使用全色彩膜的补偿TN LCD

讲述了在液晶显示器(liquidcrystaldisplay,LCD)中利用增强Optiva薄晶体膜(thin-crystalfilm,TCF)镀层来修正色彩偏差(蓝光泄漏)和色调变化。本文对补偿扭曲向列相液晶显示器(TNLCD)提出新的测试方法并进行模拟,重点在于进一步提高色彩和等对比度显示特性。利用Quanta17in液晶显示器在有/无全色彩膜(colorperfectionfilm,CPF)两种条件下进行测试。

A Novel Ultra-Thin Channel Poly-Si TFT Technology

A novel low temperature poly\|Si(LTPS) ultra\|thin channel thin film transistor (UTC\|TFT) technology is proposed. The UTC\|TFT has an ultra\|thin channel region (30nm) and a thick drain/source region (300nm). The ultra\|thin channel region that can result in a lower grain\|boundary trap density in the channel is connected to the heavily\|doped thick drain/source region through a lightly\|doped overlapped region. The overlapped lightly\|doped region provides an effective way for the electric field to spread in the channel near the drain at high drain biases, thereby reducing the electric field there significantly. Simulation results show the UTC\|TFT experiences a 50% reduction in peak lateral electric field compared to that of the conventional TFT. With the low grain\|boundary trap density and low drain electric field, excellent current saturation characteristics and high drain breakdown voltage are achieved in the UTC\|TFT. Moreover, this technology provides the complementary LTPS\|TFTs with more than 2 times increase in on\|current, 3.5 times reduction in off\|current compared to the conventional thick channel LTPS TFTs.

Fabrication of Bottom-Gate and Top-Gate Transparent ZnO Thin Film Transistors

Transparent zinc oxide thin film transistors （ZnO-TFTs） with bottom-gate and top-gate structures were constructed on 50mm silica glass substrates. The ZnO films were deposited by RF magnetron sputtering and SiO2 films served as the gate insulator layer. We found that the ZnO-TFTs with bottom-gate structure have better electrical performance than those with top-gate structure. The bottom-gate ZnO-TFTs operate as an n-channel enhancement mode, which have clear pinch off and saturation characteristics. The field effect mobility, threshold voltage, and the current on/off ratio were determined to be 18.4cm^2/（V ·s）, - 0. 5V and 10^4 , respectively. Meanwhile, the top-gate ZnO-TFTs exhibit n-chan- nel depletion mode operation and no saturation characteristics were detected. The electrical difference of the devices may be due to the different character of the interface between the channel and insulator layers. The two transistors types have high transparency in the visible light region.

A VHF PECVD Micro-Crystalline Silicon Bottom Gate TFT with a Thin Incubation Layer

The incubation layer with amorphous structure between the substrate and crystalline layer may obviously affect the performance for a microcrystalline Si thin film transistor (μc-Si TFT),especially for the bottom gate TFT(BG-TFT).It is found that decreasing the ratio of SiH 4/(H 2+SiH 4) is an effective way to decrease the incubation layer thickness of μc-Si directly deposited by VHF PECVD without any further thermal or laser treatment.Based on the μc-Si with a thin incubation layer,the BG-TFT with Al/SiN x/μc-Si/n+-μc-Si/Al structure is fabricated.The ratio of on-state current to off-state current is up to 106,the mobility is around 0.7cm2/(V·s),and the threshold voltage is about 5V.

A New AC Driving Method for a Current-Programmed AM-OLED Pixel Circuit

A new,improved pixel-driving circuit is presented based on a current-programmed pixel circuit in order to achieve an AC-driving mode. This driving method realizes an AC-driving mode,removes the threshold voltage variation of the driving TFT due to the process variation or long-term operation,which can bring about brightness non-uniformity, and eliminates high peak pulse currents at the beginning and end of recovery time. Simulation is done with AIM-SPICE,and simulation results demonstrate that the OLED is in the reverse-biased state during recovery time.

A New Poly-Si TFTs DC Model for Device Characterization and Circuit Simulation

A new physical current-voltage model for polysilicon thin-film transistors （poly-Si TFTs） is presented. Taking the V-shaped exponential distribution of trap states density into consideration,explicit calculation of surface potential is derived using the Lambert W function, which greatly improves computational efficiency and is critical in circuit simulation. Based on the exponential density of trap states and the calculated surface potential, the drain current characteristics of the subthreshold and the strong inversion region are predicted. A complete and unique drain current expression, including kink effect, is deduced. The model and the experimental data agree well over a wide range of channel lengths and operational regions.

