For improving the translation quality of transfer-based MT system,a new metric for rule evaluation was proposed and applied to rule-base optimization.At the same time,a frequency filter was used to delete redundance b...For improving the translation quality of transfer-based MT system,a new metric for rule evaluation was proposed and applied to rule-base optimization.At the same time,a frequency filter was used to delete redundance before new acquired rules were added into rule-base.The new optimization method was applied to a general MT system.Experimental results show that the frequency filter is helpful to provide the knowledge expansion space of MT system for new acquired rules.The translation assessment score of open test corpus (including 2500 Chinese sentences) obtained is increased by 3.58% under 5-gram Nist metric,which is two times of that obtained by previous methods.展开更多
Stress controllable silicon nitride(Si Nx) films deposited by plasma enhanced chemical vapor deposition(PECVD) are reported. Low stress Si Nx films were deposited in both high frequency(HF) mode and dual frequency(HF/...Stress controllable silicon nitride(Si Nx) films deposited by plasma enhanced chemical vapor deposition(PECVD) are reported. Low stress Si Nx films were deposited in both high frequency(HF) mode and dual frequency(HF/LF) mode. By optimizing process parameters, stress free(-0.27 MPa) Si Nx films were obtained with the deposition rate of 45.5 nm/min and the refractive index of 2.06. Furthermore, at HF/LF mode, the stress is significantly influenced by LF ratio and LF power, and can be controlled to be 10 MPa with the LF ratio of 17% and LF power of 150 W. However, LF power has a little effect on the deposition rate due to the interaction between HF power and LF power. The deposited Si Nx films have good mechanical and optical properties, low deposition temperature and controllable stress, and can be widely used in integrated circuit(IC), micro-electro-mechanical systems(MEMS) and bio-MEMS.展开更多
基金Sponsored by the High Technology Research and Development Program of China (Grant No.2002AA117010-09)the National Natural Science Foun-dation of China (Grant No. 60375019)
文摘For improving the translation quality of transfer-based MT system,a new metric for rule evaluation was proposed and applied to rule-base optimization.At the same time,a frequency filter was used to delete redundance before new acquired rules were added into rule-base.The new optimization method was applied to a general MT system.Experimental results show that the frequency filter is helpful to provide the knowledge expansion space of MT system for new acquired rules.The translation assessment score of open test corpus (including 2500 Chinese sentences) obtained is increased by 3.58% under 5-gram Nist metric,which is two times of that obtained by previous methods.
基金supported by the National High Technology Research and Development Program of China(No.2015AA042603)the Fundamental Research Funds for the Central Universities of China(No.106112014CDJZR160001)
文摘Stress controllable silicon nitride(Si Nx) films deposited by plasma enhanced chemical vapor deposition(PECVD) are reported. Low stress Si Nx films were deposited in both high frequency(HF) mode and dual frequency(HF/LF) mode. By optimizing process parameters, stress free(-0.27 MPa) Si Nx films were obtained with the deposition rate of 45.5 nm/min and the refractive index of 2.06. Furthermore, at HF/LF mode, the stress is significantly influenced by LF ratio and LF power, and can be controlled to be 10 MPa with the LF ratio of 17% and LF power of 150 W. However, LF power has a little effect on the deposition rate due to the interaction between HF power and LF power. The deposited Si Nx films have good mechanical and optical properties, low deposition temperature and controllable stress, and can be widely used in integrated circuit(IC), micro-electro-mechanical systems(MEMS) and bio-MEMS.
