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Development of 8-inch Key Processes for Insulated-Gate Bipolar Transistor 被引量:5
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作者 Guoyou Liu Rongjun Ding Haihui Luo 《Engineering》 SCIE EI 2015年第3期361-366,共6页
Based on the construction of the 8-inch fabricat ion line, advanced process technology of 8-inch wafer, as well as the fourth-generation high-voltage double-diffused metal-oxide semiconductor(DMOS+) insulated-gate bip... Based on the construction of the 8-inch fabricat ion line, advanced process technology of 8-inch wafer, as well as the fourth-generation high-voltage double-diffused metal-oxide semiconductor(DMOS+) insulated-gate bipolar transistor(IGBT) technology and the fifth-generation trench gate IGBT technology, have been developed, realizing a great-leap forward technological development for the manufacturing of high-voltage IGBT from 6-inch to 8-inch. The 1600 A/1.7 kV and 1500 A/3.3 kV IGBT modules have been successfully fabricated, qualified, and applied in rail transportation traction system. 展开更多
关键词 insulated-gate bipolar transistor (IGBT) high power density trench gate 8-inch rail transportation
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Clinical utility of 0.025-inch guidewire VisiGlide2TM in the endoscopic retrograde cholangiopancreatography-related procedures 被引量:1
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作者 Yuji Sakai Toshio Tsuyuguchi +7 位作者 Nobuto Hirata So Nakaji Kenji Shimura Takao Nishikawa Tatsuya Fujimoto Tetsuya Hamano Takayoshi Nishino Osamu Yokosuka 《World Journal of Gastrointestinal Endoscopy》 CAS 2017年第2期77-84,共8页
AIM To examine the result of the use of 0.025-inch guidewire(GW) Visi Glide2 TM as the first choice in the endoscopic retrograde cholangiopancreatography(ERCP)-related procedures without selecting the patient in a mul... AIM To examine the result of the use of 0.025-inch guidewire(GW) Visi Glide2 TM as the first choice in the endoscopic retrograde cholangiopancreatography(ERCP)-related procedures without selecting the patient in a multicenter prospective study. METHODS ERCP using 0.025-inch GW VisiGlide2^(TM) as the first choice was conducted in patients who have needed ERCP, and its accomplishment rate of procedure, procedural time, incidence of accidental symptoms were compared with those of ERCP using 0.025-inch GW VisiG lideTM.RESULTS The accomplishment rate of procedure was 97.5%(197/202), and procedural time was 23.930 ± 16.207 min. The accomplishment rate of procedure using 0.025-inch GW Visi GlideTM was 92.3%(183/195), and procedural time was 31.285 ± 19.122 min, thus the accomplishment rate of procedure was significantly improved and procedural time was significantly shortened(P < 0.05). Accidental symptoms by ERCPrelated procedures were observed in 3.0%(6/202), and all were conservatively alleviated. CONCLUSION When 0.025-inch GW VisiG lide2 TM was used for ERCPrelated procedure as the first choice, it showed high accomplishment rate of procedure and low incidence of accidental symptoms, suggesting it can be used as the universal GW. Clinical Trial Registry(UMIN0000016042). 展开更多
