磁控溅射法制备用作铜互连阻挡层的钛-铝薄膜

采用射频磁控溅射法在Si（100）基片上首先沉积了厚度40nm的非晶钛-铝薄膜，然后在其上又原位生长了厚度100nm的铜薄膜，制备了铜膜／钛-铝膜／硅试样；对试样分别在400～800℃内进行真空退火处理，用原子力显微镜、X射线衍射仪、四探针测试仪对试样的表面形貌、结晶状态及方块电阻进行了分析。结果表明：当退火温度低于750℃时，试样表面平整，表面粗糙度和方块电阻均较小且基本不随退火温度的升高而改变，此时，非晶钛-铝薄膜能够起到阻挡铜向硅中扩散的作用；当退火温度在800℃时，试样的表面粗糙度和方块电阻急剧增大，此时，非晶钛-铝薄膜已经不能起到阻挡层的作用。

多弧离子镀TiCrAlCN薄膜及其微观结构与摩擦学性能研究

采用工业化多弧离子镀设备在4Cr5MoSiV1钢表面制备TiCrAlCN硬质薄膜,以便改善其力学和摩擦学性能。借助扫描电子显微镜、X射线衍射仪、维氏显微硬度计和摩擦磨损试验仪对不同工艺条件下所得TiCrAlCN薄膜的微观形貌、微观结构、力学性能和耐磨性进行分析与测试。结果表明:TiCrAlCN薄膜为纳米晶(TiAl)(CN)固溶体,含少量Cr2N。高碳含量的TiCrAlCN薄膜还含非晶C相、且晶粒细小,具有(111)晶面取向,表现出高硬度和优异的耐磨减摩特性。

Formation and capacitance properties of Ti-Al composite oxide film on aluminum

Al specimens were covered with TiO2 film by sol-gel dip-coating and then anodized in ammonium adipate solution.The structure,composition and capacitance properties of the anodic oxide film were investigated by transmission electron microscopy (TEM),Auger electron spectroscopy (AES),X-ray diffractometry (XRD) and electrochemical impedance spectroscopy (EIS).It was found that an anodic oxide film with a dual-layer structure formed between TiO2 coating and Al substrate.The film consisted of an inner Al2O3 layer and an outer Ti-Al composite oxide layer.The thickness of layers varied with the number of times of sol-gel dip-coating.The capacitance of anodic oxide films formed on coated specimens was at most 80% higher than that without TiO2.In film formation mechanism,it was claimed that the formation of composite oxide film was mainly affected by the structure of micro-pores network in TiO2 coating which had an influence on Al3+ and O2? ions transport during the anodizing.