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Effects of thickness on superconducting properties and structures of Y_2O_3/BZO-doped MOD-YBCO films 被引量:1
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作者 丁发柱 古宏伟 +5 位作者 王洪艳 张慧亮 张腾 屈飞 董泽斌 周微微 《Chinese Physics B》 SCIE EI CAS CSCD 2015年第5期541-545,共5页
We report the thickness dependence of critical current density (Jc) in YBa2Cu3O7-x (YBCO) films with BaZrO3 (BZO) and Y2O3 additions grown on single crystal LaAlO3 substrates by metalorganic deposition using tri... We report the thickness dependence of critical current density (Jc) in YBa2Cu3O7-x (YBCO) films with BaZrO3 (BZO) and Y2O3 additions grown on single crystal LaAlO3 substrates by metalorganic deposition using trifluoroacetates (TFA-MOD). Comparing with pttre YBCO films, the Jc of BZO/Y2O3-doped YBCO films was significantly enhanced. It was also found that with the increase of the thickness of YBCO film from 0.25 μm to 1.5 μm, the Ic of BZO/Y2O3-doped YBCO film increased from 130 A/cm to 250 A/cm and yet Jc of YBCO film decreased from 6.5 MA/cm2 to 2.5 M A/cm2. The thick BZO/Y2O3-doped MOD-YBCO film showed lower Jc, which is mainly attributed to the formation of a-axis grains and pores. 展开更多
关键词 YBa2Cu3O7-x films thickness BZO/Y2O3 doping TEXTURE
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Study on Mg PSZ Ceramics Doped with Y_2O_3 and CeO_2
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作者 马亚鲁 袁启明 谈家琪 《Journal of Rare Earths》 SCIE EI CAS CSCD 2000年第2期105-109,共5页
Mg PSZ ceramics doped with Y 2O 3 and CeO 2 was prepared using traditional processing method. The fine grain PSZ ceramics( d c10 μm) sintered at low temperature(1550 ℃) was obtained by means of composition ... Mg PSZ ceramics doped with Y 2O 3 and CeO 2 was prepared using traditional processing method. The fine grain PSZ ceramics( d c10 μm) sintered at low temperature(1550 ℃) was obtained by means of composition design. The effects of co stabilization of Y 2O 3, CeO 2 and annealing at 1100 ℃ on material composition, microstructure and mechanical properties were studied. The results show that Y 2O 3 and CeO 2 during annealing at 1100 ℃ can inhibit subeutectoid decomposition reaction effectively, and optimize nucleation and growth of t ZrO 2 precipitates in c ZrO 2 matrix phase. The materials show transgranular and intergranular fracture characteristics, and exhibit better mechanical properties owing to the cooperative effect of stress induced transformation toughening and microcrack toughening. 展开更多
关键词 rare earths Mg PSZ ceramic DOPING Y 2O 3 ceo 2 mechanical property
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Effects of dopant content on optical and electrical properties of In_2O_3: W transparent conductive films 被引量:3
