The technique to improve the performance of W/TiN stacked gate MOS capacitor with 3nm gate oxide is reported by optimizing the sputtering process of a refractory metal gate electrode and adopting a proper anneal tempe...The technique to improve the performance of W/TiN stacked gate MOS capacitor with 3nm gate oxide is reported by optimizing the sputtering process of a refractory metal gate electrode and adopting a proper anneal temperature to eliminate the damages.Specific methods involved in the optimization of sputtering process include:selecting a proper TiN thickness to reduce stresses;using a smaller sputtering rate to suppress the damages to gate dielectric and adopting a higher N 2/Ar ratio during the TiN sputtering process to further nitride the gate dielectric.With these measures,excellent C V curves are obtained and surface state density ( N ss ) is successfully reduced to below 8×10 10 cm -2 ,which is comparable to the polysilicon gate MOS capacitor.展开更多
文摘The technique to improve the performance of W/TiN stacked gate MOS capacitor with 3nm gate oxide is reported by optimizing the sputtering process of a refractory metal gate electrode and adopting a proper anneal temperature to eliminate the damages.Specific methods involved in the optimization of sputtering process include:selecting a proper TiN thickness to reduce stresses;using a smaller sputtering rate to suppress the damages to gate dielectric and adopting a higher N 2/Ar ratio during the TiN sputtering process to further nitride the gate dielectric.With these measures,excellent C V curves are obtained and surface state density ( N ss ) is successfully reduced to below 8×10 10 cm -2 ,which is comparable to the polysilicon gate MOS capacitor.
