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Microstructure and Ferroelectric Properties of (Bi_(0.9)Ho_(0.1))_(3.999)Ti_(2.997)V_(0.003)O_(12) Thin Films Prepared by Sol-gel Method for Nonvolatile Memory
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作者 Chengju Fu Zhixiong Huang +1 位作者 Jie Li Dongyun Guo 《Journal of Materials Science & Technology》 SCIE EI CAS CSCD 2010年第8期679-681,共3页
The (Bi0.9Ho0.1)3.999Ti2.997V0.003012 (BHTV) films have been prepared on Pt/Ti/SiO2/Si substrates by solgel method. The microstructure and ferroelectric properties of the BHTV films were investigated. The BHTV fil... The (Bi0.9Ho0.1)3.999Ti2.997V0.003012 (BHTV) films have been prepared on Pt/Ti/SiO2/Si substrates by solgel method. The microstructure and ferroelectric properties of the BHTV films were investigated. The BHTV films show a single phase of Bi-layered Aurivillius structure and dense microstructure. The Ho3+/V5+ cosubstitution can effectively improve the ferroelectric properties. The BHTV film exhibits good ferroelectric properties with 2Pr of 47.6℃/cm2, 2Ec of 265 kV/cm (at applied field of 420 kV/cm), dielectric constant of 305, dielectric loss of 0.031 (at 1 MHz), good insulting behavior, as well as the fatigue-free behavior. 展开更多
关键词 (bi0.9ho0.1)3.999ti2.997v0.003o12 thin films Sol-gel method Co-substitution Ferroelectric properties Dielectric properties
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