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Study on hydrogen sulfide plasma passivation of 790-nm laser diode cavity surface
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作者 刘春玲 么艳平 +5 位作者 王春武 高欣 乔忠良 李梅 王玉霞 薄报学 《Chinese Optics Letters》 SCIE EI CAS CSCD 2008年第3期183-185,共3页
In order to improve the optical properties of the Ⅲ-Ⅴ laser diodes (LDs) by means of H2S plasma passivation technology, H2S plasma passivation treatment is performed on the GaAs(110) surface. The optimum passiva... In order to improve the optical properties of the Ⅲ-Ⅴ laser diodes (LDs) by means of H2S plasma passivation technology, H2S plasma passivation treatment is performed on the GaAs(110) surface. The optimum passivation conditions obtained are 60-W radio frequency (RF) power and 20-min duration. So the laser cavity surfaces are treated under the optimum passivation conditions. Consequently, compared with unpassivated lasers with only AR/HR-eoatings, the catastrophic optical damage (COD) threshold value of the passivated lasers by H2S plasma treatment is increased by 33%, which is almost the same as that of (NH4)2Sx treatment. And the life-test experiment has demonstrated that this passivation method is more stable than (NH4)2Sx solution wet-passivated treatment. 展开更多
关键词 GaAs Study on hydrogen sulfide plasma passivation of 790-nm laser diode cavity surface NH NM
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