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作者 Zhang, Yuanpeng Li, Yuan +3 位作者 Li, Chunzhi Wang, Wenwen Zhang, Junying Wang, Rongming 《Rare Metals》 SCIE EI CAS CSCD 2012年第2期168-171,共4页
The In 2 O 3 : W (IWO) films with different W content were deposited on glass substrate using direct current sputtering method. The structure, surface morphology, and optical and electrical properties were investigate... The In 2 O 3 : W (IWO) films with different W content were deposited on glass substrate using direct current sputtering method. The structure, surface morphology, and optical and electrical properties were investigated. Results showed that both the carrier concentration and carrier mobility were increased with the doping of W. The IWO film with the lowest resistivity of 1.0×10 3 cm, highest carrier mobilityof 43.7 cm 2 V 1 s 1 and carrier concentration of 1.4×10 20 cm 3 was obtained at the content of 2.8 wt.%. The average optical transmittance from 300 nm to 900 nm reached 87.6%. 展开更多
关键词 In 2 O 3 : W thin film doping content DC magnetron sputtering optical and electrical properties
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Mn doping effects on the gate-tunable transport properties of Cd3As2 films epitaxied on GaAs 被引量:2
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作者 Hailong Wang Jialin Ma +1 位作者 Qiqi Wei Jianhua Zhao 《Journal of Semiconductors》 EI CAS CSCD 2020年第7期33-38,共6页
The Mn doping effects on the gate-tunable transport properties of topological Dirac semimetal Cd3As2 films have been investigated.Mn-doped Cd3As2 films are directly grown on GaAs(111)B substrates by molecular-beam epi... The Mn doping effects on the gate-tunable transport properties of topological Dirac semimetal Cd3As2 films have been investigated.Mn-doped Cd3As2 films are directly grown on GaAs(111)B substrates by molecular-beam epitaxy,during which the single crystal phase can be obtained with Mn concentration less than 2%.Shubnikov-de Haas oscillation and quantum Hall effect are observed at low temperatures,and electrons are found to be the dominant carrier in the whole temperature range.Higher Mn content results in smaller lattice constant,lower electron mobility and larger effective band gap,while the carrier density seems to be unaffected by Mn-doping.Gating experiments show that Shubnikov-de Haas oscillation and quantum Hall effect are slightly modulated by electric field,which can be explained by the variation of electron density.Our results provide useful information for understanding the magnetic element doping effects on the transport properties of Cd3As2 films. 展开更多
