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应用于40Gb/s电吸收调制器的Al_2O_3高速热沉研究 被引量:1
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作者 田建柏 熊兵 +3 位作者 王健 蔡鹏飞 孙长征 罗毅 《红外与毫米波学报》 SCIE EI CAS CSCD 北大核心 2006年第2期105-108,共4页
设计制作了面向40Gb/s电吸收调制器(EAM)的高速微波过渡热沉,并进行了EAM管芯级封装测试的验证.这种基于氧化铝(Al2O3)的热沉采用共面波导(CPW)传输线以实现低损耗微波传送,以及Ta2N薄膜电阻用于EAM的阻抗匹配,采用Ti/Cu/N... 设计制作了面向40Gb/s电吸收调制器(EAM)的高速微波过渡热沉,并进行了EAM管芯级封装测试的验证.这种基于氧化铝(Al2O3)的热沉采用共面波导(CPW)传输线以实现低损耗微波传送,以及Ta2N薄膜电阻用于EAM的阻抗匹配,采用Ti/Cu/Ni/Au金属材料作为CPW传输线电极材料,从而保证CPW传输线与Ta2N电阻材料之间良好的电接触,使热沉的典型反射系数在0—40GHz范围内均达到优于-21dB的水平.作为验证,采用该种热沉用于高速EAM的管芯级封装,测试得到小信号调制响应带宽超过40GHz. 展开更多
关键词 高速热沉 电吸收调制器 共面波导传输线 薄膜电阻 阻抗匹配
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Mn-doped SiGe thin films grown by UHV/CVD with room-temperature ferromagnetism and high hole mobility 被引量:2
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作者 Limeng Shen Xi Zhang +3 位作者 Jiaqi Wang Jianyuan Wang Cheng Li Gang Xiang 《Science China Materials》 SCIE EI CAS CSCD 2022年第10期2826-2832,共7页
In this work,silicon-germanium(SiGe)thin films are epitaxially grown on Ge substrates by ultra-high vacuum chemical vapor deposition and then doped with Mn element by ion-implantation and subsequent rapid thermal anne... In this work,silicon-germanium(SiGe)thin films are epitaxially grown on Ge substrates by ultra-high vacuum chemical vapor deposition and then doped with Mn element by ion-implantation and subsequent rapid thermal annealing(RTA).The characterizations show that the epitaxial SiGe thin films are single-crystalline with uniform tensile strain and then become polycrystalline after the ion implantation and following RTA.The magnetization measurements indicate that the annealed thin films exhibit Mn concentration-dependent ferromagnetism up to 309 K and the X-ray magnetic circular dichroism characterizations reveal the spin and orbital magnetic moments from the substitutional Mn element.To minimize the influence of anomalous Hall effect,magneto-transport measurements at a high magnetic field up to 31 T at 300 K are performed to obtain the hole mobility,which reaches a record-high value of~1230 cm^(2)V^(-1)s^(-1),owing to the crystalline quality and tensile strain-induced energy band modulation of the samples.The first demonstration of Mn-doped SiGe thin films with roomtemperature ferromagnetism and high carrier mobility may pave the way for practical semiconductor spintronic applications. 展开更多
关键词 diluted magnetic semiconductor Mn-doped SiGe FERROMAGNETISM hole mobility UHV/CVD
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