碳化硅表面亚微米减反射结构及其制作工艺

创新性地提出一种经济高效的碳化硅表面亚微米减反射结构制作工艺,即＂黑碳化硅技术＂。该方法无需光刻,采用非完全后烘的光刻胶微掩膜反应离子刻蚀（RIE）工艺,克服了碳化硅材料由于高硬度和高化学稳定性而无法采用传统硅材料湿法工艺的困难。利用该技术,已在4英寸（1英寸=2.54 cm）4H-SiC单晶片表面成功制作出网格状亚微米阵列结构,其深度为200-300 nm。测试结果表明,该结构可以在390-800 nm的波长范围内使SiC表面平均反射率至少降低20%。可以应用于SiC材料制作的中间带太阳电池及紫外探测器件,提升器件的量子效率;或作为高功率GaN LED的生长衬底,增强LED的光出射效率。

Deterioration of Water Ballast Tank Coating Systems by Active Substances in Ballast Water Management Systems

Sodium hypochlorite and ozone are the principal active substances and usually employed in ballast water management systems. In the present study, the authors focus on the effect of these active substances to the maaix polymer of coating. In order to obtain such information, the authors investigated the penetration of active substances to the polymer from cross section of specimens introduced by SAICAS （surface and interracial cutting analysis system）, followed by FT-IR-ATR （Fourier transform infrared and attenuated total reflectance） spectroscopy analysis from Z direction of cross section. The corrosion test of coating panels by these active substances （control as artificial seawater） has been conducted for 120 days. The results show that the depth profile of each active substance is around few dozens of micrometers from coating surface. The criteria of corrosion test cannot be determined by these results due to lacking in actual corrosion data immersed for 15 years under active substances. However, the authors evaluated the effect on ballast tank coating systems by active substances using analytical methods of SAICAS and FT-IR-ATR spectroscopy.

用于太阳能电池的多晶硅激光表面织构化研究

介绍了利用激光制备多晶硅表面织构的研究结果。采用激光在硅片表面刻蚀,然后利用化学方法去除残渣和损伤,制得均匀的表面陷光结构。通过扫描电子显微镜,HitachiU-4100分光光度计和Semilab WT2000少子寿命仪分析了表面织构化后硅片的表面形貌、反射率和少子寿命。通过调节激光和化学腐蚀参数得到很好的陷光效果,表面反射率最低可以降到约10%。但是激光刻蚀对硅片性能仍有一定损伤,有待改进。激光表面织构为多晶硅的减反射处理提供有效的途径。