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某型导向器叶片穿透性裂纹检测技术 被引量:2
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作者 刘勇 杨光 《中国测试》 北大核心 2017年第7期40-43,共4页
导向器是飞机发动机上的重要零部件,发动机导向器在荧光渗透检测后,其叶片根部焊缝处存在穿透性裂纹漏检。为找出裂纹漏检原因,对裂纹形貌以及导向器结构进行观察,并结合渗透检测的原理进行分析,最终确定裂纹漏检的原因为导向器特殊结... 导向器是飞机发动机上的重要零部件,发动机导向器在荧光渗透检测后,其叶片根部焊缝处存在穿透性裂纹漏检。为找出裂纹漏检原因,对裂纹形貌以及导向器结构进行观察,并结合渗透检测的原理进行分析,最终确定裂纹漏检的原因为导向器特殊结构导致的过清洗。通过进一步的试验,改进检测工艺,避免产生过清洗。通过对比可以看出,新工艺的使用,使导向器叶片的检测可靠性得到提高,降低漏检发生的概率。 展开更多
关键词 荧光渗透检测 导向器 穿透性裂纹 过清洗
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Experimental Investigation of Dust Deposit within Ceramic Filter Medium during Filtration-Cleaning Cycles 被引量:8
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作者 迟化昌 姬忠礼 +1 位作者 孙冬梅 崔立山 《Chinese Journal of Chemical Engineering》 SCIE EI CAS CSCD 2009年第2期219-225,共7页
The penetration and deposit of particles within the medium is thought to be one reason that the residual pressure drop of the rigid ceramic filter increase with cycle number.In this study,the change in the microstruct... The penetration and deposit of particles within the medium is thought to be one reason that the residual pressure drop of the rigid ceramic filter increase with cycle number.In this study,the change in the microstructure of a single layer ceramic filter candle during filtration-cleaning cycle was observed by scanning electron microscope(SEM) and the resistance property of the filter was monitored accordingly.The experimental results show that there exists a serious dust deposit within the filter medium,especially at the surface region.This should be responsible for the decrease of the filter permeability.The deposit law of dust in the filter medium during filtration-cleaning cycle was then studied by measuring the deposit depth,the deposit amount,the particles distribution within the medium,the size distribution of deposited particles,and so on.Particles migration and fine particles penetration were found to be the main reasons,for which dust deposit within the filter medium became aggravated with cycle number.Based on a differential form of Ergun equation,an expression for the pressure drop of a used ceramic filter was developed with a good agreement with experimental results.Then,the effect of dust deposit on the residual pressure drop was studied at the different face velocities and dust sizes.It was found that face velocity and dust size significantly influence dust deposit within filter medium,and then the operation performance of the filter. 展开更多
关键词 ceramic filter microscopic analysis resistance dust deposit scanning electron microscope
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Application of response surface methodology to the chemical cleaning process of ultrafiltration membrane 被引量:4
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作者 Caihong Wang Aishu Wei +4 位作者 Hao Wu Fangshu Qu Weixiong Chen Heng Liang Guibai Li 《Chinese Journal of Chemical Engineering》 SCIE EI CAS CSCD 2016年第5期651-657,共7页
A numerical model was established to predict and optimise the chemical cleaning process of Polyvinylidene Fluo- ride (PVDF) Ultrafiltration (UF) membranes with the results from the experiment that applied the Resp... A numerical model was established to predict and optimise the chemical cleaning process of Polyvinylidene Fluo- ride (PVDF) Ultrafiltration (UF) membranes with the results from the experiment that applied the Response Sur- face Method (RSM) and Central Composite Design (CCD). The factors considered in the experimental design were sodium hydroxide (NaOH) concentration, sodium bypochlorite concentration (NaCIO), citric acid concentration and cleaning duration, The interactions between the factors were investigated with the numerical model. Humic acid (20 mg· L-1) was used as the model foulant, and chemical enhanced backflush (CEB) was employed to sim- ulate the chemical cleaning process. The concentrations of sodium hydroxide, sodium hypochlorite, citric acid and cleaning duration tested during the experiments were in the range of 0.1%-0.3% 100-300 mg· L-1 1%-3% and 0.5-1.5 h, respectively. Among the variables, the sodium hypochlorite concentration and the cleaning dura- tion showed a positive relationship involving the increased efficiency of the chemical cleaning. The chemical cleaning efficiency was hardly improved with increasing concentrations of sodium hydroxide. However, the data was sharply decreased when at a low level of sodium hydroxide concentration. In total, 54 sets of cleaning schemes with 80% to 100K cleaning efficiency were observed with the R&M model after calibration. 展开更多
关键词 ULTRAFILTRATION Response surface methodology Chemical cleaning Water treatment
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Effect of Laser Ablation Cleaning Process on Ceramic Artifacts 被引量:1
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作者 Mananna Barbeno Pasquale Barone +3 位作者 Fabio Stranges Diana Renzelli Fang Xu Assunta Bonanno 《Journal of Physical Science and Application》 2013年第4期224-228,共5页
In this work, the results of a study of laser ablation cleaning process on ceramic artifacts are presented. The experiments were conducted on a "Carosello", a structural hollow element made of clay, placed in arches... In this work, the results of a study of laser ablation cleaning process on ceramic artifacts are presented. The experiments were conducted on a "Carosello", a structural hollow element made of clay, placed in arches, in domes or even in the walls of buildings such as churches and houses. Our results show that laser ablation techniques is able to remove the surface impurity patina from artifacts surface without changes the chemical composition and the optical properties of ceramic. Moreover, because the laser cleaning heats only locally the surface of the sample, this method don't preclude the possibility to apply on artifact the thermo-luminescence dating process. 展开更多
关键词 Laser ablation ceramic cleaning process carosello.
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Probing particle removal in brush scrubber cleaning with fluorescence technique 被引量:3
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作者 HUANG YaTing LI Yang +1 位作者 GUO Dan MENG ChunLing 《Science China(Technological Sciences)》 SCIE EI CAS 2013年第12期2994-3000,共7页
Brush scrubber cleaning is widely used for post chemical mechanical polishing(CMP)cleaning in semiconductor manufacturing.In this study,an experimental system based on fluorescence technique and particle-tracking velo... Brush scrubber cleaning is widely used for post chemical mechanical polishing(CMP)cleaning in semiconductor manufacturing.In this study,an experimental system based on fluorescence technique and particle-tracking velocimetry(PTV)technique was employed to characterize the particle removal displacement and velocity in the interface between a transparent copper film and a porous polyvinyl alcohol(PVA)brush during the cleaning process.Several different cleaning conditions including rotation speeds,loading pressure and cleaning agent were examined and the particle removal rate was compared.Elastic and friction removal,hydrodynamic removal and mixed-type removal are the three types of particle removal.Particles with an arc trace and uniform velocity curves were removed by friction and elastic force which were related to the brush load.Particles with a random trace and fluctuant velocity curves were removed by hydrodynamic force which was determined by the brush rotation speed.The increase of particle removal rate(PRR)with brush rotation speed is a logistic function.It is easier to improve PRR by increasing the brush load or by adding surfactant than by increasing the brush rotation speed. 展开更多
关键词 brush-scrub post CMP(chemical mechanical polishing) cleaning particle removal fluorescence technique
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