关键词 Endoscopic sphincterotomy Endoscopic retrograde cholangiopancreatography 0.025-inch guidewire
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Fabrication of 4-Inch Nano Patterned Wafer with High Uniformity by Laser Interference Lithography 被引量:2
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作者 Gen Yue Yu Lei +2 位作者 Jun-Hui Die Hai-Qiang Jia Hong Chen 《Chinese Physics Letters》 SCIE CAS CSCD 2018年第5期56-59,共4页
We report the fabrication of 4-inch nano patterned wafer by two-beam laser interference lithography and analyze the uniformity in detail. The profile of the dots array with a period of 800 nm divided into five regions... We report the fabrication of 4-inch nano patterned wafer by two-beam laser interference lithography and analyze the uniformity in detail. The profile of the dots array with a period of 800 nm divided into five regions is characterized by a scanning electron microscope. The average size in each region ranges from 270 nm to 320 nm,and the deviation is almost 4%, which is approaching the applicable value of 3% in the industrial process. We simulate the two-beam laser interference lithography system with MATLAB software and then calculate the distribution of light intensity around the 4 inch area. The experimental data fit very well with the calculated results. Analysis of the experimental data and calculated data indicates that laser beam quality and space filter play important roles in achieving a periodical nanoscale pattern with high uniformity and large area. There is the potential to obtain more practical applications. 展开更多
关键词 exp Fabrication of 4-inch Nano Patterned Wafer with High Uniformity by Laser Interference Lithography
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镓硼共掺对6英寸VGF法锗单晶电阻率均匀性的影响
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作者 张颖武 边义午 +3 位作者 陈晨 周春锋 王云彪 兰天平 《半导体技术》 CAS 北大核心 2024年第8期708-712,725,共6页
由于杂质分凝效应,镓掺杂垂直梯度凝固(VGF)法锗单晶的电阻率分布不均匀,理论上利用镓和硼分凝系数的差异,镓硼共掺工艺可以提升锗单晶电阻率均匀性。采用镓硼共掺工艺制备了6英寸(1英寸≈2.54 cm)VGF法锗单晶,对比分析了掺杂工艺对锗... 由于杂质分凝效应,镓掺杂垂直梯度凝固(VGF)法锗单晶的电阻率分布不均匀,理论上利用镓和硼分凝系数的差异,镓硼共掺工艺可以提升锗单晶电阻率均匀性。采用镓硼共掺工艺制备了6英寸(1英寸≈2.54 cm)VGF法锗单晶,对比分析了掺杂工艺对锗单晶电阻率均匀性的影响。当镓和硼杂质浓度分别为5.13×10^(18)cm^(-3)和0.67×10^(18)cm^(-3)时,在等径0~40 mm范围内轴向电阻率不均匀性为4.92%,等径0 mm和40 mm处径向电阻率不均匀性分别为1.63%和0.45%,与镓杂质浓度为5.13×10^(18)cm^(-3)的镓掺杂工艺相比,锗单晶头部的电阻率均匀性明显提升。当硼杂质浓度提高到1.89×10^(18)cm^(-3)时,镓硼共掺锗单晶头部电阻率均匀性变差。结果表明,适量硼掺杂的镓硼共掺工艺可以提升锗单晶头部电阻率均匀性。 展开更多
关键词 6英寸 垂直梯度凝固(VGF)法 锗单晶 镓硼共掺 电阻率 均匀性