关键词 molecular-beam epitaxy Dirac semimetal Cd3As2 film Mn doping quantum transport
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Influence of Ag and Sn incorporation in In_2S_3 thin films 被引量:1
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作者 林灵燕 俞金玲 +1 位作者 程树英 陆培民 《Chinese Physics B》 SCIE EI CAS CSCD 2015年第7期539-543,共5页
Ag- and Sn-doped In2S3 thin films were deposited on glass substrates using the thermal evaporation technique. The doping was realized by thermal diffusion. The influences of Ag and Sn impurities on the electrical, str... Ag- and Sn-doped In2S3 thin films were deposited on glass substrates using the thermal evaporation technique. The doping was realized by thermal diffusion. The influences of Ag and Sn impurities on the electrical, structural, morphological, and optical properties of the In2S3 films were investigated. In all deposited samples, the x-ray diffraction spectra revealed the formation of cubic In2S3 phase. A significant increase in the crystallite size was observed after Ag doping,while the doping of Sn slightly decreased the crystallite size. The x-ray photoelectron spectroscopy verified the diffusion of Ag and Sn into the In2S3 films after annealing. The optical study illustrated that Ag doping resulted in a reduction of the optical band gap while Sn doping led to a widening of the gap. Optical properties were investigated to determine the optical constants. Besides, it was found that the resistivity decreases significantly either after Ag or Sn incorporation. The study demonstrates that the Sn-doped In2S3 thin films are more suitable for buffer layer application in solar cells than the Ag-doped In2S3 thin films. 展开更多
关键词 In2S3 thin films DOPING thermal evaporation
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Al掺杂对β-Ga_(2)O_(3)薄膜光学性质的影响研究
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作者 钟琼丽 王绪 +1 位作者 马奎 杨发顺 《人工晶体学报》 CAS 北大核心 2024年第8期1352-1360,共9页
近年来,半导体器件向着高散热性、高击穿场强和低能耗的方向发展,因此超宽禁带半导体材料β-Ga_(2)O_(3)具有广阔的应用前景,而有效掺杂是实现β-Ga_(2)O_(3)器件的基础。实验采用磁控溅射法制备Ga_(2)O_(3)/Al/Ga_(2)O_(3)/Al/Ga_(2)O_... 近年来,半导体器件向着高散热性、高击穿场强和低能耗的方向发展,因此超宽禁带半导体材料β-Ga_(2)O_(3)具有广阔的应用前景,而有效掺杂是实现β-Ga_(2)O_(3)器件的基础。实验采用磁控溅射法制备Ga_(2)O_(3)/Al/Ga_(2)O_(3)/Al/Ga_(2)O_(3)复合结构,经高温退火使Al原子热扩散进入薄膜中,形成Al掺杂的β-Ga_(2)O_(3)薄膜。采用激光区熔法使薄膜区域熔化再结晶,进一步提升掺杂质量。对Al掺杂β-Ga_(2)O_(3)薄膜的晶体性质、杂质含量及光学性质进行了测试表征。结果表明:Al掺杂不改变β-Ga_(2)O_(3)薄膜的晶体结构;随着Al层溅射时间延长,掺杂含量逐渐增加;当Al溅射时间为5和10 s时,薄膜紫外吸收率分别为40%和50%;随着Al溅射时间的增加,Al掺杂β-Ga_(2)O_(3)薄膜紫外区域光吸收率逐渐增强,Al溅射时间为300 s时,β-Ga_(2)O_(3)薄膜的光吸收率接近90%;低浓度的Al掺杂会导致β-Ga_(2)O_(3)薄膜的禁带宽度变窄。 展开更多
关键词 β-Ga_(2)O_(3)薄膜 AL掺杂 磁控溅射 Ga_(2)O_(3)/Al/Ga_(2)O_(3)/Al/Ga_(2)O_(3)复合结构 光吸收 光学带隙
