZnS films was also measured by X-ray fluorescence. The typical ZnS films obtained in this work are near stoichiometric and only a small amount of S-rich. The energy band gaps at different temperatures were obtained by absorption spectroscopy measurement, which increases from 3.2 eV to 3.7 eV with the increasing of the deposition temperature. ZnS has a wider energy band gap than CdS （2.4 eV）, which can enhance the blue response of the photovoltaic cells. These results show the high-quality of these substitute buffer layer materials are prepared through an all-dry technology, which can be used in the manufacture of CIGS thin film solar cells.
基金supported by the Yeungnam University Research Grants in 2009
文摘Multilayer gallium and aluminum doped ZnO （GZO/AZO） films were fabricated by alternative deposition of Ga-doped zinc oxide（GZO） and Al-doped zinc oxide（AZO） thin film by using pulsed laser deposition（PLD） process. The electrical and optical properties of these GZO/AZO thin films were investigated and compared with those of GZO and AZO thin films. The GZO/AZO （1：1） thin film deposited at 400 ~C shows the electrical resistivity of 4.18 x 10 4 ~.cm, an electron concentration of 7.5 x 1020/cm3, and carrier mobility of 25.4 cm2/（V.s）. The optical transmittances of GZO/AZO thin films are over 85%. The optical band gap energy of GZO/AZO thin films linearly decreases with increasing the AI ratio.
文摘Pulsed laser deposition(PLD) is emerging as the most rapid and efficient technique for fabricating the many compound films. ZnO thin films can be prepared under various deposition conditions by PLD. The effects of various substrate temperature, oxygen partial pressure, annealing temperature, substrate, buffer layers thickness and film thickness on micro-structural, optical and electrical properties of ZnO films grown by PLD technology are reviewed. ZnO films with special function can grow under proper conditions by PLD.
基金National Natural Science Foundation of China(90301002 ,90201025)
文摘ZnO thin films are deposited on n-Si（111） substrates by pulsed laser deposition（PLD） system. Then the samples are annealed at different temperatures in air ambient and their properties are investigated particularly as a function of annealing temperature. The microstructure, morphology and optical properties of the as-grown ZnO films are studied by X-ray diffraetion（XRD）. atomic force mieroseope（AFM）, Fourier transform infrared spectroscopy（FTIR） and photoluminescence（PL） spectra. The results show that the as- grown ZnO films have a hexagonal wurtzite structure with a preferred c-axis orientation. Moreover, the diameters of the ZnO crystallites become larger and the crystal quality of the ZnO fihns is improved with the increase of annealing temperature.
文摘In this study, Bismuth doped Titanium dioxide thin films were deposited on glass substrates by a pulse laser deposition using laser. The effect of annealing temperature on the structural and electrical properties was investigated. X-ray diffraction pattern for pure and doped titanium dioxide films with different doping different ratio with Bi show that these films have amorphous structure oanvert to polycrystalline structure with annealing and doping and have a good identically with standard peaks for Anatase and Rutile phases. The orientation was at specific direction for Rutile. The crystalline of films increases by the increase of doping ratio. The crystalline increased with annealing temperature. Annealed films at different annealing temperatures have been studied. The results show that these films have two activation energies and by increasing the doping ratio, the activation energies and the conductivity increase. Both the annealing and composition effects on Hall constant, density of electron carders and Hall mobility are studied. Hall Effect measurements show that all films have n- type charge conductivity and the concentration increases while the mobility decreases with doping and annealing.