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8英寸铌酸锂晶体生长研究
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作者 孙德辉 韩文斌 +2 位作者 李陈哲 彭立果 刘宏 《人工晶体学报》 CAS 北大核心 2024年第3期434-440,共7页
铌酸锂单晶薄膜(LNOI)在新一代信息技术中关键通信器件领域的作用日益显著,随着铌酸锂单晶薄膜制备技术和光子集成技术的发展,降低芯片成本、增加芯片集成度是光子集成芯片永恒不变的发展方向,因此迫切需求大尺寸铌酸锂晶体。本文讨论... 铌酸锂单晶薄膜(LNOI)在新一代信息技术中关键通信器件领域的作用日益显著,随着铌酸锂单晶薄膜制备技术和光子集成技术的发展,降低芯片成本、增加芯片集成度是光子集成芯片永恒不变的发展方向,因此迫切需求大尺寸铌酸锂晶体。本文讨论了大尺寸坩埚中熔体自然对流随着液面下降的变化规律,研究了8英寸(1英寸=2.54 cm)铌酸锂Z轴、X轴两个提拉方向的生长特点,获得等径尺寸大于φ210 mm×50 mm的8英寸Z轴、X轴铌酸锂晶体。1 mm厚X轴铌酸锂晶圆的透过率显示波长380~3 300 nm光谱的透过率超过了70%,晶片纹影图像显示晶体中存在折射率脉理缺陷。 展开更多
关键词 铌酸锂 8英寸 自然对流 提拉法 折射率脉理
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Temperature-resistant and flexible supercapacitors based on 10-inch wafer-scale nanocarbon films 被引量:4
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作者 Xiaobei Zang Yi Hou +3 位作者 Teng Wang Rujing Zhang Feiyu Kang Hongwei Zhu 《Science China Materials》 SCIE EI CSCD 2019年第7期947-954,共8页
Most of the supercapacitors reported in literatures showed little or no flexibility in the working temperature around 150℃. However, the supercapacitors are generally exposed under complex system or extreme temperatu... Most of the supercapacitors reported in literatures showed little or no flexibility in the working temperature around 150℃. However, the supercapacitors are generally exposed under complex system or extreme temperature, such as electric vehicles and extremely cold area. Herein, we successfully fabricated a large-scale robust nanocarbon hybrid film consisting of reduced graphene oxide (rGO), carbon nanotubes (CNTs) and MnOx nano-flowers with the size up to 550 cm^2. The mechanical properties of the hybrid films depend on the ratio o f CNTs. The supercapacitors prepared with the hybrid films exhibit high flexibility and keep their performances in a temperature range from - 20 to 200℃. In addition, the devices display remarkable electrochemical and deformation stability at extrem e temperature. This strategy has a potential for the more efficient preparation of flexible electrode materials. 展开更多
关键词 tem perature-resistant 10 -inch nanocarbon film flexible supercapacitor
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城市轨道交通隧道综合岩溶勘察技术创新应用 被引量:1
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作者 孙中科 《铁道勘察》 2024年第2期71-78,共8页
为控制岩溶发育地区城市轨道交通工程施工过程中的地质风险,准确查明隧道洞身区域岩溶发育程度及特点至关重要。若仅采用在隧道结构线外侧实施钻探的方法,存在隧道范围内岩溶无法准确查明等不足。针对此问题,以贵阳市城市轨道交通3号线... 为控制岩溶发育地区城市轨道交通工程施工过程中的地质风险,准确查明隧道洞身区域岩溶发育程度及特点至关重要。若仅采用在隧道结构线外侧实施钻探的方法,存在隧道范围内岩溶无法准确查明等不足。针对此问题,以贵阳市城市轨道交通3号线一期工程区间隧道为例,针对不同平面位置、深度岩溶的发育特点,在调查获取相关勘察资料基础上,采用地质雷达、微动、高精度瞬变电磁等地面物探方法,逐步圈定岩溶发育的重点区域,再通过在隧道中线位置实施钻探进行验证,并对溶洞充填物进行原位测试及室内试验,最后利用钻孔开展跨孔CT和管波测试。物探推断197处岩溶发育,有34处与钻孔揭露溶洞相吻合,70%的洞径小于2 m;94%溶洞分布于底板埋深以上,其中29%分布于隧道洞身范围内;55%以上钻孔揭露溶洞为无充填类型。本次岩溶勘察查明了岩溶类型及形态、岩溶空间分布特征、岩溶与隧道结构关系、溶洞充填情况等信息,为该项目设计施工提供翔实、准确的地质资料。 展开更多