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Doping effect of cations(Zr^(4+),Al^(3+),and Si^(4+)) on MnO_x/CeO_2 nano-rod catalyst for NH_3-SCR reaction at low temperature 被引量:7
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作者 Xiaojiang Yao Jun Cao +4 位作者 Li Chen Keke Kang Yang Chen Mi Tian Fumo Yang 《Chinese Journal of Catalysis》 SCIE EI CAS CSCD 北大核心 2019年第5期733-743,共11页
Thermally stable Zr4+, Al3+, and Si4+ cations were incorporated into the lattice of CeO2 nano‐rods (i.e., CeO2‐NR) in order to improve the specific surface area. The undoped and Zr4+, Al3+, and Si4+ doped nano‐rods... Thermally stable Zr4+, Al3+, and Si4+ cations were incorporated into the lattice of CeO2 nano‐rods (i.e., CeO2‐NR) in order to improve the specific surface area. The undoped and Zr4+, Al3+, and Si4+ doped nano‐rods were used as supports to prepare MnOx/CeO2‐NR, MnOx/CZ‐NR, MnOx/CA‐NR, and MnOx/CS‐NR catalysts, respectively. The prepared supports and catalysts were comprehensively characterized by transmission electron microscopy (TEM), high‐resolution TEM, X‐ray diffraction, Raman and N2‐physisorption analyses, hydrogen temperature‐programmed reduction, ammonia temperature‐programmed desorption, in situ diffuse reflectance infrared Fourier‐transform spectroscopic analysis of the NH3 adsorption, and X‐ray photoelectron spectroscopy. Moreover, the catalytic performance and H2O+SO2 tolerance of these samples were evaluated through NH3‐selective catalytic reduction (NH3‐SCR) in the absence or presence of H2O and SO2. The obtained results show that the MnOx/CS‐NR catalyst exhibits the highest NOx conversion and the lowest N2O concentration, which result from the largest number of oxygen vacancies and acid sites, the highest Mn4+ content, and the lowest redox ability. The MnOx/CS‐NR catalyst also presents excellent resistance to H2O and SO2. All of these phenomena suggest that Si4+ is the optimal dopant for the MnOx/CeO2‐NR catalyst. 展开更多
关键词 MnOx/ceo2 nano‐rod catalyst Doping effect Oxygen vacancy Surface acidity Low‐temperature NH3‐SCR reaction
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Fe_2O_3掺杂TiO_2薄膜对甲基紫溶液光催化降解 被引量:19
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作者 崔斌 韩欢牛 +2 位作者 李淑妮 唐宗薰 史启祯 《应用化学》 CAS CSCD 北大核心 2001年第12期958-961,共4页
甲基紫是一种相当稳定的有机物 ,能被 Ti O2 光催化降解 .本文采用 sol-gel工艺在玻璃表面制得了均匀透明的 Ti O2 薄膜 ,研究了热处理温度、涂覆层数、掺杂 Fe2 O3 等制备工艺 ,以及溶液 p H值和助催化剂H2 O2 等因素对 Ti O2 薄膜的... 甲基紫是一种相当稳定的有机物 ,能被 Ti O2 光催化降解 .本文采用 sol-gel工艺在玻璃表面制得了均匀透明的 Ti O2 薄膜 ,研究了热处理温度、涂覆层数、掺杂 Fe2 O3 等制备工艺 ,以及溶液 p H值和助催化剂H2 O2 等因素对 Ti O2 薄膜的光催化性能和稳定性的影响 .结果表明 ,掺 Fe2 O3 的 Ti O2 薄膜对甲基紫的降解率明显优于未掺 Fe2 O3 的 Ti O2 薄膜 . 展开更多
关键词 甲基紫 光降解 TIO2薄膜 FE2O3 掺杂 污水处理 二氧化钛薄膜 有机污染物 光催化 光催化剂
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3d过渡金属掺杂TiO_2纳米晶膜电极的光电化学研究 被引量:28
