应用场助热电子发射 (thermionic field em ission)模型合理地分析了多晶硅薄膜晶体管中显著漏电流与器件参数及电极电压等因素间的内在关系 ,讨论了源漏轻掺杂结构在抑制漏电流方面的物理机制 ,并给出轻掺杂结构参数 (如轻掺杂浓度、...应用场助热电子发射 (thermionic field em ission)模型合理地分析了多晶硅薄膜晶体管中显著漏电流与器件参数及电极电压等因素间的内在关系 ,讨论了源漏轻掺杂结构在抑制漏电流方面的物理机制 ,并给出轻掺杂结构参数 (如轻掺杂浓度、轻掺杂区域长度等 )的优化设计 ,为多晶硅薄膜晶体管的器件设计提供了可靠的理论依据 .展开更多
A novel parameter extraction technique suitable f or short channel length lightly-doped-drain (LDD) MOSFET's is proposed which seg ments the total gate bias range,and executes the linear regression in every subs ...A novel parameter extraction technique suitable f or short channel length lightly-doped-drain (LDD) MOSFET's is proposed which seg ments the total gate bias range,and executes the linear regression in every subs ections,yielding the gate bias dependent parameters,such as effective channel le ngth,parasitic resistance,and mobility,etc.This method avoids the gate bias rang e optimization,and retains the accuracy and simplicity of linear regression.The extracted gate bias dependent parameters are implemented in the compact I-V model which has been proposed for deep submicron LDD MOSFET's.The good agreemen ts between simulations and measurements of the devices on 0.18μm CMOS technolo gy indicate the effectivity of this technique.展开更多
A novel substrate current model is proposed for submicron and deep-submicron li ghtly-doped-drain (LDD) n-MOSFET,with the emphasis on accurate description of the characteristics length by taking the effects of channe...A novel substrate current model is proposed for submicron and deep-submicron li ghtly-doped-drain (LDD) n-MOSFET,with the emphasis on accurate description of the characteristics length by taking the effects of channel length and bias int o account.This is due to that the characteristics lenth significantly affects th e maximum lateral electric field and the length of velocity saturation region,bo th of which are very important in modeling the drain current and the substrate c urrent.The comparison between simulations and experiments shows a good predictio n of the model for submicron and deep-submicron LDD MOSFET.Moreover,the analyti cal model is suitable for descgn of devices as it is low in computation consumpt ion.展开更多
文摘A novel parameter extraction technique suitable f or short channel length lightly-doped-drain (LDD) MOSFET's is proposed which seg ments the total gate bias range,and executes the linear regression in every subs ections,yielding the gate bias dependent parameters,such as effective channel le ngth,parasitic resistance,and mobility,etc.This method avoids the gate bias rang e optimization,and retains the accuracy and simplicity of linear regression.The extracted gate bias dependent parameters are implemented in the compact I-V model which has been proposed for deep submicron LDD MOSFET's.The good agreemen ts between simulations and measurements of the devices on 0.18μm CMOS technolo gy indicate the effectivity of this technique.
文摘A novel substrate current model is proposed for submicron and deep-submicron li ghtly-doped-drain (LDD) n-MOSFET,with the emphasis on accurate description of the characteristics length by taking the effects of channel length and bias int o account.This is due to that the characteristics lenth significantly affects th e maximum lateral electric field and the length of velocity saturation region,bo th of which are very important in modeling the drain current and the substrate c urrent.The comparison between simulations and experiments shows a good predictio n of the model for submicron and deep-submicron LDD MOSFET.Moreover,the analyti cal model is suitable for descgn of devices as it is low in computation consumpt ion.
文摘采用金属有机化学气相沉积（MOCVD）方法在（010）Fe掺杂半绝缘Ga2O3同质衬底上外延得到n型β-Ga2O3薄膜材料,材料结构包括400 nm的非故意掺杂Ga2O3缓冲层和40 nm的Si掺杂Ga2O3沟道层。基于掺杂浓度为2.0×1018cm-3的n型β-Ga2O3薄膜材料,采用原子层沉积的25 nm的HfO2作为栅下绝缘介质层,研制出Ga2O3金属氧化物半导体场效应晶体管（MOSFET）。器件展示出良好的电学特性,在栅偏压为8 V时,漏源饱和电流密度达到42 m A/mm,器件的峰值跨导约为3.8 m S/mm,漏源电流开关比达到108。此外,器件的三端关态击穿电压为113 V。采用场板结构并结合n型Ga2O3沟道层结构优化设计能进一步提升器件饱和电流和击穿电压等电学特性。