关键词 城市轨道交通 岩溶勘察 隧道中线钻探 瞬变电磁 跨孔CT 微动 管波
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8英寸晶圆低损耗厚氮化硅波导的工艺开发
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作者 丛庆宇 李赵一 +3 位作者 周敬杰 范作文 贾连希 胡挺 《光子学报》 EI CAS CSCD 北大核心 2024年第9期93-103,共11页
在8英寸晶圆上制备氮化硅膜厚度超过400 nm时,产生的拉伸应力会使薄膜产生裂纹,为此,采用大马士革工艺,通过低压化学气相沉积分两步沉积、抛光氮化硅薄膜,同时结合棋盘格结构,减小应力,降低薄膜出现裂纹的风险。使用此方法成功在8英寸... 在8英寸晶圆上制备氮化硅膜厚度超过400 nm时,产生的拉伸应力会使薄膜产生裂纹,为此,采用大马士革工艺,通过低压化学气相沉积分两步沉积、抛光氮化硅薄膜,同时结合棋盘格结构,减小应力,降低薄膜出现裂纹的风险。使用此方法成功在8英寸晶片上制造了截面尺寸为800 nm×0.8µm的氮化硅波导。两步沉积过后进行两次退火处理,可以进一步降低波导损耗,通过采用cut-back的方式测试波导传输损耗在1550 nm处为0.087 dB/cm,在1580 nm处为0.062 dB/cm。波导的弯曲损耗在半径为50µm时为0.0065 dB,在半径为80µm时仅为0.006 dB。 展开更多
关键词 光电子学 光波导 8英寸 氮化硅 低压化学气相沉积 工艺优化 低损耗
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8英寸SiC晶圆制备与外延应用
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作者 韩景瑞 李锡光 +7 位作者 李咏梅 王垚浩 张清纯 李达 施建新 闫鸿磊 韩跃斌 丁雄杰 《人工晶体学报》 CAS 北大核心 2024年第10期1712-1719,共8页
碳化硅(SiC)是制作高温、高频、大功率电子器件的理想电子材料之一,近20年来随着SiC材料加工技术的不断提升,其应用领域不断扩大。目前SiC芯片的制备仍然以6英寸(1英寸=25.4 mm)晶圆为主,但是行业龙头企业已经开始研发基于8英寸SiC晶圆... 碳化硅(SiC)是制作高温、高频、大功率电子器件的理想电子材料之一,近20年来随着SiC材料加工技术的不断提升,其应用领域不断扩大。目前SiC芯片的制备仍然以6英寸(1英寸=25.4 mm)晶圆为主,但是行业龙头企业已经开始研发基于8英寸SiC晶圆的下一代器件和芯片。本研究联合国内SiC产业链上、下游龙头企业,推进8英寸SiC芯片国产研发,尤其是关键的晶圆制备和外延应用环节。本文采用扩径生长法制备了8英寸导电型4H-SiC衬底晶圆,其平均基平面位错(BPD)密度低至251 cm^(-2),平均螺位错(TSD)密度小于1 cm^(-2),实现了近“零TSD”和低BPD密度的8英寸导电型4H-SiC衬底晶圆的制备,可以满足生产需要。采用国产8英寸外延设备和开发工艺包,实现了速率为68.66μm/h的快速外延生长,厚度不均匀性为0.89%,掺杂不均匀性为2.05%,这两个指标已经达到了优良6英寸外延膜的水平,完全可以满足生产需要。与国外已发布的8英寸外延结果对比,厚度和掺杂均匀性均优于国外数据,而缺陷密度只有国外数据的1/4。本文设计和实施了多片重复性试验,验证了8英寸外延的稳定性。 展开更多
关键词 碳化硅 8英寸 晶圆 外延 缺陷密度 掺杂均匀性
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8英寸半导电型GaAs单晶衬底的制备与性能表征
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作者 任殿胜 王志珍 +1 位作者 张舒惠 王元立 《人工晶体学报》 CAS 北大核心 2024年第3期487-496,共10页
本文使用垂直梯度凝固(VGF)法制备了直径超过200 mm的Si掺杂GaAs单晶。通过多线切割、磨边、研磨、化学机械抛光和湿法化学清洗等加工工序制备出8英寸半导电型GaAs单晶衬底。使用X射线衍射、位错密度检测、霍尔测试、非接触式表面电阻... 本文使用垂直梯度凝固(VGF)法制备了直径超过200 mm的Si掺杂GaAs单晶。通过多线切割、磨边、研磨、化学机械抛光和湿法化学清洗等加工工序制备出8英寸半导电型GaAs单晶衬底。使用X射线衍射、位错密度检测、霍尔测试、非接触式表面电阻率测试、光致发光测试和晶圆表面缺陷检测等对8英寸GaAs衬底的晶体质量、位错、电学性能和表面质量等特性进行了测试分析。结果表明:衬底(400)衍射峰半峰全宽低于0.009°;平均位错密度低于30 cm^(-2),其中,晶体头部平均位错密度为1.7 cm^(-2),且有98.87%的面积位错密度为0;衬底面内电阻率标准差小于6%,面内光致发光强度标准差小于4%,≥0.2μm的表面光点缺陷(LPD)个数小于10。上述结果表明,所制备的8英寸GaAs衬底质量优异,满足外延器件对高质量衬底的要求。 展开更多
关键词 GAAS 垂直梯度凝固 8英寸 单晶衬底 位错密度
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上架机箱舰载振动工装结构设计
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作者 张春成 郑宏军 +2 位作者 孙航 王思学 叶栋 《环境技术》 2024年第5期188-193,共6页
安装在舰艇上的上架机箱设备需要进行振动和摆锤试验,机箱无法直接固定在振动台需要设计特定的振动工装。为适应振动和摆锤冲击要求,本文采用有限元仿真技术对振动工装进行分析,从而对振动工装进行优化设计,实现振动工装的最优结构设计。
关键词 上架机箱 振动工装 优化设计
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四英寸半导体含氟废水处理工程案例
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作者 徐占营 《广东化工》 CAS 2024年第11期118-120,共3页
