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激光熔覆特定材料涂层的微观组织和硬度特性 被引量:1
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作者 臧春城 王延忠 张以都 《激光与红外》 CAS CSCD 北大核心 2015年第8期897-901,共5页
镍铬碳化铬涂层坚硬致密,是非常理想的耐磨涂层。为了制备硬度较高的耐磨涂层,分别以Ni45和Ni60为过渡层,利用激光熔覆技术,在45钢基体上熔覆了25Ni Cr-75Cr3C2涂层。采用电子探针显微分析仪(EPMA)和其配备的能谱仪(EDS)对涂层的微观组... 镍铬碳化铬涂层坚硬致密,是非常理想的耐磨涂层。为了制备硬度较高的耐磨涂层,分别以Ni45和Ni60为过渡层,利用激光熔覆技术,在45钢基体上熔覆了25Ni Cr-75Cr3C2涂层。采用电子探针显微分析仪(EPMA)和其配备的能谱仪(EDS)对涂层的微观组织和微区成分进行了分析,并利用显微硬度仪进行了显微硬度的测试。结果表明:以镍基合金为过渡层,在45钢基体上熔覆25Ni Cr-75Cr3C2涂层,可以得到与基体结合紧密的涂层组织,且涂层硬度明显高于基体硬度;与过渡层Ni45相比,以Ni60为过渡层时,25Ni Cr-75Cr3C2涂层的硬度更高;不同过渡层上熔覆的25Ni Cr-75Cr3C2涂层微观组织结构及元素成分也不相同。 展开更多
关键词 激光技术 激光熔覆 铬碳化铬涂 镍基过渡层 显微硬度
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Enhancement of nucleation of diamond films deposited on copper substrate by nickel modification layer 被引量:3
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作者 刘学璋 魏秋平 +1 位作者 翟豪 余志明 《Transactions of Nonferrous Metals Society of China》 SCIE EI CAS CSCD 2013年第3期667-673,共7页
A Ni layer with a thickness of about 100 nm was sputtered on Cu substrates,followed by an ultrasonic seeding with nanodiamond suspension.High-quality diamond film with its crystalline grains close to thermal equilibri... A Ni layer with a thickness of about 100 nm was sputtered on Cu substrates,followed by an ultrasonic seeding with nanodiamond suspension.High-quality diamond film with its crystalline grains close to thermal equilibrium shape was deposited on Cu substrates by hot-filament chemical vapor deposition(HF-CVD),and the sp2 carbon content was less than 5.56%.The nucleation and growth of diamond film were investigated by micro-Raman spectroscopy,scanning electron microscopy,and X-ray diffraction.The results show that the nucleation density of diamond on the Ni-modified Cu substrates is 10 times higher than that on blank Cu substrates.The enhancement mechanism of the nucleation kinetics by Ni modification layer results from two effects:namely,the nanometer rough Ni-modified surface shows an improved absorption of nanodiamond particles that act as starting points for the diamond nucleation during HF-CVD process;the strong catalytic effect of the Ni-modified surface causes the formation of graphite layer that acts as an intermediate to facilitate diamond nucleation quickly. 展开更多
关键词 diamond film nickel interlayer Cu substrate chemical vapor deposition nucleation kinetics surface modification
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