OTFT with Bilayer Gate Insulator and Modificative Electrode

An organic thin-film transistor （OTFT） with an OTS/SiO2 bilayer gate insulator and a MoO3/AI electrode configuration between gate insulator and source/drain electrodes has been investigated. A thermally grown SiO2 layer is used as the OTFT gate dielectric and copper phthalocyanine（CuPc） is used as an active layer. This OTS/SiO2 bilayer gate insulator configuration increases the field-effect mobility, reduces the threshold voltage, and improves the on/off ratio simultaneously. The device with a MoO3/Al electrode has shown similar Ids compared to the device with an Au electrode at the same gate voltage. Our results indicate that using a double-layer of electrodes and a double-layer of insulators is an effective way to improve OTFT performance.

Influence of High Temperature Treatment on the Performance of Nickel-Induced Laterally Crystallized Thin Film Transistors

Well known for their good performance,thin film transistors (TFTs) with active layers which were nickel induced laterally crystallized,are fabricated by conventional process of dual gate CMOS.The influence of pre high temperature treatment of device fabrication on the performance of TFTs is also investigated.The experiment shows that the high temperature treatment affects the performance of the devices strongly.The best performance is obtained by adopting pre treatment of 1000℃.The mobility of 314cm 2/(V·s) is obtained at NMOS TFTs with pre treatment of 1000℃,which is 10% and 22% higher than that treated at 1100℃ and without pre high temperature treatment,respectively.A maximum on/off current ratio of 3×10 8 is also obtained at 1000℃.Further investigation of uniformity verifies that the result is reliable.

Development of Novel Thin-Film SOI High Voltage MOSFET

Two kinds of thin-film SOI high voltage MOSFETs are developed.One is general structure,the other is novel two-drift-region structure.The gate width is 760μm,and the active area is 8.58×10 -2 mm 2.The experiments show that the breakdown voltages of the two-drift-region and general structures are 26V and 17V,respectively,and the on resistances are 65Ω and 80Ω,respectively.

Large Scale Homogeneous Growth Mechanics of Microcrystalline Silicon Films on Rough Surface

Large scale homogenous growth of microcrystalline silicon （μ.c-Si：H） on cheap substrates by inductively coupled plasma （ICP） of Ar diluted Sill4 has been studied. From XRD and Raman spectrum, we find that substrates can greatly affect the crystalline orientation, and the μc-Si：H films are comprised of small particles. Thickness detection by surface profilometry shows that the thin μc-Si：H films are homogenous in large scale. Distributions of both ion density and electron temperature are found to be uniform in the vicinity of substrate by means of diagnosis of Langmuir probe. Based on these experimental results, it can be proposed that rough surfaces play important roles in the crystalline network formation and Ar can affect the reaction process and improve the characteristics of μc-Si：H films. Also, ICP reactor can deposit the thin film in large scale.

Fabrication of Hydrogenated Microcrystalline Silicon Thin Films at Low Temperature by VHF-PECVD

Using H 2 diluted silane,series of μc Si∶H films are fabricated at low temperature with VHF PECVD.The thickness measurements reveal that the deposition rates are obviously enhanced with higher plasma excitation frequency or working pressure,but increase firstly and then decrease with the increase of plasma power density.Raman spectra show that the crystallinity and the average grain sizes of the films strongly depend on the temperature of substrate and the concentration of silane.However,the plasma excitation frequency only has effect on the crystallinity,and a maximum occurs during the further increase of plasma excitation frequency.From XRD and TEM experiments,three preferential crystalline orientations (111),(220) and (311) are observed,and the average grain sizes are different for every crystalline orientation.

Thermal Expansion Coefficients of Thin Crystal Films

The formulas for atomic displacements and Hamiltonian of a thin crystal film in phonon occupation number representation are obtained with the aid of Green's function theory. On the basis of these results, the formulas for thermal expansion coefficients of the thin crystal film are derived with the perturbation theory, and the numerical calculations are carried out. The results show that the thinner films have larger thermal expansion coefficients.

Laser lift-off technique and the re-utilization of GaN-based LED films grown on sapphire substrate

A thin GaN LED film, grown on 2-inch-diameter sapphire substrates, is separated by laser lift-off. Atom force microscopy （AFM） and the double-crystal X-ray diffraction （XRD） have been employed to characterize the performance of Gan before and after the lift-off process. It is demonstrated that the separation and transfer processes do not alter the crystal quality of the GaN films obviously. InGaN/GaN multi-quantum-wells （MQW＇s） structure is grown on the separated sapphire substrate later and is compared with that grown on the conventional substmte under the same condition by using PL and XRD spectrum.

