基于试验数据,利用扩展有限元方法(extended finite element method,XFEM)和内聚力模型(cohesive zone model,CZM),对20Cr2Ni3钢顶头表面氧化膜的断裂行为进行了数值分析,研究了氧化膜受力方向和孔洞对裂纹生长行为的影响。结果表明:氧...基于试验数据,利用扩展有限元方法(extended finite element method,XFEM)和内聚力模型(cohesive zone model,CZM),对20Cr2Ni3钢顶头表面氧化膜的断裂行为进行了数值分析,研究了氧化膜受力方向和孔洞对裂纹生长行为的影响。结果表明:氧化膜受力方向影响裂纹扩展路径,外层氧化膜裂纹尖端的J积分和应力强度因子K_I随着θ角(受力方向与氧化膜的夹角)的增大而减小,当θ角增大到90°时裂纹停止生长;外层氧化膜上孔洞使得裂纹尖端的J积分和应力强度因子K_I减小。同时,孔洞的存在使得外力传递到内层氧化膜时产生应力集中和偏移,导致内层裂纹受力不均,减小了受力方向对内层裂纹生长的影响。展开更多
Ni80Fe20/Ni48Fe12Cr40 bilayer films and Ni80Fe20 monolayer films were deposited at room temperature on SiO2/Si（100） substrates by electron beam evaporation. The influence of the thickness of the Ni48Fe12Cr40 underla...Ni80Fe20/Ni48Fe12Cr40 bilayer films and Ni80Fe20 monolayer films were deposited at room temperature on SiO2/Si（100） substrates by electron beam evaporation. The influence of the thickness of the Ni48Fe12Cr40 underlayer on the structure, magnetization, and magnetoresistance of the Ni80Fe20/Ni48Fe12Cr40 bilayer film was investigated. The thickness of the Ni48Fe12Cr40 layer varied from about 1 nm to 18 nm while the Ni80Fe20 layer thickness was fixed at 45 nm. For the as-deposited bilayer films the introducing of the Ni48Fe12Cr40 underlayer promotes both the （111） texture and grain growth in the Ni80Fe20 layer. The Ni48Fe12Cr40 underlayer has no significant influence on the magnetic moment of the Ni80Fe20/Ni48Fe12Cr40 bilayer film. However, the coercivity of the bilayer film changes with the thickness of the Ni48Fe12Cr40 undedayer. The optimum thickness of the Ni48Fe12Cr40 underlayer for improving the anisotropic magnetoresistance effect of the Ni80Fe20/Ni48Fe12Cr40 bilayer film is about 5 nm. With a decrease in temperature from 300 K to 81 K, the anisotropic magnetoresistance ratio of the Ni80Fe20 （45 nm）/Ni48Fe12Cr40 （5 nm） bilayer film increases linearly from 2.1% to 4.8% compared with that of the Ni80Fe20 monolayer film from 1.7% to 4.0%.展开更多
文摘基于试验数据,利用扩展有限元方法(extended finite element method,XFEM)和内聚力模型(cohesive zone model,CZM),对20Cr2Ni3钢顶头表面氧化膜的断裂行为进行了数值分析,研究了氧化膜受力方向和孔洞对裂纹生长行为的影响。结果表明:氧化膜受力方向影响裂纹扩展路径,外层氧化膜裂纹尖端的J积分和应力强度因子K_I随着θ角(受力方向与氧化膜的夹角)的增大而减小,当θ角增大到90°时裂纹停止生长;外层氧化膜上孔洞使得裂纹尖端的J积分和应力强度因子K_I减小。同时,孔洞的存在使得外力传递到内层氧化膜时产生应力集中和偏移,导致内层裂纹受力不均,减小了受力方向对内层裂纹生长的影响。
文摘Ni80Fe20/Ni48Fe12Cr40 bilayer films and Ni80Fe20 monolayer films were deposited at room temperature on SiO2/Si（100） substrates by electron beam evaporation. The influence of the thickness of the Ni48Fe12Cr40 underlayer on the structure, magnetization, and magnetoresistance of the Ni80Fe20/Ni48Fe12Cr40 bilayer film was investigated. The thickness of the Ni48Fe12Cr40 layer varied from about 1 nm to 18 nm while the Ni80Fe20 layer thickness was fixed at 45 nm. For the as-deposited bilayer films the introducing of the Ni48Fe12Cr40 underlayer promotes both the （111） texture and grain growth in the Ni80Fe20 layer. The Ni48Fe12Cr40 underlayer has no significant influence on the magnetic moment of the Ni80Fe20/Ni48Fe12Cr40 bilayer film. However, the coercivity of the bilayer film changes with the thickness of the Ni48Fe12Cr40 undedayer. The optimum thickness of the Ni48Fe12Cr40 underlayer for improving the anisotropic magnetoresistance effect of the Ni80Fe20/Ni48Fe12Cr40 bilayer film is about 5 nm. With a decrease in temperature from 300 K to 81 K, the anisotropic magnetoresistance ratio of the Ni80Fe20 （45 nm）/Ni48Fe12Cr40 （5 nm） bilayer film increases linearly from 2.1% to 4.8% compared with that of the Ni80Fe20 monolayer film from 1.7% to 4.0%.