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作者 李卫华 乔学斌 +3 位作者 高恩勤 杨迈之 郝彦忠 蔡生民 《高等学校化学学报》 SCIE EI CAS CSCD 北大核心 2000年第10期1534-1538,共5页
应用原子力显微镜和X射线粉末法对 3d过渡金属离子Cr(Ⅲ ) ,Fe(Ⅲ ) ,Mn(Ⅱ ) ,Co(Ⅱ ) ,Ni(Ⅱ ) ,Cu(Ⅱ )和Zn(Ⅱ )掺杂TiO2 纳米晶粒 (简写为M3d TiO2 )作了表征 ,并用光电化学方法研究了M3d TiO2 纳米结构多孔膜电极 .实验结果表明 ,... 应用原子力显微镜和X射线粉末法对 3d过渡金属离子Cr(Ⅲ ) ,Fe(Ⅲ ) ,Mn(Ⅱ ) ,Co(Ⅱ ) ,Ni(Ⅱ ) ,Cu(Ⅱ )和Zn(Ⅱ )掺杂TiO2 纳米晶粒 (简写为M3d TiO2 )作了表征 ,并用光电化学方法研究了M3d TiO2 纳米结构多孔膜电极 .实验结果表明 ,M3d TiO2 纳米粒子的颗粒较均匀 ,粒径约为 1 5nm ,其晶型为锐钛矿和板钛矿的混晶 .在所研究的M3d TiO2 中 ,只有Zn2 + TiO2 电极的光电流大于未掺杂的TiO2 纳米结构多孔膜电极 .3d金属离子的掺杂引起各电极的光电流信号在一定波长范围内出现 p 展开更多
关键词 光电化学 TiO2纳米晶膜电极 太阳能电池
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B^(3+),Zn^(2+)掺杂与SiO_2薄膜驻极体的改性 被引量:1
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作者 黄志强 徐政 +1 位作者 方明豹 俞建群 《材料研究学报》 EI CAS CSCD 北大核心 2000年第4期445-448,共4页
用粉体制备和高温熔凝工艺在n<111>型单晶硅基片上制备了非晶态态SiO2-ZnO-B2O3复合膜驻极体,实现对SiO2薄膜驻极体的改性,恒栅压电晕充电、等温表面电位衰减及热刺激放电(thermallg stimul... 用粉体制备和高温熔凝工艺在n<111>型单晶硅基片上制备了非晶态态SiO2-ZnO-B2O3复合膜驻极体,实现对SiO2薄膜驻极体的改性,恒栅压电晕充电、等温表面电位衰减及热刺激放电(thermallg stimulated discharged, TSD)实验表明, B~3+、Zn~2+的掺杂对 SiO2薄膜驻极体的电荷动态特性有较大影响: TSD放电电流峰稳定于 t=238℃处,峰位不随充电温度和充电电压变化;正、负 TSD电流谱关于温度轴对称.用离子掺杂可以有效地改变SiO2薄膜驻极体内的微观网络结构,影响其电荷贮存性能。 展开更多
关键词 离子掺杂 二氧化硅 复合膜 驻极体 改性
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热处理温度对溶胶-凝胶法制备的Ce_(0.97)Co_(0.03)O_2薄膜结构和光学性能的影响
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作者 阳生红 张曰理 《中山大学学报(自然科学版)》 CAS CSCD 北大核心 2014年第3期146-149,共4页
采用溶胶-凝胶法,在Si(100)衬底上制备了3%Co掺杂CeO2薄膜,研究了不同热处理温度对Ce0.97Co0.03O2薄膜结构和光学性质的影响。X射线衍射(XRD)表明,3%Co掺杂CeO2薄膜为多晶薄膜,且未破坏CeO2原有的结构,随着退火温度的升高,晶粒尺寸逐渐... 采用溶胶-凝胶法,在Si(100)衬底上制备了3%Co掺杂CeO2薄膜,研究了不同热处理温度对Ce0.97Co0.03O2薄膜结构和光学性质的影响。X射线衍射(XRD)表明,3%Co掺杂CeO2薄膜为多晶薄膜,且未破坏CeO2原有的结构,随着退火温度的升高,晶粒尺寸逐渐增大。椭偏光谱法研究表明,Ce0.97Co0.03O2薄膜的光学常数(折射率n、消光系数k)随着退火温度增加而增大,光学带隙Eg随退火温度增加而减小,这是薄膜结构随退火温度增加发生变化所致。 展开更多
关键词 3% Co掺杂ceo2薄膜 溶胶-凝胶法 光学性质
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CeO_2基固体电解质材料的掺杂强化
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作者 梁广川 梁秀红 林舜旺 《天津城市建设学院学报》 CAS 2002年第3期156-159,共4页
强度低是 Ce O2 基电解质材料的一个主要缺点 .实验发现 ,加入 Al2 O3可以显著增加Ce O2 基材料的强度 ,原因是掺杂的 Al2 O3在 Ce O2 中产生压缩应力 ,阻碍裂纹的进一步扩展 ,另外 ,Al2 O3分布在晶界处 ,将会导致裂纹偏转 .最大弯曲强... 强度低是 Ce O2 基电解质材料的一个主要缺点 .实验发现 ,加入 Al2 O3可以显著增加Ce O2 基材料的强度 ,原因是掺杂的 Al2 O3在 Ce O2 中产生压缩应力 ,阻碍裂纹的进一步扩展 ,另外 ,Al2 O3分布在晶界处 ,将会导致裂纹偏转 .最大弯曲强度对应的 Al2 O3添加剂量摩尔分数为 3% .加入 Al2 O3还可以促进材料烧结 ,使烧结温度降低到 15 0 0℃以下 ,但会使Ce O2 展开更多
关键词 ceo2 固体电解质 掺杂 AL2O3 强度
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N掺杂对β-Ga_(2)O_(3)薄膜日盲紫外探测器性能的影响 被引量:6
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作者 周树仁 张红 +6 位作者 莫慧兰 刘浩文 熊元强 李泓霖 孔春阳 叶利娟 李万俊 《物理学报》 SCIE EI CAS CSCD 北大核心 2021年第17期313-321,共9页