Organic thin film transistors with PMMA modified insulator

A double insulation layer structure organic thin films transistor （OTFT） was investigated for improving the performance of the SiO2 gate insulator. A 50 nm PMMA layer was coated on top of the SiO2 gate insulator as the organic insulator layer. The results demonstrated that using inorganic/organic compound insulator as the gate dielectric layer is an effective method to fabricate OTPTs with improved electric characteristics and decreased leakage current. Electrical parameters of carrier mobility and on/off ratio were calculated. OTPT based on Si substrate with a field-effect mobility of 4.0 × 10^-3cm^2/Vs and on/off ratio of l0^4 was obtained.

Preparation and operation characteristics of organic semiconductor transistor using thin film Al gate and copper phthalocyanine

The organic static induction transistors (OSITs) are fabricated by the method of evaporating and plating in a vacuum with copper phthalocyanine (CuPc) dye, and has a five layered structure of Au/CuPc/Al/CuPc/Au. The experiment reveals that OSITs have obtained a low driving voltage, high current density and high switch speed such as I_ DS = 1.2×10 -6 A/mm2, and the degree of 1 000 Hz. The OSITs have excellent operation characteristics of typical static induction transistors.

Synthesis of TS-1 Films on Porous Supports for Epoxidation ofAllyl Chloride by Hydrogen Peroxide

Titanium silicalite-1(TS-1)films were synthesized on stainless steel plate,glass slide and monolith supports via an in-situ hydrothermal method.Characterization data showed that the formation of TS-1 films was easier on the porous flat support with rough surface such as monolith than on the smooth non-porous supports like glass slide and stainless steel plate.The film on the monolith had the highest uniformity and smallest size of crystals.The catalytic property of monolithsupported film was tested for epoxidation of allyl chloride(ACH)by H2O2in a fixed bed reactor.Under the condition of a methanol(solvent)/ACH(90% )/H2O2(30% )ratio of 12:1:1,a LHSV of 1.35 h-1and a temperature of 318 K,the conversion of allyl chloride and the selectivity to epichlorohydrin reached 79% and 51% ,respectively.

360-nm Photoluminescence from Silicon Oxide Films Embedded with Silicon Nanocrystals

Si-rich silicon oxide films were deposited by RF magnetron sputtering onto composite Si/SiO2 targets. After annealed at different temperature, the silicon oxide films embedded with silicon nanocrystals were obtained. The photoluminescenee（PL） from the silicon oxide films embedded with silicon nanocrystals was observed at room temperature. The strong peak is at 360 nm, its position is independent of the annealing temperature. The origin of the 360-nm PL in the silicon oxide films embedded with silicon nanoerystals was discussed.

Photoluminescence origin of nanocrystalline SiC films

The nanocrystalline SiC films were prepared on Si then annealed at 800℃ and 1 000℃ for 30 minutes （111） substrates by rf magnetron sputtering and in a vacuum annealing system. The crystal structure and crystallization of as-annealed SiC films were determined by the Fourier transform infrared （FIR） absorption spectra and the X-ray diffraction （XRD） analysis. Measurement of photoluminescence （PL） of the nanocrystalline SiC （nc-SiC） films shows that the blue light with 473 nm and 477 nm wavelengths emitted at room temperature and that the PL peak shifts to shorter wavelength side and the PL intensity becomes stronger as the annealing temperature decreases. The time-resolved spectrum of the PL at 477 nm exhibits a bi-exponential decay process with lifetimes of 600 ps and 5 ns and a characteristic of the direct band gap. The strong blue light emission with short PL lifetimes suggests that the quantum confinement effect of the SiC nanocrystals resulted in the radiative recombination of the direct optical transitions.

Topological Defects in Liquid Crystal Films

A topological theory of liquid crystal films in the presence of defects is developed based on the Ф-mapping topological current theory. By generalizing the free-energy density in ＂one-constant＂ approximation, a covariant free- energy density is obtained, from which the U（1） gauge field and the unified topological current for monopoles and strings in liquid crystals are derived. The inner topological structure of these topological defects is characterized by the winding numbers of Ф-mapping.

Poly-Si Thin Film Grown by Excimer Laser Crystallization and Its Ellipsometric Analysis

A novel approach of two-step laser crystallization for the growth of poly-Si thin film on glass substrate is investigated. Using this approach, we fabricated poly-Si thin film transistors with electron mobility of 103 cm2/V·s and on/off current ratio of 1×10~7.They are better than those of the poly-Si TFTs fabricated by conventional single-step excimer laser crystallization. We also analyzed the structure of the laser crystallized poly-Si thin film by spectroscopic ellipsometry, and proposed the models to simulate the poly-Si thin film and calculated the ellipsometric spectra. The calculated results are in good agreement with the measured results.