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镍铜硫化物矿石中磁黄铁矿固溶体的退火及其选矿意义 被引量:4
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作者 顾连兴 赵明 吴昌志 《地质论评》 CAS CSCD 北大核心 2003年第3期261-264,共4页
磁黄铁矿固溶体从硫化物熔体结晶后,在缓慢冷却过程中经历了显著的退火。出溶和出溶体的粗化是固溶体退火的两种方式。叶片状的单斜磁黄铁矿和“火焰状”的镍黄铁矿原始出溶相在降温过程中均可发生退火和粗化。分布于磁黄铁矿等矿物粒... 磁黄铁矿固溶体从硫化物熔体结晶后,在缓慢冷却过程中经历了显著的退火。出溶和出溶体的粗化是固溶体退火的两种方式。叶片状的单斜磁黄铁矿和“火焰状”的镍黄铁矿原始出溶相在降温过程中均可发生退火和粗化。分布于磁黄铁矿等矿物粒间或包于磁黄铁矿粒内的粒状镍黄铁矿,不只是高温出溶的直接产物,有一部分可能是由火焰状出溶体粗化而成的。磁黄铁矿中单斜变体的出溶和粗化可使矿石的磁性发生改变,镍黄铁矿出溶体的粗化使含镍矿物的粒度加大。因而,退火作用对矿石的选矿工艺性能有着显著影响。 展开更多
关键词 镍铜硫化物矿石 磁黄铁矿固溶体 镍黄铁矿 选矿工艺 退火作用
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Stress-strain Analysis of p-type GaN Films Material
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作者 LIAO Xiu-ying ZHU Yan-ling +5 位作者 YANG Xiao-bo ZHAO Hong ZHAO Wen-bo ZHOU Xun ZOU Ze-ya ZENG Qing-gao 《Semiconductor Photonics and Technology》 CAS 2008年第4期224-228,273,共6页
The crystal quality of p-GaN film depends on the stress-strain during the process of material growth at a certain extent. A smooth high-quality GaN epitaxial layer was grown on sapphire substrate using standard low-te... The crystal quality of p-GaN film depends on the stress-strain during the process of material growth at a certain extent. A smooth high-quality GaN epitaxial layer was grown on sapphire substrate using standard low-temperature(LT) buffer layer by MOCVD. And by testing analysis of correlative experiments,we found that the stress-strain of p-type GaN could be changed by annealing,enhancing the crystal quality. 展开更多
关键词 MOCVD GAN STRESS-STRAIN ANNEAL
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Magnetic coupling in ferromagnetic semiconductor GaMnAs/AlGaMnAs bilayer devices
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作者 CAO YuFei LI YanYong +3 位作者 LI YuanYuan WEI GuanNan JI Yang WANG KaiYou 《Science China(Physics,Mechanics & Astronomy)》 SCIE EI CAS 2014年第8期1471-1475,共5页
We carefully investigated the ferromagnetic coupling in the as-grown and annealed ferromagnetic semiconductor GaMnAs/A1GaMnAs bilayer devices. We observed that the magnetic interaction between the two layers strongly ... We carefully investigated the ferromagnetic coupling in the as-grown and annealed ferromagnetic semiconductor GaMnAs/A1GaMnAs bilayer devices. We observed that the magnetic interaction between the two layers strongly affects the magnetoresistance of the GaMnAs layer with applying the out of plane magnetic field. After low temperature annealing, the magnetic easy axis of the A1GaMnAs layer switches from out of plane into in-plane and the interlayer coupling efficiency is reduced from up to 0.6 to less than 0.4. However, the magnetic coupling penetration depth for the annealed device is twice that of the as-grown bilayer device. 展开更多
关键词 magnetic coupling MAGNETORESISTANCE bilayer structure ANNEALING anisotropic field
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