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腐蚀和沉积对偏滤器靶板寿命的影响 被引量:3
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作者 周小兵 盛光昭 +3 位作者 冯开明 朱毓坤 何开辉 龚学余 《核聚变与等离子体物理》 CAS CSCD 北大核心 1998年第4期15-20,共6页
讨论了偏滤器铍靶在聚变堆工况下的腐蚀问题。被物理溅射和辐射增强升华等过程腐蚀了的铍原子经电离后,部分将沉积到铍靶上。分析计算的结果表明,铍靶材被腐蚀后的自沉积将大大降低铍靶的净腐蚀率。在此基础上,研究了一定浓度的硼杂... 讨论了偏滤器铍靶在聚变堆工况下的腐蚀问题。被物理溅射和辐射增强升华等过程腐蚀了的铍原子经电离后,部分将沉积到铍靶上。分析计算的结果表明,铍靶材被腐蚀后的自沉积将大大降低铍靶的净腐蚀率。在此基础上,研究了一定浓度的硼杂质的沉积对铍靶的腐蚀率的影响,结果发现,铍靶前很低浓度的硼杂质即可大大降低铍靶的腐蚀率,并且铍靶的腐蚀率随硼杂质浓度的增加而减少,这对聚变堆的稳态运行是有利的。 展开更多
关键词 偏滤器 腐蚀 沉积 寿命 聚变堆
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氘轰击下氚靶中氚浓度深度分布的变化 被引量:2
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作者 董艾平 李文杰 王强 《东北师大学报(自然科学版)》 CAS CSCD 1991年第2期35-38,共4页
本文推广了低温局部混合模型,并把它用于中子管氚靶的研究中。计算出了在不同氚量轰击下,靶中氚浓度的深度分布;还计算了靶的寿命曲线。计算结果和实验结果符合的很好。文章指出,氚靶内在氘射程内氚的消耗主要是由于氘对氚对氚的置换。
关键词 中子管 氚深度分布 靶寿命
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Design of double-layer anti-sputtering targets for plume effects experimental system 被引量:4
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作者 SHANG ShengFei CAI GuoBiao +1 位作者 ZHU DingQiang HE BiJiao 《Science China(Technological Sciences)》 SCIE EI CAS CSCD 2016年第8期1265-1275,共11页
The back-sputtering effect of an electric thruster used in a vacuum chamber has an adverse effect on the thruster, vacuum chamber and experimental equipment. An anti-sputtering target (AST) can extend the operating ... The back-sputtering effect of an electric thruster used in a vacuum chamber has an adverse effect on the thruster, vacuum chamber and experimental equipment. An anti-sputtering target (AST) can extend the operating life of the vacuum chamber by reducing the back-sputtering deposition effect. Vacuum chambers used in international facilities have successfully incorpo- rated ASTs. To improve an AST's performance, a double layer structure AST based on the plume effects experimental system (PES) was designed. The structure of primary-end of the AST was designed as a flat while the secondary end was designed as a shutter to resolve factors such as service life, back flow rate of the sputtered material, economy and system security. To veri- fy the effects of the double layer AST, the sputtering effects of the AST with and without the secondary-end were evaluated by a DSMC-PIC algorithm. Additionally, the experimental verifications of the bare chamber and the target were performed. The results indicate that the secondary end graphite sheets can reduce the back flow yield approximately 50%. The design of the double layer AST can be introduced as a reference for the design of an anti-sputtering target. 展开更多
关键词 electric propulsion anti-sputtering target vacuum chamber back-sputtering deposition beam target
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