江苏某半导体公司产生的含氟废水种类比较复杂,有低浓度含氟废水和高浓度含氟废水。为了达到处理要求,将高浓度废水单独处理,处理后的水用于配置氢氧化钙药剂,然后和低浓度废水混合后再处理。低浓度含氟废水通过两级除氟达到污水综合排... 江苏某半导体公司产生的含氟废水种类比较复杂,有低浓度含氟废水和高浓度含氟废水。为了达到处理要求,将高浓度废水单独处理,处理后的水用于配置氢氧化钙药剂,然后和低浓度废水混合后再处理。低浓度含氟废水通过两级除氟达到污水综合排放标准中的三级排放标准。 展开更多
关键词 四英寸半导体 氟废水 化学沉淀 PH控制
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基于8英寸的碳化硅单晶生长炉技术
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作者 靳丽岩 王毅 +3 位作者 王宏杰 武昕彤 郭帝江 师开鹏 《电子工艺技术》 2024年第3期46-49,62,共5页
碳化硅是制作高温、高频、大功率以及高压器件的理想材料之一。为提高生产效率并降低成本,大尺寸碳化硅衬底的制备是重要发展方向。针对8英寸碳化硅单晶生长的工艺需求,分析了碳化硅物理气相输运法生长机理,研究了碳化硅单晶生长炉的加... 碳化硅是制作高温、高频、大功率以及高压器件的理想材料之一。为提高生产效率并降低成本,大尺寸碳化硅衬底的制备是重要发展方向。针对8英寸碳化硅单晶生长的工艺需求,分析了碳化硅物理气相输运法生长机理,研究了碳化硅单晶生长炉的加热系统、坩埚旋转、工艺参数控制技术,通过热场模拟仿真分析和工艺试验,成功制备生长了8英寸晶体。 展开更多
关键词 碳化硅 8英寸 物理气相输运 单晶生长炉
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Study of the front-end signal for the 3-inch PMTs instrumentation in JUNO
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作者 Diru Wu Jilei Xu +2 位作者 Miao He Zhimin Wang Ziliang Chu 《Radiation Detection Technology and Methods》 CSCD 2022年第3期349-360,共12页
A total of 25,6003-inch PMTs will be installed in Jiangmen Underground Neutrino Observatory(JUNO)to achieve more precise energy calibration and to extend the physics detection potential.Performances of all bare PMTs h... A total of 25,6003-inch PMTs will be installed in Jiangmen Underground Neutrino Observatory(JUNO)to achieve more precise energy calibration and to extend the physics detection potential.Performances of all bare PMTs have been characterized and these PMTs are being instrumented with the high voltage divider,underwater front-end cable,and connector.In this paper,we present a dedicated study on signal quality at different stages of the instrumentation.An optimized high voltage ratio was confirmed andfinalized which improved the PMT transit time spread by 25%.The signal charge was attenuated by 22.5%(13.0%)in the 10 m(5 m)cable and it required the addition of 45 V(23 V)to compensate for the loss of PMT gain.There was a 1%overshoot following the PMT signal and no sign of reflection in the connector.A group of 163-inch PMTs with the full instrumentation was installed in the JUNO prototype detector together with a few 8-inch and 20-inch PMTs,which showed good stability and demonstrated a photon detection system with multiple types of PMTs. 展开更多
关键词 JUNO 3-inch PMT PMT divider TTS Signal attenuation JUNO prototype
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Predicting the Stitch Density of Finished Fabrics Using Weft Blended Grey Knit Fabrics
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作者 Kazi Md. Elias Mohammad Obaidur Rahman H. M. Zakir Hossain 《Journal of Textile Science and Technology》 2024年第3期51-63,共13页
