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非晶硅半导体及其在传感技术中的应用
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作者 魏光普 《物理》 CAS 北大核心 1993年第9期545-550,共6页
叙述了非晶硅半导体的结构、制备方法及特性,介绍了非晶硅在制作光电传感器、色敏传咸器、放射线(X射线等)传感器及应变传感器等方面的应用。并介绍了这些传感器的大致结构、输出特性及有关的应用.
关键词 非晶硅半导体 传感器 无定形半导体
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Amorphous Silicon 16—bit Array Photodetector
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作者 ZHANGShaoqiang XUZhongyang 《Semiconductor Photonics and Technology》 CAS 1997年第1期20-23,共4页
Abstract: An amorphous silicon 16 - bit array photodetector with the a - SiC/a -Si heterojunction diode is presented. The fabrication processes of the device were studied systematically. By the optimum of the diode st... Abstract: An amorphous silicon 16 - bit array photodetector with the a - SiC/a -Si heterojunction diode is presented. The fabrication processes of the device were studied systematically. By the optimum of the diode structure and the preparation procedures, the diode with Id< 10 -12 A/mm2 and photocurrent Ip^0.35 A/W has been obtained at the wavelength of 632 nm. 展开更多
关键词 Amorphous Semiconductor PHOTODETECTOR Semiconductor Technology
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Analytical Model for Calculating Trapped Charge in a-Si:H and Its Relative Error Analysis
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作者 WAN Xinheng XU Zhongyang ZOU Xuecheng(Huanzhong Univ.of Sci.and Tech.,Wuhan 430074,CHN ) 《Semiconductor Photonics and Technology》 CAS 1996年第2期84-89,共6页
Using a Taylor series expansion for the Fermi-Dirac occupation function,an accurate analytical model is developed for calculating the trapped-charge density in a-Si: H considering deep and tail states simultaneously w... Using a Taylor series expansion for the Fermi-Dirac occupation function,an accurate analytical model is developed for calculating the trapped-charge density in a-Si: H considering deep and tail states simultaneously without simplification.This is followed by the investigation of the relative errors of the localized trapped charge density in a-Si:H at all temperatures as a function of the quasi-Fermi level in the band gap calculated from three published analytical models and our above model. The results suggest that the relative errors of all these models increase notably as Efn is very closed to Ec(e.g.,-0.01 eV< Efn-Ec).It is also noticed that the relative errors of all above models become larger normally the greater is the value of temperature.A detailed analysis indicates that each model has its own applicability with various temperatures and various positions of the Fermi level. 展开更多
关键词 Amorphous Semiconductors Amorphous Silicon Films Density Measurement Error Analysis
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