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TbFeCo非晶磁性薄膜温度特性的平均场理论计算 被引量:1
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作者 黄青青 李佐宜 《华中理工大学学报》 CSCD 北大核心 1991年第1期77-81,共5页
本文依据实验结果,运用平均场理论,计算了TbFeCo非晶磁性薄膜随温度连续变化时的饱和磁化强度M_s,得到了居里点、补偿点及M_s(T)随改变材料成分时的变化趋势图.这些结果对于研究磁光材料的记录特性及热稳定性具有一定的参考价值.
关键词 非晶磁性薄膜 饱和磁化强度 TBFECO
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电沉积三元铁基非晶磁性合金薄膜的研究进展 被引量:1
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作者 孟栋 宣天鹏 王峰 《电镀与精饰》 CAS 北大核心 2012年第5期12-16,共5页
叙述了电沉积三元铁基非晶磁性合金薄膜的工艺条件,包括Fe-Ni-S、Fe-Ni-Cr、Fe-Ni-W、Fe-Co-Ni及Fe-P-B等五种典型合金薄膜。介绍了铁基非晶磁性合金薄膜的耐蚀性、耐磨性、热稳定性以及磁学等功能性能,指出了未来铁基非晶磁性合金薄膜... 叙述了电沉积三元铁基非晶磁性合金薄膜的工艺条件,包括Fe-Ni-S、Fe-Ni-Cr、Fe-Ni-W、Fe-Co-Ni及Fe-P-B等五种典型合金薄膜。介绍了铁基非晶磁性合金薄膜的耐蚀性、耐磨性、热稳定性以及磁学等功能性能,指出了未来铁基非晶磁性合金薄膜的研究方向。 展开更多
关键词 电沉积 非晶磁性合金薄膜 铁基合金
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Composition design and properties of CoNbZr amorphous films deposited by unbalanced magnetron sputtering
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作者 郭光伟 唐光泽 +2 位作者 王亚军 马欣新 王玉江 《Journal of Central South University》 SCIE EI CAS 2009年第5期719-724,共6页
Co87Nb10Zr3,Co76Nb19Zr5,Co64Nb26Zr10 and Co64Nb16Zr20 amorphous films were deposited on noncrystalline glass substrates by DC unbalanced magnetron sputtering. The compositions of amorphous films were tailored in the l... Co87Nb10Zr3,Co76Nb19Zr5,Co64Nb26Zr10 and Co64Nb16Zr20 amorphous films were deposited on noncrystalline glass substrates by DC unbalanced magnetron sputtering. The compositions of amorphous films were tailored in the light of the individual deposition rate of Co,Nb and Zr. The amorphous films with the anticipated composition were prepared by means of co-sputtering Co,Nb and Zr targets simultaneously. It is indicated that there is interaction among three targets during co-sputtering. The morphology and composition of the films were observed by SEM,AFM and EDS. The structure and magnetic property were measured by XRD and physical property measurement system(PPMS) . The coercivity changes with the composition,varying from 240 to 1 600 A/m. After vacuum isothermal annealing at temperatures of 475,500,525 and 550 ℃ for 15 and 30 min,respectively,it is found that high Nb content is beneficial to improving thermal stability of amorphous films. The crystallized films have the mean grain size of 2-19 nm. 展开更多
关键词 CoNbZr amorphous film magnetron co-sputtering isothermal annealing
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