Stitch density is one of the critical quality parameters of knit fabrics. This parameter is closely related to other physical quality parameters like fabric weight, fabric tightness factor, fiber types, blend ratio, y... Stitch density is one of the critical quality parameters of knit fabrics. This parameter is closely related to other physical quality parameters like fabric weight, fabric tightness factor, fiber types, blend ratio, yarn diameter and linear density, and fabric structure. Selecting stitch density (wales per inch, course per inch) is essential to getting the appropriate fabric weight and desired quality. Usually, no rules or assumptions exist to get the desired stitch density in the finished fabric stage. Fifteen types of blended knit fabrics were prepared to conduct the study. The varying percentages of cotton, polyester, and elastane are incorporated in the blends. Regression analysis and regression ANOVA tests were done to predict the stitch density of finished fabrics. A suitable regression equation is established to get the desired results. The study also found that the stitch density value in the finished stage fabric decreases by approximately 15% compared to the stitch density in the grey fabric stage. This study will help the fabric manufacturers get the finished fabric stitch density in advance by utilizing the grey fabric stitch density data set. The author expects this research to benefit the knitting and dyeing industry, new researchers, and advanced researchers. 展开更多
关键词 Wales per Inch Course per Inch Stitch Density BLENDED Knit FABRIC
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CMOS vision sensor with fully digital image process integrated into low power 1/8-inch chip
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作者 金湘亮 刘志碧 陈杰 《Chinese Optics Letters》 SCIE EI CAS CSCD 2010年第3期282-285,共4页
A digital still camera image processing system on a chip, different from the video camera system, is pre- sented for mobile phone to reduce the power consumption and size. A new color interpolation algorithm is propos... A digital still camera image processing system on a chip, different from the video camera system, is pre- sented for mobile phone to reduce the power consumption and size. A new color interpolation algorithm is proposed to enhance the image quality. The system can also process fixed patten noise (FPN) reduction, color correction, gamma correction, RGB/YUV space transfer, etc. The chip is controlled by sensor regis- ters by inter-integrated circuit (I2C) interface. The voltage for both the front-end analog and the pad cir- cuits is 2.8 V, and the volatge for the image signal processing is 1.8 V. The chip running under the external 13.5-MHz clock has a video data rate of 30 frames/s and the measured power dissipation is about 75 roW. 展开更多
关键词 CMOS vision sensor with fully digital image process integrated into low power 1/8-inch chip RATE RGB
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螺杆式空压机恶劣环境下故障排除方法