单斜氧化镓(β-Ga_(2)O_(3))材料因其独特而优异的光电特性在日盲紫外探测领域具有广阔的应用前景,受到国内外研究者的广泛关注.本研究工作采用射频磁控溅射技术,在c面蓝宝石衬底上制备了未掺杂和氮(N)掺杂β-Ga_(2)O_(3)薄膜,研究了N... 单斜氧化镓(β-Ga_(2)O_(3))材料因其独特而优异的光电特性在日盲紫外探测领域具有广阔的应用前景,受到国内外研究者的广泛关注.本研究工作采用射频磁控溅射技术,在c面蓝宝石衬底上制备了未掺杂和氮(N)掺杂β-Ga_(2)O_(3)薄膜,研究了N掺杂对β-Ga_(2)O_(3)薄膜结构及光学特性的影响;在此基础上,构筑了未掺杂和N掺杂β-Ga_(2)O_(3)薄膜基金属-半导体-金属(metal-semiconductor-metal,MSM)型日盲紫外探测器,并讨论了N掺杂影响器件性能的物理机制.结果表明,N掺杂会导致β-Ga_(2)O_(3)薄膜表面形貌变得相对粗糙,且会促使β-Ga_(2)O_(3)薄膜由直接带隙向间接带隙转变.所有器件均表现出较高的稳定性和日盲特性,相比之下,N掺杂β-Ga_(2)O_(3)薄膜器件能展现出较低的暗电流和更快的光响应速度(响应时间和恢复时间分别为40和8 ms),与氧空位相关缺陷的抑制密切相关.本研究对开发新型的高性能日盲紫外探测器具有一定的借鉴意义. 展开更多
关键词 β-Ga_(2)O_(3) 薄膜 N 掺杂 日盲紫外探测器 快速响应
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Al_(2)O_(3)掺杂钼合金的显微组织及电化学腐蚀行为研究 被引量:1
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作者 焦照临 徐流杰 +2 位作者 徐照宁 周玉成 杨璐 《稀有金属与硬质合金》 CAS CSCD 北大核心 2022年第5期59-65,69,共8页
研究了在3.5%NaCl溶液中,Al_(2)O_(3)掺杂对钼合金电化学腐蚀性能的影响,并分析了合金的腐蚀机理。结果表明:Mo-Al_(2)O_(3)合金的耐腐蚀性能显著优于纯钼,随着Al_(2)O_(3)含量的增加,Mo-Al_(2)O_(3)合金的耐腐蚀性能先提升后下降。在... 研究了在3.5%NaCl溶液中,Al_(2)O_(3)掺杂对钼合金电化学腐蚀性能的影响,并分析了合金的腐蚀机理。结果表明:Mo-Al_(2)O_(3)合金的耐腐蚀性能显著优于纯钼,随着Al_(2)O_(3)含量的增加,Mo-Al_(2)O_(3)合金的耐腐蚀性能先提升后下降。在腐蚀过程中,Cl^(-)优先吸附于钼合金氧化膜的缺陷位置形成点蚀,随着电位的增大,点蚀沿晶界扩大成为腐蚀沟槽。Al_(2)O_(3)可细化钼晶粒,从而促进钼合金形成致密的氧化物薄膜,不易发生点蚀,从而提升钼合金的耐腐蚀性能;但当钼合金中Al_(2)O_(3)的体积分数达到1.6%时,Al_(2)O_(3)颗粒由于团聚长大,破坏了钼合金氧化膜的完整性,使其对合金基体的保护作用减弱,导致钼合金耐腐蚀性能下降。 展开更多
关键词 钼合金 Al_(2)O_(3)掺杂 电化学腐蚀 腐蚀机理 氧化膜 显微组织
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不同浓度的Mg掺杂β-Ga_(2)O_(3)薄膜的制备与研究 被引量:1
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作者 杨子淑 段苹 +3 位作者 邓金祥 张晓霞 张杰 杨倩倩 《真空》 CAS 2021年第3期30-34,共5页
本文采用射频磁控溅射方法在石英和高阻硅衬底上制备纯茁-Ga_(2)O_(3)薄膜和不同掺杂浓度的Mg掺杂茁-Ga_(2)O_(3)薄膜,研究了薄膜的结构、光学和电学性质。X射线衍射测试结果表明,在我们的掺杂浓度内,Mg掺杂茁-Ga_(2)O_(3)薄膜没有出现... 本文采用射频磁控溅射方法在石英和高阻硅衬底上制备纯茁-Ga_(2)O_(3)薄膜和不同掺杂浓度的Mg掺杂茁-Ga_(2)O_(3)薄膜,研究了薄膜的结构、光学和电学性质。X射线衍射测试结果表明,在我们的掺杂浓度内,Mg掺杂茁-Ga_(2)O_(3)薄膜没有出现其他晶相的衍射峰,随着Mg掺杂浓度变大,薄膜的(401)和(601)衍射峰强度变弱。使用X射线光电子能谱测试薄膜中各元素的结合能和化学态。紫外-可见透射光谱测试结果表明薄膜在测试波段平均透光率高达80%以上,薄膜的带隙宽度随着Mg掺杂浓度变大而变大。霍尔效应测试结果表明我们采用射频磁控溅射方法制备的Mg掺杂茁-Ga_(2)O_(3)薄膜的导电类型为p型,载流子浓度由3.76×10^(10)cm^(-3)增加到1.89×10^(13)cm^(-3),说明Mg掺杂茁-Ga_(2)O_(3)薄膜是一种很有潜力的p型半导体材料。 展开更多
关键词 射频磁控溅射 Mg掺杂β-Ga_(2)O_(3)薄膜 带隙宽度 P型掺杂
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Improving the denitration performance and K-poisoning resistance of the V_2O_5-WO_3/TiO_2 catalyst by Ce^(4+) and Zr^(4+) co-doping 被引量:15
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作者 Jun Cao Xiaojiang Yao +4 位作者 Fumo Yang Li Chen Min Fu Changjin Tang Lin Dong 《Chinese Journal of Catalysis》 SCIE EI CAS CSCD 北大核心 2019年第1期95-104,共10页
