金属薄材超声波点焊的研究进展

详细讨论了金属薄材超声波点焊接头的界面温度、宏观特征、微观组织、力学性能、工艺优化、力学性能强化措施及焊接机理。分析了目前研究中存在的问题,指出焊接界面应力应变场、塑性变形过程和塑性变形机制的研究需深入研究。影响超声波点焊质量的因素分为两类:工艺参数和材料属性。工艺参数包含焊接压力、振幅、焊接时间/焊接能量、功率、焊头和底座表面尖齿的尺寸及形状等。材料属性主要包括材料的类别、硬度、表面粗糙度、氧化情况等。工艺参数和材料之间的良好耦合才能获得最佳的焊接工艺条件。此外,焊接界面的焊合密度和焊后接头有效厚度是决定超声波点焊接头力学性能的两个主要因素,两因素之间存在着矛盾的关系,如何化解这对矛盾关系是提高接头力学性能的关键所在。

薄材厚度在线检测仪的设计与应用

本文对薄材厚度在线检测仪的设计进行了讨论，介绍了该仪器的测量原理，及其功能与应用范围，对其波形、变极距电容特性和测量误差进行分析。

日本：成功开发超高温抗氧化不锈钢极薄材

日本新日铁公司成功开发了超高温抗氧化不锈钢极薄材，大幅度改善了产品的耐高温氧化性（是原有产品的4倍），产品牌号暂定为“YUS-208”。

热交换器 0.10 毫米铝薄材的应用

热交换器０．１０毫米铝薄材的应用中图分类法ＴＭ９２５．０５任亚东随着空调器的发展，提高空调器的热交换效率及减少材料的用量，将成为越来越多厂家追求的目标。一般来说，热交换器效率的提高必须增加热交换器面积，但会使空调器体积增大，重量增加。目前，很多厂家都...

CSP精轧机组轧制高强薄材的载荷优化研究

随着高强钢强度极限的增加,其轧制载荷及张力增大,因此对轧钢设备承载能力要求也越来越高。CSP生产机组长时间高负荷运行,但由于没有力能参数实测数据,导致无法确定该套设备的负载状况、承载能力及实际可达到的极限生产能力。这一问题已成为大批量生产高强度薄带钢、提高产品竞争力的瓶颈,亟待解决。本文采用现场实测、理论分析与数字仿真分析相结合的方法,对CSP精轧机组主传动系统的承载能力进行全面评估,并提出负荷分配的优化方案,为大批量生产高强度薄带钢提供理论依据。

武钢1．1mm极薄材出口泰国

2015年11月9日．武钢条材总厂生产的一批1.1mm热轧极薄材成功销往泰国．刷新了武钢热轧出口板材的最薄纪录。

Dipole moment regulation by Ni doping ultrathin Bi_(4)O_(5)Br_(2)for enhancing internal electric field toward efficient photocatalytic conversion of CO_(2)to CO

The low efficiency of photogenerated carrier separation,and the poor adsorption and activation ability of CO_(2)on the surface of photocatalyst were the key problems to limit the efficiency of photocatalytic CO_(2)reduction.Hence,maximally accelerating the immigration of photogenerated charges d increasing the number of active sites are critical points to boost the overall performance of photocatalytic CO_(2)reduction.However,it is still huge challenge.In this work,the Ni-doped ultrathin Bi_(4)O_(5)Br_(2)nanosheets,which was successfully prepared by hydrothermal and ultrasonic chemical stripping methods,exhibited efficient photocatalytic conversion of CO_(2)to CO.The results of experiments and theoretical calculations indicated that the doped Ni^(2+)significantly increased the crystal dipole moment of Bi_(4)O_(5)Br_(2)in y direction(from 0 to 0.096 e?),which enhanced the polarized electric field strength inside Bi_(4)O_(5)Br_(2),and further promoted the immigration of photogenerated carriers.Meanwhile,the ultrathin structure and doped Ni^(2+)synergistically increased the number of active sites,thereby promoting the adsorption and activation of CO_(2)molecules,as evidenced by experimental and theoretical results collectively.As result,The CO yield was as high as 26.57μmol g–1 h–1 for the prepared Ni-doped ultrathin Bi_(4)O_(5)Br_(2)nanosheets under full spectrum light irradiation,which was 9.48 times that of Bi_(4)O_(5)Br_(2).Therefore,it is of great scientific significance in this study to explore strategies to promote the separation of photogenerated carriers and enhance the adsorption and activation ability of CO_(2)on the surface.