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作者 明太浩 杜洋 《冶金设备管理与维修》 2024年第1期16-18,共3页
提出了多次点动启动法,解决了螺杆式空压机在冬季低温环境下启动困难的问题,研究了螺杆式空压机冷却风扇阻塞排除法和空气滤清器阻塞排除法,解决了生产过程中出现的疑难问题,有效提高了螺杆式空压机的使用效率与寿命。
关键词 螺杆式空压机 故障排除 多次点动启动 阻塞排除法
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Study of TTS for a 20-inch dynode PMT
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作者 廖东豪 刘宏邦 +6 位作者 周亦雄 罗凤姣 王志民 杨安波 徐美杭 谢万 秦中华 《Chinese Physics C》 SCIE CAS CSCD 2017年第7期123-128,共6页
The neutrino detector for the Jiangmen Underground Neutrino Observatory(JUNO) requires a large number of photomultiplier tubes(PMTs), including 15000 MCP PMTs and 5000 dynode PMTs. The TTS(transit time spread) o... The neutrino detector for the Jiangmen Underground Neutrino Observatory(JUNO) requires a large number of photomultiplier tubes(PMTs), including 15000 MCP PMTs and 5000 dynode PMTs. The TTS(transit time spread) of the PMTs is very important for vertex and track reconstruction of the neutrinos in the detector. In this paper, we study the TTS of a 20-inch dynode PMT(R12860) from Hamamatsu for different high voltage, light intensity, light spot size and different photocathode regions. The impact from Earth's magnetic field is also studied.The results achieved in this paper will be very useful for the JUNO experiment. 展开更多
关键词 TTS 20-inch dynode PMT transit time Earth's magnetic field
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转体连续梁行程点动技术应用分析
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作者 崔九洲 《工程技术研究》 2024年第10期73-75,共3页
目前,转体连续梁施工技术在邻近营业线施工中得到普遍应用,但转体结构物在点动转体过程中经常出现超转和转体不到位的情况,不仅延长了作业时间,而且增加了邻近营业线施工风险。行程点动技术不仅能明确梁端行程与牵引钢绞线行程的函数关... 目前,转体连续梁施工技术在邻近营业线施工中得到普遍应用,但转体结构物在点动转体过程中经常出现超转和转体不到位的情况,不仅延长了作业时间,而且增加了邻近营业线施工风险。行程点动技术不仅能明确梁端行程与牵引钢绞线行程的函数关系,实现毫米级精确控制,而且可以使转体结构物快速、精确地到达预定位置,达到充分利用天窗时间点的目的。文章结合新建济南至莱芜高速铁路跨瓦日铁路特大桥转体连续梁转体施工的工程案例,总结了行程点动技术的相关原理及计算步骤,旨在为今后邻近营业线转体施工工程提供参考。 展开更多
关键词 转体桥施工 行程点动技术 函数关系
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简化正中神经寸移检测对常规肌电图正常腕管综合征患者的诊断价值
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作者 陶拓宇 《癫痫与神经电生理学杂志》 2024年第4期214-219,226,共7页
目的探讨简化正中神经寸移对常规肌电图检查正常的腕管综合征(CTS)的诊断价值。方法以正常受试者为检测对象先测出正中神经(运动和感觉)寸移2 cm间隔平均传导时间,再以最长时间间隔计算出95%区间,以上限为判断间隔时间是否异常的标准。... 目的探讨简化正中神经寸移对常规肌电图检查正常的腕管综合征(CTS)的诊断价值。方法以正常受试者为检测对象先测出正中神经(运动和感觉)寸移2 cm间隔平均传导时间,再以最长时间间隔计算出95%区间,以上限为判断间隔时间是否异常的标准。对临床考虑为CTS的患者进行常规肌电图检测,筛选出肌电图正常的患者,再进行简化正中神经寸移检测。结果正常人正中神经腕段运动寸移从腕的近段到远端3个节段的传导时间分别是(0.32±0.21)ms、(0.59±0.19)ms和(0.41±0.23)ms,以最长时间第2段为对象确立2 cm距离神经传导正常值上限为1 ms,以超过1 ms为异常;同样正中神经腕段逆向感觉神经传导寸移从腕的近段到远端3个节段的传导时间分别是(0.21±0.21)ms、(0.39±0.19)ms和(0.54±0.23)ms,以最长时间第3段为对象,95%可信区间确定正中神经寸移2 cm距离传导时间上限为1 ms,超过1 ms为异常。简化正中神经寸移检测本组5例不典型症状肌电图正常的CTS患者均存在不同程度的传导阻滞。结论简化正中神经寸移有助于对常规肌电图检测正常的CTS的诊断。 展开更多
关键词 简化正中神经寸移 腕管综合征 远端运动潜伏期 常规肌电图 神经传导
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