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一种非带隙结构基准源的设计及特性分析 被引量:1
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作者 陈华 周锋 +1 位作者 李舜 严伟 《固体电子学研究与进展》 CAS CSCD 北大核心 2008年第1期105-108,113,共5页
设计了一种非带隙结构的电压基准源,并对该基准源作了电源抑制特性的理论分析。这一设计在Chart-ed0.35μm CMOS工艺条件下流片实现,在3~110°C的温度范围内测试结果达到了17.4ppm/°C的性能。
关键词 低功耗 电压基准源 非带隙结构 电源噪声抑制
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一种-100dB电源抑制比的非带隙基准电压源 被引量:2
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作者 黄国城 尹韬 +3 位作者 朱渊明 许晓冬 张亚朝 杨海钢 《电子与信息学报》 EI CSCD 北大核心 2016年第8期2122-2128,共7页
该文提出一种非带隙基准电路,通过一个带超级源极跟随器的预调制电路提供一个稳定的电压,为基准核心电路供电。超级源极跟随器通过降低基准核心电路电源端的对地阻抗,有效提高了基准电路的电源抑制能力。该基准电路采用0.35umCMOS... 该文提出一种非带隙基准电路,通过一个带超级源极跟随器的预调制电路提供一个稳定的电压,为基准核心电路供电。超级源极跟随器通过降低基准核心电路电源端的对地阻抗,有效提高了基准电路的电源抑制能力。该基准电路采用0.35umCMOS工艺设计并流片,测试结果表明,该电路的工作电源电压为1.8μV,静态电流约为13μA。低频处电源抑制比(PSRR)约等于-100dB,在小于1kHz频率范围内PSRR均优于-93dB。并且其片上面积仅为0.013mm2。 展开更多
关键词 CMOS基准电路 非带隙基准电路 预调制电路 超级源极跟随器 电源抑制比
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非带隙低功耗低温漂CMOS电压基准电路设计 被引量:2
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作者 田京辉 黄其煜 《微电子学与计算机》 CSCD 北大核心 2013年第5期35-37,42,共4页
通过V_(th)与V_T(热电压)相互补偿原理,提出一种新型非带隙CMOS电压基准源,其输出基准电压具有极低温度系数.采用0.34μm Foundry18工艺模型和Candance Spectre EDA工具对电路进行模拟验证,获得以下结果:输出电压为552.845mV(T=27℃,V_(... 通过V_(th)与V_T(热电压)相互补偿原理,提出一种新型非带隙CMOS电压基准源,其输出基准电压具有极低温度系数.采用0.34μm Foundry18工艺模型和Candance Spectre EDA工具对电路进行模拟验证,获得以下结果:输出电压为552.845mV(T=27℃,V_(DD)=3.3V),温度系数为1.98ppm/℃(-30℃~+130℃),功耗为21.85μw.电源电压从2.5V变到4.5V,输出电压的变化为0.15%(相对于V_(DD)=3.3V时的输出).该电压基准源可望应用于高精度、低功耗IC系统的设计研发. 展开更多
关键词 非带隙 低功耗 阈值电压 CMOS电压基准
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3.53×10^(-6)m/℃非带隙V_T/V_(th)互补偿CMOS电压基准
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作者 李栋 沈路 何波 《实验科学与技术》 2006年第B12期46-48,共3页
提出了一种基于阈值电压Vth与热电压VT相互补偿的新型非带隙CMOS电压基准源。采用一种新型电路结构提取正比于Vth的电流,通过自偏置电流镜结构获得正比于两个三极管VBE之差的电流输出,两者在公共电阻上的线性叠加,实现Vth与VT的相互补... 提出了一种基于阈值电压Vth与热电压VT相互补偿的新型非带隙CMOS电压基准源。采用一种新型电路结构提取正比于Vth的电流,通过自偏置电流镜结构获得正比于两个三极管VBE之差的电流输出,两者在公共电阻上的线性叠加,实现Vth与VT的相互补偿。基于3·3V电源电压0·35μm标准CMOS工艺模型在CadanceSpectre仿真环境下对电路进行模拟验证,获得以下结果:输出基准电压为716·828mV,在-55℃^+125℃范围内,其温度系数为3·53×10-6m/℃;VDD在2·7V^4V之间变化时,输出电压变化率为1·346%。 展开更多
关键词 非带隙 高精度 VT/Vth互补偿 阚值电压提取 CMOS电压基准
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Research on highly nonlinear photonic bandgap fibers
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作者 FANG Hong LOU Shu-qin GUO Tie-ying LI Hong-lei YAO Lei JIAN Shui-sheng 《Optoelectronics Letters》 EI 2006年第6期412-415,共4页
A new type of highly nonlinear photonic bandgap fiber with modified honeycomb lattice is brought forward. Based on full-vector plane-wave method, the structure of bandgaps and the distributions of fundamental mode fie... A new type of highly nonlinear photonic bandgap fiber with modified honeycomb lattice is brought forward. Based on full-vector plane-wave method, the structure of bandgaps and the distributions of fundamental mode field are analyzed. Then its nonlinear coefficient is calculated, and the effect of each structural pa- rameter on the nonlinear coefficient is discussed. At last, considering many factors synthetically, we make some optimization design of the structural parameters. It can be concluded that this new type of photonic bandgap fiber can gain the nonlinear coefficient of 30 W^-1 km^-1. 展开更多
关键词 线性光能光纤 全向量平面波 结构 线性系数
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Big Third-order Nonlinear Optical Properties of Two Poly[(3-alkylthiophene-2, 5-diyl)-(benzylidenequinomethane-2, 5-diyl)] Derivatives
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作者 GAOChao WUHong-cai +3 位作者 YIWen-hui LIBao-ming SUNJian-ping MENGLing-jie 《Semiconductor Photonics and Technology》 CAS 2005年第2期99-102,共4页