最优炉温曲线与确定其工艺参数问题

随着当下科学技术的发展,在电子焊接领域中,元器件材料在工艺方面对原有SMT技术~([1])有了新的挑战。传统的焊接方式愈加不能满足技术要求。回焊炉利用一种半自动控制方式,通过控制相应温区的温度和传送带的速度,提高生产效率,降低生产成本。本文根据牛顿冷却定理建立薄材传热模型~([3]),在温腔内形成温度场,使用集总参数分析法,简化电路板中心炉温曲线求解问题。在其基础上通过各温区焊接中心温度确定电路板传送时间和速度。在梯形温度曲线~([4])法模型中,简化最优炉温曲线及传送速度求解问题,利用RSS(Ramp-Soak-Spike Profile)升温-保温-峰值曲线~([5])及延长峰值温度,建立梯形温度曲线模型求解。

Effect of boron/phosphorus-containing additives on electrodeposited CoNiFe soft magnetic thin films

CoNiFe,CoNiFeB and CoNiFeP soft magnetic thin films were prepared by cyclic voltammetry method.The morphologies,composition and structures were characterized by scanning electron microscope（SEM）,energy-dispersive X-ray spectroscope（EDS） and X-ray diffractometer（XRD）.The soft magnetic properties were investigated through vibrating sample magnetometer（VSM）.The corrosion resistance was investigated through Tafel polarization and electrochemical impedance spectroscopic（EIS）.The results show that all the electrodeposited CoNiFe,CoNiFeB and CoNiFeP films are mixtures of crystalline and amorphous phases,and high amount of boron/phosphorus-containing additives favors the formation of amorphous state.Nanostructure is obtained in CoNiFe and CoNiFeB films.The inclusion of boron causes the film more dense and also increases its corrosion resistance.Meanwhile,the inclusion of boron lowers its coercivity（Hc） from 851.48 A/m to 604.79 A/m,but the saturation magnetic flux density（Bs） is almost unchanged.However,the addition of phosphorus greatly increases the film particle size and decreases its corrosion stability.The coercivity（Hc） of CoNiFeP film is also highly increased to 12485.79 A/m,and its saturation magnetic flux density（Bs） is greatly decreased to 1.25 T.

Growth of Thin Silicon on Sapphire (SOS) Film Materials and Device Applications

The increasing emphasis on the sub\|micron CMOS/SOS devices has placed a demand for high quality thin silicon on sapphire (SOS) films with thickness of the order 100-200nm. It is demonstrated that the crystalline quality of as\|grown thin SOS films by chemically vapor deposition method can be greatly improved by solid phase epitaxy (SPE) process: implantation of self\|silicon ions and subsequent thermal annealing. Subsequent regrowth of this amorphous layer leads to a great improvement in silicon layer crystallinity and channel carrier mobility, respectively by double crystal X\|ray diffraction and electrical measurements. Thin SPE SOS films would have application to the high\|performance CMOS circuitry.

外墙外保温岩棉薄抹灰系统在新建工程中的应用及质量缺陷改进探讨

岩棉作为A级防火材料在建筑物外墙外保温施工中使用已越来越广泛。嘉定新城示范性高级中学新建工程作为较早采用岩棉薄抹灰系统外墙外保温的工程,在工程中实践总结了一些施工要点及施工经验,可供类似工程参考。

Deposition of Thick SiO_2 from Tetraethylorthosilicate and H_2O by Plasma-Enhanced CVD

The deposition of silicon dioxide by plasma enhanced chemical vapor deposition from tetraethylorthosilicate (TEOS) and H_2O has been studied.Silicon oxide with refractive index of 1453 has been obtained.Tests on the 51mm wafers show that both thickness uniformity of ±15% and constant refractive index of 1453 can be achieved.By raising the deposition temperature,the qualities have been improved,while the deposition rate decreased.A SiO_2 thick film deposition technique has been developed combining TEOS-PECVD technique with high temperature annealing.

