目前全球主要集成电路的制造厂家的制程已经发展到纳米(nm)级别,全球各大半导体巨头制程工艺在竞争中发展。毫无疑问,Intel是半导体工业的技术霸主,是先进制程技术的带头人。AMD是曾经的追随者,与格罗方德合作后又转向三星。台积电在GP...目前全球主要集成电路的制造厂家的制程已经发展到纳米(nm)级别,全球各大半导体巨头制程工艺在竞争中发展。毫无疑问,Intel是半导体工业的技术霸主,是先进制程技术的带头人。AMD是曾经的追随者,与格罗方德合作后又转向三星。台积电在GPU领域有崇高地位,能否再创辉煌,业界拭目以待。三星14nm Fin FET的规模化量产,使得三星成为全球半导体领域的新霸主。制程工艺的极限将推动集成电路制造技术产生革命性创新。展开更多
In this paper, we explore the possibility of mapping devices designed in TCAD environment to its modeled version developed in cadence virtuoso environment using a look-up table （LUT） approach. Circuit simu- lation o...In this paper, we explore the possibility of mapping devices designed in TCAD environment to its modeled version developed in cadence virtuoso environment using a look-up table （LUT） approach. Circuit simu- lation of newly designed devices in TCAD environment is a very slow and tedious process involving complex scripting. Hence, the LUT based modeling approach has been proposed as a faster and easier alternative in ca- dence environment. The LUTs are prepared by extracting data from the device characteristics obtained from device simulation in TCAD. A comparative study is shown between the TCAD simulation and the LUT-based alternative to showcase the accuracy of modeled devices. Finally the look-up table approach is used to evaluate the perform- ance of circuits implemented using 14 nm nMOSFET.展开更多
文摘目前全球主要集成电路的制造厂家的制程已经发展到纳米(nm)级别,全球各大半导体巨头制程工艺在竞争中发展。毫无疑问,Intel是半导体工业的技术霸主,是先进制程技术的带头人。AMD是曾经的追随者,与格罗方德合作后又转向三星。台积电在GPU领域有崇高地位,能否再创辉煌,业界拭目以待。三星14nm Fin FET的规模化量产,使得三星成为全球半导体领域的新霸主。制程工艺的极限将推动集成电路制造技术产生革命性创新。
文摘In this paper, we explore the possibility of mapping devices designed in TCAD environment to its modeled version developed in cadence virtuoso environment using a look-up table （LUT） approach. Circuit simu- lation of newly designed devices in TCAD environment is a very slow and tedious process involving complex scripting. Hence, the LUT based modeling approach has been proposed as a faster and easier alternative in ca- dence environment. The LUTs are prepared by extracting data from the device characteristics obtained from device simulation in TCAD. A comparative study is shown between the TCAD simulation and the LUT-based alternative to showcase the accuracy of modeled devices. Finally the look-up table approach is used to evaluate the perform- ance of circuits implemented using 14 nm nMOSFET.
