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基于驻留约束的半导体晶圆蚀刻系统实时调度算法 被引量:1
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作者 李鑫 周炳海 陆志强 《上海交通大学学报》 EI CAS CSCD 北大核心 2009年第11期1742-1745,1750,共5页
为有效利用半导体晶圆蚀刻系统,根据蚀刻系统的特点,进行了实时调度问题域的描述,提出了基于驻留约束的实时调度算法.在此基础上,建立了以无不良品和总完工时间最小为目标的启发式实时调度算法.仿真实验结果表明,该算法是有效和实用的.
关键词 蚀刻系统 半导体晶圆制造 实时调度 驻留约束
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Trikon发布全新Omegai2L干法蚀刻系统
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作者 付军 《集成电路应用》 2005年第4期59-59,共1页
近日,Trikcm公司宣布,其全新的Omegai2L。干法蚀刻系统在主流硅和功率管理应用中将带来新的市场机遇,其经验证的技术可以帮助降低风险、提高利润的能力.
关键词 Trikon公司 Omegai2L 干法蚀刻系统 主流硅 功率管理应用
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TEL推出第七代基板用FPD等离子蚀刻/灰烬系统
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《集成电路应用》 2004年第5期65-65,共1页
关键词 TOKYO Electron公司 FPD等离子蚀刻/灰烬系统 处理气体 涡轮分子泵 基板
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Nanotechnology:fundamental research to product development
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作者 Graham J Davie Zahra F Rad +3 位作者 Carl Anthony Philip Prewett Jing Peng Robert Nordon 《Engineering Sciences》 EI 2012年第5期42-44,共3页
The concept of an integrated "lab on a chip" has long been a goal for the micro-electro-mechanical-systems(MEMS) community.This would entail the integration of not only the sampling and analysis of various f... The concept of an integrated "lab on a chip" has long been a goal for the micro-electro-mechanical-systems(MEMS) community.This would entail the integration of not only the sampling and analysis of various functions,but also the ability to transmit this information off the chip to a central repository.This paper describes the initial steps in the fabrication of a "lab on a chip" which would continually analyze blood sampled via microneedles using techniques such as nano plasmonics,specifically,concentrations of glucose.The analysis could then be transmitted off the chip using digital signal processing.This paper describes the analysis and optimization of the microneedle shape and size and the fabrication of the resulting needles in silicon using deep reactive ion etching(DRIE).The paper also describes the opportunities for fabrication of such needles in alternative materials and describes the issues that still have to be overcome before such an integrated device is realized. 展开更多
关键词 MEMS micro-needles lab on a chip NANOTECHNOLOGY
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Heuristic tabu search scheduling algorithm for wet-etching systems in semiconductor wafer fabrications
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作者 周炳海 Li Xin 《High Technology Letters》 EI CAS 2013年第2期111-116,共6页
To improve overall equipment efficiency(OEE) of a semiconductor wafer wet-etching system,a heuristic tabu search scheduling algorithm is proposed for the wet-etching process in the paper,with material handling robot c... To improve overall equipment efficiency(OEE) of a semiconductor wafer wet-etching system,a heuristic tabu search scheduling algorithm is proposed for the wet-etching process in the paper,with material handling robot capacity and wafer processing time constraints of the process modules considered.Firstly,scheduling problem domains of the wet-etching system(WES) are assumed and defined,and a non-linear programming model is built to maximize the throughput with no defective wafers.On the basis of the model,a scheduling algorithm based on tabu search is presented in this paper.An improved Nawaz,Enscore,and Ham(NEH) heuristic algorithm is used as the initial feasible solution of the proposed heuristic algorithm.Finally,performances of the proposed algorithm are analyzed and evaluated by simulation experiments.The results indicate that the proposed algorithm is valid and practical to generate satisfied scheduling solutions. 展开更多
关键词 wet-etching systems WES semiconductor wafer fabrications tabu search scheduling problems residency constraints
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