基金supported by the National Natural Science Foundation(Grant Nos. 50805076 and 51275237)the National Natural Science Key Corporation Foundations (Grant No. 61161120323)Science Research Foundation at NUAA (Grant No. NS2012014)
文摘Sr2Bi4Ti5O18(SBTi) single layered and Sr2Bi4Ti5O18 /Pb(Zr0.53Ti0.47)O3(SBTi/PZT) bilayered thin films have been prepared on Pt/TiO2/SiO2/Si substrates by pulsed-laser deposition(PLD).The related structural characterizations and electrical properties have been comparatively investigated.X-ray diffraction reveals that both films have crystallized into perovskite phases and scanning electron microscopy shows the sharp interfaces.Both films show well-saturated ferroelectric hysteresis loops,however,compared with the single layered SBTi films,the SBTi/PZT bilayered films have significantly increased remnant polarization(Pr) and decreased coercive field(Ec),with the applied field of 260 kV/cm.The measured Pr and Ec of SBTi and SBTi/PZT films were 7.9 C/cm 2,88.1 kV/cm and 13.0 C/cm 2,51.2 kV/cm,respectively.In addition,both films showed good fatigue-free characteristics,the switchable polarization decreased by 9% and 11% of the initial values after 2.2 10 9 switching cycles for the SBTi single layered films and the SBTi/PZT bilayered films,respectively.Our results may provide some guidelines for further optimization of multilayered ferroelectric thin films.
基金supported by the National Natural Science Foundation of China(No.11144010)the Innovation Project of Ludong University(No.LY20062802)
文摘ZnO/diamond-like carbon(DLC)thin films are deposited by pulsed laser deposition(PLD),and the room-temperature photoluminescence(PL)is investigated.Using a fluorescence spectrophotometer,we obtain the PL spectra of DLC/Si and ZnO/Si thin films deposited at different substrate temperatures.The ZnO/DLC thin films show a broadband emission almost containing the entire visible spectrum.The Gaussian fitting curves of PL spectra reveal that the visible emission of ZnO/DLC thin films consists of three peaks centered at 381 nm,526 nm and 682 nm,which are attributed to the radiative recombination of ZnO and DLC,respectively.The Commission International de l,Eclairage(CIE)1931(x,y)chromaticity space of ZnO/DLC thin films indicates that the visible PL spectrum is very close to the standard white-light region.
基金supported by the National Natural Science Foundation of China (Grant No. 10704065)Shandong Excellent Young Scientist Science Foundation (Grant No. 2006BS01235)the Natural Science Funds of Shandong Province for Distinguished Young Scholar (Grant No. JQ200802)
文摘Orthorhombic HoMnO 3 films with a-axis orientations were prepared epitaxially on Nb-1.0wt%-doped SrTiO 3 single crystal substrates by using the pulsed laser deposition technique to fabricate all-oxide heterojunctions.X-ray diffraction and atomic force microscopy were then used to characterize the films.The temperature dependent current-voltage measurement displayed diode-like rectifying behavior,and the forward current was perfectly fitted using the thermionic emission model.The ideality factor and built-in potential were suggested.
基金supported by the National Natural Science Foundation of China(No.61308092)the Natural Science Foundation of Liaoning Province of China(No.2013010590-401/20131116)
文摘Amorphous chalcogenide thin films were fabricated by the pulsed laser deposition technique. Thereafter, the stacks of multilayered thin films for reflectors and microcavity were designed for telecommunication wavelength. The prepared multilayered thin films for reflectors show good compatibility. The microcavity structure consists of Ge_(25)Ga)5Sb_(10)S_(65)(doped with Er^(3+)) spacer layer surrounded by two 5-layer As_(40)Se_(60)/Ge_(25)Sb_(5)S_(70) reflectors. Scanning/transmission electron microscopy results show good periodicity, great adherence and smooth interfaces between the alternating dielectric layers, which confirms a suitable compatibility between different materials. The results demonstrate that the chalcogenides can be used for preparing vertical Bragg reflectors and microcavity with high quality.
基金supported by Shandong Province Natural Science Foundation of China(Grant No.ZR2011AM014)
文摘Orthorhombic HoMnO3(HMO) thin films were grown epitaxially on LaAlO3(001) substrates by using pulsed laser deposition technique. The films showed perfect orthorhombic crystallization and were well-aligned with the substrates. The in-plane dielectric constant and loss of HMO films were measured as functions of temperature(80–300 K) and frequency(120 Hz–100 kHz) by using coplanar interdigital electrodes. Two thermally activated dielectric relaxations were found, and the respective peaks shifted to higher temperatures as the measuring frequency increased. The in-plane dielectric properties of epitaxial orthorhombic HMO films were considered as universal dielectric response behavior, and the dipolar effects and the hopping conductivity induced by the charge carriers were used to explain the results.