Target effects on electrical properties and laser induced voltages of La_(0.72)Ca_(0.28)MnO_3 thin films prepared by pulsed laser deposition

La0.72Ca0.28MnO3 thin films were deposited on untilted and 15° tilted LaAlO_3 （100） single crystalline substrates by pulsed laser deposition. The polycrystalline targets used in the deposition process were synthesized by sol-gel and coprecipitation methods, respectively. The structure, electrical transport properties and surface morphology of the targets and films were studied. It is found that, compared with coprecipitation method, the sol-gel target has more homogeneous components and larger density and grain size, thus the higher insulator-metal transition temperature and larger temperature coefficient of resistivity. The thin film prepared by sol-gel target has a uniform grain size and higher quality. The metal-insulator transition temperature is higher and the laser induced voltage signal is larger. Preparing the target by sol-gel method can largely improve the properties of corresponding thin films in pulsed laser deposition process.

In situ investigation of atmospheric corrosion behavior of PCB-ENIG under adsorbed thin electrolyte layer

The effects of relative humidity (RH) on a printed circuit board finished with electroless nickel immersion gold (PCB-ENIG) under an adsorbed thin electrolyte layer (ATEL) were investigated in situ via the measurement of cathodic polarization curves, electrochemical impedance spectroscopy, scanning electron microscopy, energy-dispersive X-ray spectroscopy, and X-ray photoelectron spectroscopy to clearly elaborate the corrosion behavior of PCB-ENIG in the atmospheric environment. Results indicated that the cathodic process of PCB-ENIG under ATEL was dominated by the reduction of dissolved oxygen, corrosion products, and H2O. The cathodic current density of PCB-ENIG increased progressively with increasing RH. Moreover, its cathodic current density in the solution was greater than that under ATEL. This result demonstrated that the diffusion process was not the controlling step during the limiting reduction of cathodic oxygen. When the polarization potentials were located in a more negative region, the cathodic polarization current density gradually decreased under 75% and 85% RH. Notably, the anodic process became the controlling step in the extremely thin liquid film during the remainder of the experiment.

Plasma Treatment Enhanced Magnetic Properties in Manganese Doped Titanium Nitride Thin Films

The ferromagnetic manganese doped TiN films were grown by plasma assisted molecular beam epitaxy on MgO（001） substrates. The nitrogen concentration and the ratio of manganese at Ti lattice sites increase after the plasma annealing post treatment. TIN（002） peak shifts toward low angle direction and TiN（111） peak disappears after the post treatment. The lattice expansion and peak shift are mainly ascribed to the reduction of nitrogen vacancies in films. The magnetism was suppressed in as-prepared sample due to the pinning effect of the nitrogen vacancies at defect sites or interface. The magnetism can be activated by the plasma implantation along with nitrogen vacancies reduce. The decrease of nitrogen vacancies leads to the enhancement of ferromagnetism.

Physical and Electrochemical Characterization of LiCo0.8M0.2O2 （M=Ni,Zr） Cathode Films for All-solid-state Rechargeable Thin-film Lithium Batteries

LiCo0.8M0.2O2 （M=Ni,Zr） films were fabricated by radio frequency sputtering deposition combined with conventional annealing methods. The strtuctures of the films were characterized with X-ray diffraction （XRD）, Raman spectroscopy and scarming electron microscopy （SEM） techniques. It was shown that the 700 ℃- annealed LiCo0.8M0.2O2 has an α-NaFeO2 like layered structure. All-solid-state thin-film batteries （TFBs） were fabrieated with these films as the cathode and their eleetroctemical performances were evaluated. It was found that doping of electrochemically active Ni and inactive Zr has different effects on the structural and elcctrochemical properties of the LiCoO2 cathode films. Ni doping increases the discharge capacity of the film while Zr doping improves its cycling stability.

武钢有限成功研制0.15毫米极薄冷轧钢材

日前,武钢有限WIMSteel成功研钊出0. 15毫米极薄材,我国连续退火机组一次冷轧材生产制造最薄记录在武钢有限诞生,这些产品将应用于电池连接件的镀镍基板上,0.15毫米极薄材的成功研制,对用户降低成本其有重大效益。此前,需要此类极薄材的客户在订购产品后,仍需二次轧制才能达到使用要求,需耗费额外的成本和时间。