The geometry,stability,binding energy and electronic properties of（SiO2）n and Ge（SiO2）n clusters（n = 7） have been investigated by Density functional theory（DFT）.The results show that the lowest energy structur...The geometry,stability,binding energy and electronic properties of（SiO2）n and Ge（SiO2）n clusters（n = 7） have been investigated by Density functional theory（DFT）.The results show that the lowest energy structures of Ge（SiO2）n are obtained by adding one Ge on the end site of the O atom or the Si near end site of the O atom in（SiO2）n.The chemical activation of Ge-（SiO2）n is improved compared with（SiO2）n.The calculated second-order difference of energies and fragmentation energies show that the Ge（SiO2）n clusters with n = 2 or 5 are stable.展开更多
Total dose effects and single event effects on radiation-hardened power vertical double-diffusion metal oxide semiconductor（VDMOS） devices with composite SiO2-Si3N4 film gates are investigated.The relationships amon...Total dose effects and single event effects on radiation-hardened power vertical double-diffusion metal oxide semiconductor（VDMOS） devices with composite SiO2-Si3N4 film gates are investigated.The relationships among the important electrical parameters of the samples with different thickness SiO2-Si3N4 films,such as threshold voltage,breakdown voltage,and on-state resistance in accumulated dose,are discussed.The total dose experiment results show that the breakdown voltage and the on-state resistance barely change with the accumulated dose.However,the relationships between the threshold voltages of the samples and the accumulated dose are more complex,and not only positively drift,but also negatively drift.At the end of the total dose experiment,we select the group of samples which have the smaller threshold voltage shift to carry out the single event effect studies.We find that the samples with appropriate thickness ratio SiO2-Si3N4 films have a good radiation-hardening ability.This method may be useful in solving both the SEGR and the total dose problems with the composite SiO2-Si3N4 films.展开更多
基金Project supported by the foundation start up for high level talents of Shihezi university (No. RCZX200747)
文摘The geometry,stability,binding energy and electronic properties of（SiO2）n and Ge（SiO2）n clusters（n = 7） have been investigated by Density functional theory（DFT）.The results show that the lowest energy structures of Ge（SiO2）n are obtained by adding one Ge on the end site of the O atom or the Si near end site of the O atom in（SiO2）n.The chemical activation of Ge-（SiO2）n is improved compared with（SiO2）n.The calculated second-order difference of energies and fragmentation energies show that the Ge（SiO2）n clusters with n = 2 or 5 are stable.
文摘以N,N-二甲基丙烯酰胺(DMAA)及甲基丙烯酸甲酯(MMA)为单体,Irgacure 2959为光引发剂,N,N′-二甲基双丙烯酰胺(Bis)为交联剂,利用紫外光引发自由基聚合制备了聚N,N′-二甲基丙烯酰胺(PDMAA)及P(DMAA-co-MMA)水凝胶,并通过加入少量表面改性后的纳米SiO2对该水凝胶进行改性,制得了P(DMAA-co-MMA)/纳米SiO2复合水凝胶,用FT-IR和SEM对产物进行了表征,同时研究该复合凝胶的溶胀动力学、消溶胀动力学、pH值响应性、离子强度等.该方法简便、快捷,大大缩短了聚合时间,合成过程仅需2—3 min.
文摘Total dose effects and single event effects on radiation-hardened power vertical double-diffusion metal oxide semiconductor（VDMOS） devices with composite SiO2-Si3N4 film gates are investigated.The relationships among the important electrical parameters of the samples with different thickness SiO2-Si3N4 films,such as threshold voltage,breakdown voltage,and on-state resistance in accumulated dose,are discussed.The total dose experiment results show that the breakdown voltage and the on-state resistance barely change with the accumulated dose.However,the relationships between the threshold voltages of the samples and the accumulated dose are more complex,and not only positively drift,but also negatively drift.At the end of the total dose experiment,we select the group of samples which have the smaller threshold voltage shift to carry out the single event effect studies.We find that the samples with appropriate thickness ratio SiO2-Si3N4 films have a good radiation-hardening ability.This method may be useful in solving both the SEGR and the total dose problems with the composite SiO2-Si3N4 films.