Two novel poly[(3-alkylthiophene-2,5-diyl)-(benzylidenequinomethane-2,5-diyl)s] derivatives, poly[ (3-butylthiophene-2,5-diyl)-( p-N,N-dimethylamino) benzylidenequinomethane-2,5-diyl) ] ( PBTDMABQ) and poly [( 3-octyl... Two novel poly[(3-alkylthiophene-2,5-diyl)-(benzylidenequinomethane-2,5-diyl)s] derivatives, poly[ (3-butylthiophene-2,5-diyl)-( p-N,N-dimethylamino) benzylidenequinomethane-2,5-diyl) ] ( PBTDMABQ) and poly [( 3-octylthiophene2,5-diyl) -(p-N, N-dimethylamino ) benzylidenequinomethane-2, 5-diyl)] (POTDMABQ), were synthesized.The band gaps of the two polymers are calculated as 1. 75 eV for PBTDMABQ and 1. 69 eV for POTDMABQ,respectively. The homogenous films of the two polymers were prepared and their third-ordernonlinear optical properties were studied by the backward degenerate four-wave mixing at 532 nm. Byusing the relative measurement technique, the third-order nonlinear optical susceptibilities ofPBTDMABQ and POTDMABQ are calculated as 5. 62 X 10^(-9) and 1. 22 X 10^(-8) ESU, respectively. It isfound that substituted alky groups have strong effects on the band gap and nonlinear opticalproperties of the two polymers. The relatively big third-order nonlinear optical susceptibilitiesand small band gap of POTDMABQ resulted mainly from the longer alkyl with strong electron-donatingability can enhance the delocation degree of conjugated π electronics. 展开更多
关键词 poly [( 3-alkylthiophene)-( benzylidenequinomethane)] derivatives degeneratefour-wave mixing third-order nonlinear susceptibility band gap
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Ag4Hg(SeO3)2(SeO4): a novel SHG material created in mixed valent selenium oxides by in situ synthesis 被引量:4
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作者 Xiao-Xue Wang Xiao-Bao Li +2 位作者 Chun-Li Hu Fang Kong Jiang-Gao Mao 《Science China Materials》 SCIE EI CSCD 2019年第12期1821-1830,共10页
Explorations of new second harmonic generation materials in Ag^+-Hg^2+/Bi^3+-selenites systems afforded three new silver selenium oxides, namely, Ag4 Hg(SeO3)2(SeO4)(1), Ag2Bi2(SeO3)3(SeO4)(2) and Ag5 Bi(SeO3)4(3). Th... Explorations of new second harmonic generation materials in Ag^+-Hg^2+/Bi^3+-selenites systems afforded three new silver selenium oxides, namely, Ag4 Hg(SeO3)2(SeO4)(1), Ag2Bi2(SeO3)3(SeO4)(2) and Ag5 Bi(SeO3)4(3). They exhibit flexible crystal chemistry. Compounds 1 and 2 are mixed valence selenium oxides containing Se(IV) and Se(VI) cations simultaneously. Compounds 1 and 3 exhibit a 3 D open framework with 4-, 6-and 8-member polyhedral ring tunnels along a, b and c axes. Compound 1 crystallized in a polar space group and could display a subtle frequency doubling efficiency about 35% of the commercial KH2PO4(KDP). UV-vis-NIR spectra reveal that compounds 1–3 are wide-band semiconductors with the optical bandgaps of 3.11, 3.65, 3.58 e V respectively. Theoretical calculations disclose that compounds2 and 3 are indirect band gap structures and their bandgaps are determined by Ag, Bi, Se and O atoms together. 展开更多
关键词 SHG material in situ synthesis mixed valence seleniumoxide SELENITE
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Photonic bandgap amorphous chalcogenide thin films with multilayered structure grown by pulsed laser deposition method
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作者 张绍骞 Petre Němec +1 位作者 Virginie Nazabal 金玉奇 《Optoelectronics Letters》 EI 2016年第3期199-202,共4页
Amorphous chalcogenide thin films were fabricated by the pulsed laser deposition technique. Thereafter, the stacks of multilayered thin films for reflectors and microcavity were designed for telecommunication waveleng... Amorphous chalcogenide thin films were fabricated by the pulsed laser deposition technique. Thereafter, the stacks of multilayered thin films for reflectors and microcavity were designed for telecommunication wavelength. The prepared multilayered thin films for reflectors show good compatibility. The microcavity structure consists of Ge_(25)Ga)5Sb_(10)S_(65)(doped with Er^(3+)) spacer layer surrounded by two 5-layer As_(40)Se_(60)/Ge_(25)Sb_(5)S_(70) reflectors. Scanning/transmission electron microscopy results show good periodicity, great adherence and smooth interfaces between the alternating dielectric layers, which confirms a suitable compatibility between different materials. The results demonstrate that the chalcogenides can be used for preparing vertical Bragg reflectors and microcavity with high quality. 展开更多
关键词 多层薄膜 脉冲激光沉积法 多层结构 光子 硫系 布拉格反射镜 脉冲激光沉积技术
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