过滤电弧沉积的TiN/TiCrN/CrN/CrTiN多层膜

用过滤电弧技术在高速钢表面沉积了TiN/TiCrN/CrN/CrTiN多层膜 ,用扫描电镜 (SEM )观察了截面和断口形貌及划痕后的形貌。使用俄歇电子谱仪进行剥层成分分析 ,用纳米压痕仪测试了多层膜和单层膜的显微硬度和弹性模量。结果表明 ,在调制周期大于 10 0nm时 ,多层膜的显微硬度符合Hall Petch关系 ,在 80nm时 ,则脱离线性关系。划痕法测试多层膜的结合力达到 80N。

激光引弧磁过滤真空阴极电弧制备ta-C薄膜的结构与性能

采用自主研制的激光引弧磁过滤真空阴极电弧沉积设备在不同工件台转速下制备了四面体非晶碳膜,通过改变工件台转速调节沉积速率,探讨了沉积速率对四面体非晶碳膜结构与性能的影响。结果表明,随着沉积速率的增加,四面体非晶碳膜硬度及弹性模量随sp3键含量变化先增加后减小,最大值分别为48 GPa和300 GPa。薄膜的摩擦因数受沉积速率影响不大,均在0.14左右。薄膜的磨损率随着沉积速率的增加逐渐降低,最小为6×10-16 m3(/N·m)。研究发现在一定范围内调节沉积速率可以有效地提高四面体非晶碳膜的力学性能及耐磨性能。

STUDY ON DIAMOND LIKE CARBON THIN FILM BY FILTERED VACUUM ARC DEPOSITION

Diamond like carbon thin film is successfully deposited on silicon, titanium and stainless steel substrate at low temperature in a filtered vacuum arc deposition system. Arc discharges are established on a graphite cathode in the system with a toroidal macroparticle filter. A cathode activating magnetic field and a filtered magnetic field to collimate the plasma beam are applied. Ion current convected by the plasma beam is measured with a negatively biased probe. It is shown that the magnetic field of the coils located on the plasma duct has a strong influence on cathode spot behavior. Orthogonally the designed experiments are carried out to optimize the deposition parameters of arc stability. Finally, the diamond like carbon thin films are studied by scanning electron microscope (SEM) and Raman spectrum.

Experimental Research of DLC Film Deposited by Filtered Vacuum Arc Evaporation

Diamond like carbon (DLC) films was grown successfully on silicon, titanium and high speed steel (HSS) substrate at low temperature in a filtered vacuum arc deposition system. Arc discharges were established on a graphite cathode in this home built system with a toridal macroparticles filter. Ion current convected by the plasma beam was measured with a negatively biased probe. It was shown that the magnetic field of the coils located on the plasma duct has a strong influence on ion current. Scanning electron microscope (SEM), atomic force microscope (AFM) and Raman spectrum are used to study the DLC films. Tribological behaviors of the deposited film are also studied.

X光电子谱辅助Raman光谱表征N含量对非晶金刚石薄膜的结构影响

用过滤阴极真空电弧沉积系统制备掺N非晶金刚石(ta-C∶N)薄膜,通过在阴极电弧区和沉积室同时通入N2气实现非晶金刚石薄膜的N原子掺杂,并通过控制N2气流速制备不同N原子含量的ta-C∶N薄膜。用X射线光电子能谱(XPS)和Raman光谱分析N含量对ta-C∶N薄膜微观结构的影响。XPS分析结果显示:当N2气流速从2 cm3.min-1增加到20 cm3.min-1时,薄膜中N原子含量从0.84 at.%增加到5.37 at.%,同时随薄膜中N原子含量的增加,XPS C(1s)芯能谱峰位呈现单调增加的趋势,XPS C(1s)芯能谱的半高峰宽也随着N含量的增加而逐渐变宽。在Raman光谱中,随N原子含量增加,G峰的位置从1 561.61 cm-1升高到1 578.81 cm-1。XPS C(1s)芯能谱和Raman光谱分析结果表明:随N含量的增加,XPS C(1s)芯能谱中sp2/sp3值和Raman光谱中ID/IG值均呈上升的趋势,两种结果都说明了随N原子含量增加,薄膜中sp2含量也增加,薄膜结构表现出石墨化倾向。