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先进制造封装中Sb掺杂64Sn-35Bi-1Ag钎焊腐蚀和电化学迁移 被引量:1
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作者 华丽 戴月 《湖北第二师范学院学报》 2013年第8期1-4,共4页
采用动电位扫描结合SEM和XRD等技术研究先进电子制造封装过程中Sb掺杂对64Sn-35Bi-1Ag钎焊料在3%(wt.)NaCl溶液中腐蚀和电化学迁移行为影响。结果显示:Sb掺杂前后腐蚀电流密度(Icorr)随着Sb含量增加而有较显著的变化。其中当Sb含量小于1... 采用动电位扫描结合SEM和XRD等技术研究先进电子制造封装过程中Sb掺杂对64Sn-35Bi-1Ag钎焊料在3%(wt.)NaCl溶液中腐蚀和电化学迁移行为影响。结果显示:Sb掺杂前后腐蚀电流密度(Icorr)随着Sb含量增加而有较显著的变化。其中当Sb含量小于1%时,随着Sb含量增加,其腐蚀电流密度(Icorr)减小。当Sb含量大于1%时,其腐蚀电流密度(Icorr)随着Sb含量的增大而增大;不论掺杂多少量,Sb掺杂后,钎料的腐蚀速率显著的增大,说明Sb掺杂后64Sn-35Bi-1Ag更易被腐蚀。电化学迁移结果显示,Sb掺杂前后,枝晶生长的速率显著不同,且枝晶成份有较大差异,掺杂后大于掺杂前,说明Sb掺杂不利于先进电子制造和封装技术。 展开更多
关键词 64sn-35Bi-1Ag钎料 Sb掺杂 腐蚀 电化学迁移
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Electrochemical Migration Behaviors of Lead-Free 64Sn-35Bi-1Ag Solder on FR-4 PCB Board Plated with Cu
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作者 HUA Li HOU Hanna 《Wuhan University Journal of Natural Sciences》 CAS 2012年第1期79-85,共7页
Electrochemical migration (ECM) characteristic is a new reliability failure. A parallel surfacial electrode system coupling with scanning electron microscope (SEM), energy dispersive X-ray analysis (EDAX), and X... Electrochemical migration (ECM) characteristic is a new reliability failure. A parallel surfacial electrode system coupling with scanning electron microscope (SEM), energy dispersive X-ray analysis (EDAX), and X-ray Diffraction (XRD) technologies is designed to research ECM behavior of 64Sn-35BilAg (SBA) solder in 3.5 g/L NaCl solution and compare to that of Sn37Pb and Sn-3.0Ag-O.5Cu (SAC) solders. Results show that SBA solder is more susceptible to ECM failure than Sn37Pb solder, which is more difficult than SAC solder. The affected factors of ECM are given as follows: the solder compositions, the loaded electric field, ECM time, etc. The electrochemical reaction mechanism of ECM process is achieved. EDAX and XRD analyses show that the main contents on dendrites of SBA solder after ECM test are Sn, hardly any Bi, a little Ag, which illustrates that the order of ion migration capacity is shown as follows: Sn 〉 Ag 〉Bi. 展开更多
关键词 64sn-35bi-lag (SBA) solder electrochemical migration dendrites growth fractal regulation
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