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自显机显影性能衰减影响T颗粒摄影原因分析
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作者 崔国明 陈静 唐继尧 《医学影像学杂志》 1998年第4期246-246,共1页
关键词 自显机 T颗粒摄影 原因分析 影性能 减影 应用临床 工作效率 曝光条件 使用周期 胶片冲洗 套药 灰雾度 衰减
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自显机使用中废片现象的分析及管理措施
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作者 魏忠舜 冯德朝 《中外医用放射技术》 1997年第12期1-2,共2页
关键词 自显机 废片 管理 洗印
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Cellular automaton simulation of dynamic recrystallization behavior in V-10Cr-5Ti alloy under hot deformation conditions 被引量:5
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作者 Zhuo-han CAO Yu SUN +4 位作者 Chen ZHOU Zhi-peng WAN Wen-hua YANG Li-li REN Lian-xi HU 《Transactions of Nonferrous Metals Society of China》 SCIE EI CAS CSCD 2019年第1期98-111,共14页
The deformation behavior of V-10Cr-5Ti alloy was studied on the Gleeble-1500 thermomechanical simulator at the temperatures of 950-1350℃, and the strain rates of 0.01-10 s^-1. Based on the Arrhenius model, dislocatio... The deformation behavior of V-10Cr-5Ti alloy was studied on the Gleeble-1500 thermomechanical simulator at the temperatures of 950-1350℃, and the strain rates of 0.01-10 s^-1. Based on the Arrhenius model, dislocation density model, nucleation model and grain growth model, a numerical cellular automaton (CA) model coupling simulation of hot deformation is established to simulate and characterize the microstructural evolution during DRX. The results show that the flow stress is fairly sensitive to the strain rate and deformation temperature. The error between the predicted stress by the Arrhenius model and the actual measured value is less than 8%. The initial average grain size calculated by the CA model is 86.25 μm, which is close to the experimental result (85.63 μm). The simulations show that the effect of initial grain size on the dynamic recrystallization microstructure evolution is not significant, while increasing the strain rate or reducing the temperature can refine the recrystallized grains. 展开更多
关键词 V-10Cr-5Ti alloy hot deformation dynamic recrystallization cellular automaton MICROSTRUCTURE numerical simulation grain refinement
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Impact of the CoFe microstructure etched surface oxidation on Co spin and orbital moment
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作者 GUO YuXian ZHANG ZiJun +2 位作者 WANG Jie FU ShaoJun XU PengShou 《Science China Chemistry》 SCIE EI CAS 2013年第3期588-592,共5页
Patterned ferromagnetic thin film shows promising applications in ultra-high density magnetic storage,magnetoresistive transducer,magnetic random access memory and many other devices.Since the performance of these dev... Patterned ferromagnetic thin film shows promising applications in ultra-high density magnetic storage,magnetoresistive transducer,magnetic random access memory and many other devices.Since the performance of these devices is closely associated with the magnetic properties of the etched patterns,it is necessary to study the effects of freshly etched surface oxidation on the magnetic properties of the patterned microstructures.In the current work,were carried out an X-ray Magnetic Circular Dichroism(XMCD) study on a 50 nm Co 0.9 Fe 0.1 continuous thin film and a related patterned Co 0.9 Fe 0.1 grating structure etched with a 2 μm period.Based on the sum rules,the spin and orbital moments were calculated for these two samples,respectively.The results indicated that the spin and orbital moments of grating structure(1.34μ B and 0.24μ B,respectively) decreased 17.3% compared with the corresponding continuous film(1.62μ B and 0.29μ B,respectively).We proposed that the moment decreasing of the patterned grating structure was mainly caused by the etched surface oxidation during the pattern manufacture process.The oxidation ratio of Co element in the patterned grating structure is 14.4% calculated from X-ray absorption spectroscopy(XAS) measurement.Considering the oxidation ratio,we amend the spin and orbital moment of Co and the amended result is basically in accordance with that of continuous film,demonstrating that the difference of the spin and orbital moments between the sub-micron grating unit and the continuous film is really caused by the oxidation. 展开更多
关键词 magnetic grating structure X-ray Magnetic Circular Dichroism (XMCD) spin moment orbital moment absorptionspectrum fitting
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