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Structure characteristic and its evolution of Cu-W films prepared by dual-target magnetron sputtering deposition
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作者 周灵平 汪明朴 +3 位作者 彭坤 朱家俊 傅臻 李周 《Transactions of Nonferrous Metals Society of China》 SCIE EI CAS CSCD 2012年第11期2700-2706,共7页
Immiscible Cu-W alloy thin films were prepared using dual-target magnetron sputtering deposition process. The structure evolution of Cu-W thin films during preparation was investigated by X-ray diffraction, transmissi... Immiscible Cu-W alloy thin films were prepared using dual-target magnetron sputtering deposition process. The structure evolution of Cu-W thin films during preparation was investigated by X-ray diffraction, transmission electron microscopy and high resolution transmission electron microscopy. In the initial stage of dual-target magnetron sputtering deposition process, an amorphous phase formed; then it crystallized and the analogy spinodal structure formed due to the bombardment of the sputtered particles during sputtering deposition process, the surface structure of the film without the bombardment of the sputtered particles was the amorphous one, the distribution of the crystalline and amorphous phase showed layer structure. The solid solubility with the analogy spinodal structure was calculated using the Vegard law. For Cu-13.7%W (mole fraction) film, its structure was composed of Cu-ll%W solution, Cu-37%W solution and pure Cu; for Cu 14.3%W film, it was composed of Cu-15%W solution, Cu-38%W solution, and pure Cu; for Cu-18.1%W film, it was composed of Cu-19%W solution, Cu-36% W solution and pure Cu. 展开更多
关键词 Cu-W thin film sputtering deposition amorphous phase layer structure solid solubiiity Vegard law
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重力坝深层抗滑稳定设计初探
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作者 李振华 胡涛平 《水电与新能源》 2017年第3期41-43,共3页
针对某水库重力坝坝基地层倾角平缓(8°~15°),基岩为薄层状结构,坝基深层抗滑设计是工程关键技术,在利用抗剪断强度理论进行坝基抗滑稳定计算的基础上,通过分析比较常见的坝基基础处理措施,最终确定重力坝坝基采用坝趾处设置... 针对某水库重力坝坝基地层倾角平缓(8°~15°),基岩为薄层状结构,坝基深层抗滑设计是工程关键技术,在利用抗剪断强度理论进行坝基抗滑稳定计算的基础上,通过分析比较常见的坝基基础处理措施,最终确定重力坝坝基采用坝趾处设置混凝土深齿墙措施,可同时提高坝基浅层及深层抗滑稳定安全系数。 展开更多
关键词 深层抗滑稳定 薄层状结构 刚体极限平衡 坝趾深齿墙
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