A series of V2O5‐WO3/TiO2‐ZrO2,V2O5‐WO3/TiO2‐CeO2,and V2O5‐WO3/TiO2‐CeO2‐ZrO2 catalysts were synthesized to improve the selective catalytic reduction(SCR)performance and the K‐poisoning resistance of a V2O5‐W... A series of V2O5‐WO3/TiO2‐ZrO2,V2O5‐WO3/TiO2‐CeO2,and V2O5‐WO3/TiO2‐CeO2‐ZrO2 catalysts were synthesized to improve the selective catalytic reduction(SCR)performance and the K‐poisoning resistance of a V2O5‐WO3/TiO2 catalyst.The physicochemical properties were investigated by using XRD,BET,NH3‐TPD,H2‐TPR,and XPS,and the catalytic performance and K‐poisoning resistance were evaluated via a NH3‐SCR model reaction.Ce^4+and Zr^4+co‐doping were found to enhance the conversion of NOx,and exhibit the best K‐poisoning resistance owing to the largest BET‐specific surface area,pore volume,and total acid site concentration,as well as the minimal effects on the surface acidity and redox ability from K poisoning.The V2O5‐WO3/TiO2‐CeO2‐ZrO2 catalyst also presents outstanding H2O+SO2 tolerance.Finally,the in situ DRIFTS reveals that the NH3‐SCR reaction over the V2O5‐WO3/TiO2‐CeO2‐ZrO2 catalyst follows an L‐H mechanism,and that K poisoning does not change the reaction mechanism. 展开更多
关键词 V2O5‐WO3/TiO2ceo2‐ZrO2 catalyst Co‐doping K‐poisoning NH3‐SCR Reaction mechanism
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氧化石墨烯诱导高织构Mo掺杂Bi_(2)Te_(3)薄膜的热电性能
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作者 方文强 朱文艳 +1 位作者 李康银 斯剑霄 《浙江师范大学学报(自然科学版)》 CAS 2022年第3期284-290,共7页
为提高Bi_(2)Te_(3)薄膜的热电性能,采用磁控溅射技术在旋涂有氧化石墨烯(GO)缓冲层的玻璃衬底上共溅制备的Mo掺杂的n型Bi_(2)Te_(3)薄膜.通过对其形貌、组成及热电特性的表征,研究了(00 l)择优取向的不同Mo溅射功率(P=0,15,25,35,45 W)... 为提高Bi_(2)Te_(3)薄膜的热电性能,采用磁控溅射技术在旋涂有氧化石墨烯(GO)缓冲层的玻璃衬底上共溅制备的Mo掺杂的n型Bi_(2)Te_(3)薄膜.通过对其形貌、组成及热电特性的表征,研究了(00 l)择优取向的不同Mo溅射功率(P=0,15,25,35,45 W)对Bi_(2)Te_(3)的热电性能的影响.结果表明:GO缓冲层的存在可以实现高度取向(00 l)的Bi_(2)Te_(3)薄膜制备,室温下薄膜迁移率为48 cm^(2)·V^(-1)·s^(-1);Mo掺杂有效提高了Bi_(2)Te_(3)薄膜的载流子浓度,使得P_(Mo)=25 W时的Bi_(2)Te_(3)薄膜在室温下最大电导率为944S·cm^(-1),其在400 K时最大功率因子达到2074.6μW·m^(-1)·K^(-2).表明氧化石墨烯诱导高织构Mo掺杂可以优化n型Bi_(2)Te_(3)薄膜的热电性能. 展开更多
关键词 Bi_(2)Te_(3)薄膜 氧化石墨烯 取向 Mo掺杂 热电性能
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Magnetism Regulation of (In_(1-x)Fe_x)_2O_3 Semiconductors Prepared by Sol-gel Method
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作者 高洪 孙志刚 《Journal of Wuhan University of Technology(Materials Science)》 SCIE EI CAS 2010年第1期20-23,共4页
Fe doped In2O3 samples (In1-xFex)2O3 (x=0, 0.05, 0.1, 0.2 and 0.3) on glass substrate were prepared by sol-gel method. The XRD results demonstrate that the solubility of Fe ions in In2O3 matrix is around 20%, abov... Fe doped In2O3 samples (In1-xFex)2O3 (x=0, 0.05, 0.1, 0.2 and 0.3) on glass substrate were prepared by sol-gel method. The XRD results demonstrate that the solubility of Fe ions in In2O3 matrix is around 20%, above which impurity phase can be observed. The transmittance of the samples with x=0, 0.05, 0.1 and 0.2 are