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薄膜厚度宽带监控中评价函数的修正 被引量:2
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作者 韩军 尚小燕 曹春 《西安工业学院学报》 2004年第4期316-318,352,共4页
 在镀膜过程中,采用宽光谱实时监控薄膜厚度的方法,评价函数的准确计算关系到薄膜厚度的最终监控结果.而薄膜材料的吸收会引起评价函数的失真.本文采用软件的方法,在镀下一层之前,对其评价函数中的理论透射比作以修正,消除已镀层吸收...  在镀膜过程中,采用宽光谱实时监控薄膜厚度的方法,评价函数的准确计算关系到薄膜厚度的最终监控结果.而薄膜材料的吸收会引起评价函数的失真.本文采用软件的方法,在镀下一层之前,对其评价函数中的理论透射比作以修正,消除已镀层吸收对其的影响,由此逐层进行直至结束.实验结果表明,薄膜厚度监控误差可以达到10-3以下,效果良好,完全可以满足实际需要. 展开更多
关键词 宽光谱 薄膜厚度监控 评价函数 吸收 修正
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Development of Dual-light Path Monitoring System of Optical Thin-film Thickness 被引量:4
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作者 许世军 《Defence Technology(防务技术)》 SCIE EI CAS 2005年第1期77-82,共6页
The accurate monitoring of optical thin-film thickness is a key technique for depositing optical thin-film. For existing coating equipments, which are low precision and automation level on monitoring thin-film thickne... The accurate monitoring of optical thin-film thickness is a key technique for depositing optical thin-film. For existing coating equipments, which are low precision and automation level on monitoring thin-film thickness, a new photoelectric control and analysis system has been developed. In the new system, main techniques include a photoelectric system with dual-light path, a dual-lock-phase circuit system and a comprehensive digital processing-control-analysis system.The test results of new system show that the static and dynamic stabilities and the control precision of thin-film thickness are extremely increased. The standard deviation of thin-film thickness, which indicates the duplication of thin-film thickness monitoring, is equal to or less than 0.72%. The display resolution limit on reflectivity is 0.02 %. In the system, the linearity of drift is very high, and the static drift ratio approaches zero. 展开更多
关键词 光学机械 薄膜厚度监控 稳定性 等光路径 生长工艺
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