above 80% in the visible region while the transimittance of the glass is 90%. The transmittance curves slightly red-shifts as x increasing. All of the samples except x=0 are ferromagnetic at room temperature. The highest saturation magnetization moment is reached in the sample x=0.2 with 330 emu/cm3, and the coercive force is 169 Oe which is also the largest in our samples. The results indicate that the addition of Fe ions could tune the structure, the ferromagnetism and optical property in the In2O3 matrix. 展开更多
关键词 Fe doped In2O3 thin films MAGNETISM sol-gel
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Ce掺杂Bi_(2)S_(3)/Fe_(2)O_(3)异质结的制备及其光电性能
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作者 周威 谭海军 +2 位作者 黎燕 王家钰 钟福新 《半导体技术》 CAS 北大核心 2021年第9期719-724,共6页
采用旋涂法与水热法在掺氟二氧化锡(FTO)上制备了Ce掺杂Bi_(2)S_(3)/Fe_(2)O_(3)(Ce-Bi_(2)S_(3)/Fe_(2)O_(3))异质结,对样品的组成、形貌及其光电性能进行了研究分析。结果显示,Ce-Bi_(2)S_(3)/Fe_(2)O_(3)的X射线衍射(XRD)图谱中各衍... 采用旋涂法与水热法在掺氟二氧化锡(FTO)上制备了Ce掺杂Bi_(2)S_(3)/Fe_(2)O_(3)(Ce-Bi_(2)S_(3)/Fe_(2)O_(3))异质结,对样品的组成、形貌及其光电性能进行了研究分析。结果显示,Ce-Bi_(2)S_(3)/Fe_(2)O_(3)的X射线衍射(XRD)图谱中各衍射峰位与Bi_(2)S_(3)/Fe_(2)O_(3)相似,无新的相产生,但在2θ为24.92°(130)与28.65°(211)的衍射峰强度有所降低,而在2θ为35.65°(110)时有所增强;在Ce-Bi_(2)S_(3)/Fe_(2)O_(3)的X射线能谱(EDS)中发现了Ce元素。光电性能测试结果表明,在模拟太阳光的照射下Ce-Bi_(2)S_(3)/Fe_(2)O_(3)的光电压为0.347 V,比Bi_(2)S_(3)/Fe_(2)O_(3)(0.281 V)提高了23.5%;光电流密度达到2.31 mA·cm^(-2),比Bi_(2)S_(3)/Fe_(2)O_(3)(0.53 mA·cm^(-2))提高了约3.36倍;电化学阻抗谱(EIS)显示,在光照下Ce-Bi_(2)S_(3)/Fe_(2)O_(3)具有最低的界面阻抗,表明Ce-Bi_(2)S_(3)/Fe_(2)O_(3)中的载流子被更有效地分离和转移。 展开更多
关键词 异质结 Ce掺杂Bi_(2)S_(3) Fe_(2)O_(3) 光电性能 水热法 薄膜
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La掺杂对Y_(2)O_(3)/Diamond薄膜结构与性能的影响
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作者 操淑琴 黄亚博 +9 位作者 陈良贤 刘金龙 魏俊俊 廉伟艳 赵志宏 杨振京 陈晓依 彭志勇 邢忠福 李成明 《红外与激光工程》 EI CSCD 北大核心 2023年第12期264-273,共10页
稀土掺杂可以有效地改变基体材料的结构并提高使用性能。利用磁控溅射法在单晶硅和多晶CVD金刚石上分别制备了未掺杂及La掺杂的Y_(2)O_(3)薄膜,研究了La掺杂氧化钇(Y_(2)O_(3))增透薄膜的组成、结构及性能。X射线光电子能谱(XPS)和掠入... 稀土掺杂可以有效地改变基体材料的结构并提高使用性能。利用磁控溅射法在单晶硅和多晶CVD金刚石上分别制备了未掺杂及La掺杂的Y_(2)O_(3)薄膜,研究了La掺杂氧化钇(Y_(2)O_(3))增透薄膜的组成、结构及性能。X射线光电子能谱(XPS)和掠入射X射线(GIXRD)研究表明,金属La与O相互作用,以La-O化合物形式存在于Y_(2)O_(3)薄膜中,未掺杂的Y_(2)O_(3)薄膜呈现立方(222)面柱状晶体取向,随着La掺杂功率的增加,开始出现新的单斜Y_(2)O_(3)相(111)晶面。从扫描电镜(SEM)观察到不同La掺杂功率下Y_(2)O_(3)薄膜呈现柱状晶结构,结晶质量较好。由原子力显微镜(AFM)证实,与未掺杂的Y_(2)O_(3)薄膜相比,La掺杂的Y_(2)O_(3)薄膜具有较低的粗糙度(RMS)值。在La掺杂的Y_(2)O_(3)薄膜中,随着La浓度的增加,柱状晶的晶粒尺寸显著减小。在8~12μm的长波红外范围内,La掺杂后的Y_(2)O_(3)/金刚石薄膜最大透过率为80.3%,与CVD金刚石相比,透过率提高19.8%。颗粒细小的La掺杂Y_(2)O_(3)薄膜具有较高的硬度和弹性模量,硬度由未掺杂(12.02±0.37)GPa增加到(14.14±0.39)GPa,弹性模量由(187±14)GPa增加到(198±7.5)GPa。结果表明,与未掺杂Y_(2)O_(3)薄膜相比,La掺杂的Y_(2)O_(3)薄膜在保持较高红外透过率条件下,通过细晶强化获得了更高的硬度,有利于提升砂蚀、雨蚀等冲刷性能。 展开更多
关键词 CVD金刚石 Y_(2)O_(3)增透膜 LA掺杂 透过率
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